Broadband spectroscopic rotating compensator ellipsometer
    71.
    发明公开
    Broadband spectroscopic rotating compensator ellipsometer 失效
    宽带spectroellipsometer旋转补偿器

    公开(公告)号:EP1197741A3

    公开(公告)日:2002-08-07

    申请号:EP01204896.3

    申请日:1997-07-22

    Abstract: An ellipsometer for analyzing a sample (2) using a broad range of wavelengths includes a light source (4) for generating a beam of polychromatic light for interacting with the sample (2). A polarizer (6) polarizes the light beam before the light beam (14) interacts with the sample (2). A rotating compensator (8) induces phase retardations of a polarization state of the light beam. The range of wavelengths and the compensator (8) are such that at least a first phase retardation value is induced that is within a primary range of effective retardations of substantially 90° to 180°. An analyzer (10) interacts with the light beam after the light beam interacts with the sample (2). A detector (12) measures the intensity of light after interacting with the analyzer (10) as a function of compensator angle and of wavelength, preferably at all wavelengths simultaneously. A processor (23) determines the polarization state of the light, after interacting with the analyzer (10), from the light intensities measured by the detector (12).

    REGRESSION CALIBRATED SPECTROSCOPIC ROTATING COMPENSATOR ELLIPSOMETER SYSTEM WITH PHOTO ARRAY DETECTOR
    72.
    发明公开
    REGRESSION CALIBRATED SPECTROSCOPIC ROTATING COMPENSATOR ELLIPSOMETER SYSTEM WITH PHOTO ARRAY DETECTOR 失效
    ELLIPSOMETER-SYSTEM MIT REGRESSIONSKALIBRIERTEN SPEKTROSKOPISCHEN ROATIONSKOMPENSATOR UND PHOTARRAY-DETEKTOR

    公开(公告)号:EP1038165A4

    公开(公告)日:2000-10-25

    申请号:EP98907397

    申请日:1998-02-02

    CPC classification number: G01N21/211 G01J3/447 G01J4/00 G01J2003/2866

    Abstract: A spectroscopic rotating compensator material system investigation system including a photo array (DE's) for simultaneously detecting a multiplicity of wavelengths is disclosed. The spectroscopic rotating compensator material system investigation system is calibrated by a mathematical regression based technique involving, where desirable, parameterization of calibration parameters. Calibration is possible of calibration parameters. Calibration is possible utilizing a single two-dimensional data set obtained with the spectroscopic rotating compensator material system investigation system in a "material system present" or in a "straight-through" configuration.

    Abstract translation: 公开了一种包括用于同时检测多个波长的光阵列(DE)的光谱旋转补偿器材料系统调查系统。 光谱旋转补偿器材料系统调查系统通过基于数学回归的技术进行校准,该技术涉及在需要时对校准参数进行参数化。 校准是可能的校准参数。 使用通过光谱旋转补偿器材料系统调查系统在“材料系统存在”或“直通”配置中获得的单个二维数据集进行校准是可能的。

    SPECTRAL ANALYSIS DEVICE AND SPECTRAL ANALYSIS METHOD

    公开(公告)号:EP3712578A1

    公开(公告)日:2020-09-23

    申请号:EP18879443.2

    申请日:2018-10-17

    Abstract: To provide a spectral analysis device capable of obtaining in-plane/out-of-plane absorbance spectra of a thin film even when the incident angle of light emitted from a light source to irradiate a support body is fixed.
    A spectral analysis device includes a light source 1, a support body 2, a linear polarization filter 3, a detection unit 4, a regression computation unit 5, and an absorbance spectrum calculation unit 6. The support body 2 is fixed such that an incident angle of the light is a predetermined incident angle θ. The linear polarization filter 3 is configured such that lights with polarization angles φ n ranging from 0° to 90° are irradiated to the support body 2. The detection unit 4 detects a transmitted spectrum S from transmitted lights with the polarization angles φ n . The regression computation unit 5 obtains an in-plane spectrum s ip and an out-of-plane spectrum s op through regression analysis by using the transmitted spectrum S and a mixing ratio R. The absorbance spectrum calculation unit 6 calculates an in-plane absorbance spectrum A ip and an out-of-plane absorbance spectrum A op of the thin film based on the in-plane spectrum and the out-of-plane spectrum obtained in each of a state where the thin film is supported on the support body 2 and a state where the thin film is not supported on the support body 2.

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