Abstract:
A process for manufacturing membrane electrode units (MEU) for fuel cell is disclosed, said MEU have two electrochemically active electrodes which are separated by a polymer electrolyte membrane.
Abstract:
The present invention relates to compounds of formula (I), which are characterized in that they substituted by benzimidazo[1,2-a]benzimidazo-5-yl and/or benzimidazo[1,2-a]benzimidazo-2,5-ylene groups and in that at least one of the substituents B 1 , B 2 , B 3 , B 4 , B 5 , B 6 , B 7 and B 8 represents N; a process for their production and their use in electronic devices, especially electroluminescent devices. When used as host material for phosphorescent emitters in electroluminescent devices, the compounds of formula I may provide improved efficiency, stability, manufacturability, or spectral characteristics of electroluminescent devices.
Abstract:
N-(tetrazol-5-yl)- and N-(triazol-5-yl)arylcarboxamides of formula (I) and their use as herbicides. The invention relates to N-(tetrazol-5-yl)- and N-(triazol-5-yl)arylcarboxamides of formula (I) and their use as herbicides. In said formula I, B represents N or CH, whereas CYC indicates a bi- or tricyclic radical of the following formulae Cyc-1 or Cyc-2 whereas Q and Q' represent a fused carbocycle or a fused heterocycle, and R, R 1 , R 3 , R 4 and R 5 represent groups such as hydrogen, halogen or organic groups such as alkyl or phenyl.
Abstract:
An inverse dispersion comprising i) at least one anionic or one nonionic polymer obtainable by the polymerization of a) at least one anionic monomer and/or at least one nonionic monomer (compound A), b) optionally at least one crosslinker (compound B), c) optionally at least one chain transfer agent (compound C), ii) at least one stabilizing agent, wherein the stabilizing agent has one or more hydrophobic chains with more than 30 carbon atoms, iii) at least one non-aqueous carrier.
Abstract:
Improved membrane electrode assemblies and fuel cells with long lifetime comprising two electrochemically active electrodes separated by a polymer electrolyte membrane based on polybenzoxazole-polybenzimidazole block polymers are disclosed.
Abstract:
Chemical mechanical polishing composition is provided. The composition comprises (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a protein, and (C) an aqueous medium.
Abstract:
A post chemical-mechanical-polishing (post-CMP) cleaning composition comprising: (A) is cysteine, glutathione, N-acetylcysteine, thiourea, (L) at least one oligomeric or polymeric polycarboxylic acid, and (C) water, wherein the post-CMP cleaning composition has a pH-value in the range of from 4 to not more than 7. The use of the composition for removing residues and contaminants from the surface of semiconductor substrates useful for manufacturing microelectronic devices. A process for manufacturing microelectronic devices from semiconductor substrates comprising the step of removing residues and contaminants from the surface of the semiconductor substrates by contacting them at least once with the post-CMP cleaning composition.