摘要:
An apparatus for material deposition, comprising a transparent donor substrate having deposited thereon a donor film comprising a metal with a thickness less than 2 µm. The apparatus further comprising a positioning assembly, which is configured to position the donor substrate in proximity to an acceptor substrate comprising a semiconductor material with the donor film facing toward the acceptor substrate and with a gap of at least 0.1 mm between the donor film and the acceptor substrate; and an optical assembly, which is configured to direct pulses of laser radiation, having a pulse duration less than 2 ns, to impinge on the donor substrate so as to cause droplets of the metal to be ejected from the donor layer and land on the acceptor substrate, thereby forming a circuit trace in ohmic contact with the semiconductor material.
摘要:
A method for manufacturing, comprising coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate; irradiating the coated substrate with an energy beam so as to fix a pattern (42) in an outer layer of the matrix without fixing a bulk of the matrix or sintering the material that is to be patterned in the matrix; removing the matrix (28) remaining on the substrate (22) outside the fixed pattern (42); and after removing the matrix (28), sintering the material in the pattern (42), wherein the matrix (28) comprises a photosensitive surfactant additive, and wherein irradiating the coated substrate activates the additive so as to cause the additive to form the fixed pattern (42) in the outer layer of the matrix (28).
摘要:
A range differentiator useful for auto-focusing, the range differentiator including an image generator (540, 130, 132) providing an image of a scene at various physical depths, a depth differentiator (132) distinguishing portions of the image at depths below a predetermined threshold, irrespective of a shape of the portions, and providing a depth differentiated image and a focus distance ascertainer (132) ascertaining a focus distance based on the depth differentiated image.
摘要:
An apparatus for material deposition on an acceptor surface includes a transparent donor substrate having opposing first and second surfaces, such that at least a part of the second surface is not parallel to the acceptor surface, and including a donor film on the second surface. The apparatus additionally includes an optical assembly, which is configured to direct a beam of radiation to pass through the first surface of the donor substrate and impinge on the donor film at a location on the part of the second surface that is not parallel to the acceptor surface, so as to induce ejection of droplets of molten material from the donor film onto the acceptor surface.
摘要:
A method for manufacturing includes coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate. A pattern (42) is fixed in the matrix by directing an energy beam to impinge on the coated substrate so as to fix the pattern in the matrix without fully sintering the pattern. The matrix remaining on the substrate outside the fixed pattern is removed, and after removing the matrix, the material in the pattern is sintered.
摘要:
A flat surface tilting device including a selectably positionable flat surface element assembly defining a flat surface element having a flat surface and a pivot location portion, the pivot location portion being generally centered with respect to the flat surface, a pivot support element pivotably engaging the pivot location portion, an electromagnet, fixed with respect to the pivot support element and arranged for application of magnetic force in a direction generally perpendicular to the flat surface thereby to pivot the flat surface element about the pivot support element, a sensor for sensing the position of the flat surface element and feedback circuitry operative in response to an output of the sensor to govern operation of the electromagnet.
摘要:
System and corresponding method for plotting an image on a thin material having variations in thickness. System (40) includes: a plotter unit (46), for plotting the image on a surface (48) of thin material (42); a control unit (50), for controlling plotter unit (46), for effecting the plotting; and a thickness measuring device (52), for measuring thickness (44) of thin material (42). Control unit (50) receives measured thickness values from thickness measuring device (52), and uses measured thickness values for adjusting plotting of the image via plotter unit (46), to compensate for variations in thickness (44) of thin material (42).
摘要:
A system for delivering energy to a substrate including a dynamically directable source of radiant energy providing a plurality of beams of radiation, each propagating in a dynamically selectable direction. Independently positionable beam steering elements in a plurality of beam steering elements are operative to receive the beams and direct them to selectable locations on the substrate.