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    METHOD FOR REMOVING TITANIUM BASED COATING FILM OR OXIDE OF TITANIUM
    72.
    发明公开
    METHOD FOR REMOVING TITANIUM BASED COATING FILM OR OXIDE OF TITANIUM 有权
    VERFAHREN ZUR ENTFERNUNG VON TITANOXID

    公开(公告)号：EP1484434A1

    公开(公告)日：2004-12-08

    申请号：EP03705124.0

    申请日：2003-02-13

    申请人： NGK INSULATORS, LTD.

    发明人： MATSUMOTO, Keiji, NGK INSULATORS, LTD. ,  MATSUOKA, Susumu, NGK INSULATORS, LTD. ,  ASAI, Yuji, NGK INSULATORS, LTD.

    IPC分类号： C23G1/02

    CPC分类号： C23G1/081 ,  B28B2003/203 ,  C23G1/02 ,  C23G1/085

    摘要： There are here disclosed a method for removing a titanium-based film from a honeycomb-molding die having on the surface of a base material coated with the titanium-based film, and a method for removing an oxide of titanium from a honeycomb-molding die having the oxide of titanium adhered/deposited on the surface of a base material. In each method, a removing solution comprising a mixture of an acid and hydrogen peroxide is used. According to the methods for removing the titanium-based film and the oxide of titanium, a large amount of the titanium-based film as well as the oxide of titanium adhered/deposited on the base material of a honeycomb-molding die can be removed by use of a small amount of the removing solution without corroding the base material of honeycomb-molding die while re-deposition of dissolved titanium ions on the base material is prevented.

    摘要翻译： 这里公开了一种从由钛基膜涂覆的基材的表面上的蜂窝模塑模具中除去钛基膜的方法，以及从蜂窝模塑模具中除去钛的氧化物的方法 使钛的氧化物附着/沉积在基材的表面上。 在每种方法中，使用包含酸和过氧化氢的混合物的去除溶液。 根据钛基膜和钛的氧化物的除去方法，可以通过大量的钛基膜以及附着/沉积在蜂窝模塑模具的基材上的钛的氧化物被除去 防止在溶解的钛离子重新沉积在基材上时，少量的除去溶液不会腐蚀蜂窝成型模具的基材。

    CHEMICAL MECHANICAL POLISHING COMPOSITION AND PROCESS
    75.
    发明公开
    CHEMICAL MECHANICAL POLISHING COMPOSITION AND PROCESS 失效
    组合物和方法用于化学机械抛光

    公开(公告)号：EP0852615A4

    公开(公告)日：2002-09-04

    申请号：EP97933430

    申请日：1997-07-21

    申请人： EKC TECHNOLOGY INC

    发明人： SMALL ROBERT J ,  MCGHEE LAURENCE ,  MALONEY DAVID JOHN ,  PETERSON MARIA LOUISE

    IPC分类号： C09G1/02 ,  C09K13/00 ,  C09K13/06 ,  C23F1/00 ,  C23F3/00 ,  H01L21/02 ,  H01L21/302 ,  H01L21/304 ,  H01L21/306 ,  H01L21/311 ,  H01L21/321 ,  H01L21/461 ,  H01L21/4763 ,  H01L21/8238 ,  C11D1/66 ,  C11D3/26 ,  C11D3/30 ,  C23G1/02 ,  C23G1/14

    CPC分类号： C09G1/02 ,  C09K13/00 ,  C09K13/06 ,  C23F3/00 ,  H01L21/02074 ,  H01L21/3212 ,  Y10S438/959

    摘要： A composition for chemical mechanical polishing includes a slurry. A sufficient amount of a selectively oxidizing and reducing compound is provided in the composition to produce a differential removal of a metal and a dielectric material. A pH adjusting compounds adjusts the pH of the composition to provide a pH that makes the selectively oxidizing and reducing compound provide the differential removal of the metal and the dielectric material. A composition for chemical mechanical polishing is improved by including an effective amount for chemical mechanical polishing of a hydroxylamine compound, ammonium persulfate, a compound which is an indirect source of hydrogen peroxide, a peracetic acid or periodic acid. A method for chemical mechanical polishing comprises applying a slurry to a metal and dielectric material surface to produce mechanical removal of the metal and the dielectric material. A selectively oxidizing and reducing compound is applied to produce a differential removal of the metal and the dielectric material. The pH of the slurry and the selectively oxidizing and reducing compound is adjusted to provide the differential removal of the metal and the dielectric material. A method for chemical mechanical polishing comprises applying a slurry to a metal and dielectric material surface to produce mechanical removal of the metal and the dielectric material, and an effective amount for chemical mechanical polishing of a hydroxylamine compound, ammonium persulfate, a compound which is an indirect source of hydrogen peroxide, a peracetic acid or periodic acid.

    BEIZMITTEL FÜR EDELSTÄHLE
    78.
    发明公开
    BEIZMITTEL FÜR EDELSTÄHLE 有权
    除草剂钢

    公开(公告)号：EP1100982A1

    公开(公告)日：2001-05-23

    申请号：EP99942796.6

    申请日：1999-07-22

    申请人： Chemetall GmbH

    发明人： SCHÖNFELDER, Eckart ,  SCHWANE, Günther ,  WERNER, Harald

    IPC分类号： C23G1/08 ,  C23G1/02

    CPC分类号： C23G1/086 ,  C23G1/025

    摘要： The invention relates to an aqueous stripper free of wetting agents and emulsifiers, intended for use with special steels. Said stripper, on a basis of sulfuric acid or phosphoric acid and hydrofluoric acid, contains (in each case in relation to 100 percent by weight of substance): between 1.5 and 16 weight percent sulfuric acid or between 2.0 and 30 weight percent phosphoric acid, as well as between 0.5 and 14 weight percent hydrofluoric acid and between 0.5 and 15.5 weight percent acid-soluble aromatic nitro compounds. No iron(III) compounds are added to said stripper. Only in the initial phase an oxidizing agent which oxidizes iron(II) to iron(III) may be added. As acid-soluble aromatic nitro compound m-nitrobenzol sulfonate and/or 3-nitrophthalate are especially advantageous. The stripper provided for by the invention can be used in a stripping bath and, if between 2.5 and 5.5 weight percent magnesium and/or magnesium compound (calculated as Mg) are added, can also be applied by spraying or with a brush.