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    TWO-DIMENSIONALLY BALANCED POSITIONING DEVICE WITH TWO OBJECT HOLDERS, AND LITHOGRAPHIC DEVICE PROVIDED WITH SUCH A POSITIONING DEVICE
    3.
    发明授权
    TWO-DIMENSIONALLY BALANCED POSITIONING DEVICE WITH TWO OBJECT HOLDERS, AND LITHOGRAPHIC DEVICE PROVIDED WITH SUCH A POSITIONING DEVICE 失效
    双向平衡定位器和光刻设备具有这样的定位装置

    公开(公告)号：EP0890136B9

    公开(公告)日：2003-12-10

    申请号：EP97941149.3

    申请日：1997-10-03

    申请人： ASML Netherlands B.V.

    发明人： LOOPSTRA, Erik, Roelof ,  BONNEMA, Gerrit, Maarten ,  VAN DER SCHOOT, Harmen, Klaas ,  VELDHUIS, Gerjan, Peter ,  TER BEEK, Paulus, Martinus, Henricus

    IPC分类号： G03F7/20 ,  H01L21/68

    CPC分类号： G03F7/70733 ,  B23Q1/621 ,  B23Q1/623 ,  B23Q11/0032 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70766 ,  G03F7/709 ,  H01L21/682 ,  Y10T74/20213

    摘要： A positioning device (3, 97, 179) with a first displacement unit (25, 189) for displacing a first object holder (11, 181) and a second displacement unit (27, 191) for displacing a second object holder (13, 183). The object holders can be displaced by the positoning device alternately from a measuring position into an operational position and can be displaced by the respective displacement units independently of one another in the measuring position and in the operational position. The displacement units are provided with force actuators which each have a first part (47, 49; 117, 119; 215, 217) which is coupled to the relevant object holder and which is displaceable under the influence of a driving force relative to a second part (59, 61; 133, 135, 137, 139; 219, 221) which is fastened to a balancing unit (69, 149, 205) which is common to the two displacement units. The balancing unit is displaceably guided relative to a base (81, 209), so that reaction forces of the displacement units are converted into displacements of the balancing unit relative to the base, and mechanical vibrations in the balancing unit and the base are prevented. The use of the force actuators prevents the displacements of the balancing unit from disturbing the positions of the object holders relative to the base. The positioning device is further provided with a control unit (83, 169, 237) by means of which at least the parts (47, 49; 121, 123; 219, 221) directed parallel to an X-direction of the X-actuators (39, 41; 105, 107; 211, 213) coupled to the object holders are held in positions parallel to the X-direction. It is also prevented in this manner that positions of the object holders relative to the base are interfered with by rotations of the balancing unit caused by the reaction forces of the displacement units. The positioning device can be used in a lithographic device for the displacement of a semiconductor substrate relative to an exposure system of the lithographic device and for the displacement of a mask relative to the exposure system.

    APPARATUS FOR COOLING
    4.
    发明公开
    APPARATUS FOR COOLING 审中-公开
    用于冷却的设备

    公开(公告)号：EP1969424A2

    公开(公告)日：2008-09-17

    申请号：EP06851960.2

    申请日：2006-11-16

    申请人： ASML Netherlands B.V.

    发明人： HOL, Sven Antoin Johan ,  DE KLERK, Angelo Cesar Peter ,  LOOPSTRA, Erik, Roelof ,  Kuijperlaan 6 ,  SCHOLTEN, Mark

    IPC分类号： G03F20060101

    CPC分类号： G03F7/70875 ,  F28D11/02 ,  G03F7/70758 ,  H02K9/22 ,  H02N13/00

    摘要： A cooling apparatus is disclosed that has a first cooling structure (220), in thermal contact with a heat source (210) having a temperature greater than a cool structure (250), comprising a channel through which a cooling fluid is passed, an isolator (230) between the heat source and the cool structure, the isolator in thermal contact with the first cooling structure and comprising a material of low thermal conductivity, and a second cooling (240) structure between the isolator and the cool structure, the second cooling structure comprising a channel through which cooling fluid is passed.

    摘要翻译： 公开了一种冷却设备，其具有与温度大于冷却结构（250）的热源（210）热接触的第一冷却结构（220），该冷却结构包括冷却流体通过的通道，隔离器 （230），所述隔离器与所述第一冷却结构热接触且包括低导热率的材料，以及所述隔离器与所述冷却结构之间的第二冷却（240）结构，所述第二冷却 该结构包括冷却流体通过的通道。

    REPETITIVELY PROJECTING A MASK PATTERN USING A TIME-SAVING HEIGHT MEASUREMENT
    5.
    发明授权
    REPETITIVELY PROJECTING A MASK PATTERN USING A TIME-SAVING HEIGHT MEASUREMENT 有权
    掩膜图案重复使用投影节省时间的测高

    公开(公告)号：EP0961954B1

    公开(公告)日：2008-01-30

    申请号：EP98965251.6

    申请日：1998-12-11

    申请人： ASML Netherlands B.V.

    发明人： LOOPSTRA, Erik, Roelof

    IPC分类号： G03F9/00

    CPC分类号： G03F9/7026 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/7075 ,  G03F7/70775 ,  G03F9/7003

    摘要： In a lithographic projection apparatus, a time-saving height measurement method is used. While in a projection station (105, 108, 111) the pattern of a mask (129) is projected on the fields of a first substrate (120), the height of the fields of a second substrate (121) is measured in a measuring station (133). In the measuring station, the height of the substrate fields and the height of the substrate holder (113) are measured by a first height sensor (150) and a second height sensor (160), respectively, and the value of the height of the substrate holder associated with the ideal height of the substrate field is determined for each substrate field. In the projection station, only the height of the substrate holder (111) is controlled by a third height sensor (180). The second and third height sensors are preferably part of a composite XY interferometer system extended with a Z measuring axis.

    TWO-DIMENSIONALLY BALANCED POSITIONING DEVICE WITH TWO OBJECT HOLDERS, AND LITHOGRAPHIC DEVICE PROVIDED WITH SUCH A POSITIONING DEVICE
    6.
    发明授权
    TWO-DIMENSIONALLY BALANCED POSITIONING DEVICE WITH TWO OBJECT HOLDERS, AND LITHOGRAPHIC DEVICE PROVIDED WITH SUCH A POSITIONING DEVICE 失效
    双向平衡定位器和光刻设备具有这样的定位装置

    公开(公告)号：EP0890136B1

    公开(公告)日：2002-12-18

    申请号：EP97941149.3

    申请日：1997-10-03

    申请人： ASML Netherlands B.V.

    发明人： LOOPSTRA, Erik, Roelof ,  BONNEMA, Gerrit, Maarten ,  VAN DER SCHOOT, Harmen, Klaas ,  VELDHUIS, Gerjan, Peter ,  TER BEEK, Paulus, Martinus, Henricus

    IPC分类号： G03F7/20 ,  H01L21/68

    CPC分类号： G03F7/70733 ,  B23Q1/621 ,  B23Q1/623 ,  B23Q11/0032 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70766 ,  G03F7/709 ,  H01L21/682 ,  Y10T74/20213

    摘要： A positioning device (3, 97, 179) with a first displacement unit (25, 189) for displacing a first object holder (11, 181) and a second displacement unit (27, 191) for displacing a second object holder (13, 183). The object holders can be displaced by the positoning device alternately from a measuring position into an operational position and can be displaced by the respective displacement units independently of one another in the measuring position and in the operational position. The displacement units are provided with force actuators which each have a first part (47, 49; 117, 119; 215, 217) which is coupled to the relevant object holder and which is displaceable under the influence of a driving force relative to a second part (59, 61; 133, 135, 137, 139; 219, 221) which is fastened to a balancing unit (69, 149, 205) which is common to the two displacement units. The balancing unit is displaceably guided relative to a base (81, 209), so that reaction forces of the displacement units are converted into displacements of the balancing unit relative to the base, and mechanical vibrations in the balancing unit and the base are prevented. The use of the force actuators prevents the displacements of the balancing unit from disturbing the positions of the object holders relative to the base. The positioning device is further provided with a control unit (83, 169, 237) by means of which at least the parts (47, 49; 121, 123; 219, 221) directed parallel to an X-direction of the X-actuators (39, 41; 105, 107; 211, 213) coupled to the object holders are held in positions parallel to the X-direction. It is also prevented in this manner that positions of the object holders relative to the base are interfered with by rotations of the balancing unit caused by the reaction forces of the displacement units. The positioning device can be used in a lithographic device for the displacement of a semiconductor substrate relative to an exposure system of the lithographic device and for the displacement of a mask relative to the exposure system.

    LITHOGRAPHIC APPARATUS COMPRISING A POSITIONING DEVICE HAVING TWO OBJECT HOLDERS
    8.
    发明授权
    LITHOGRAPHIC APPARATUS COMPRISING A POSITIONING DEVICE HAVING TWO OBJECT HOLDERS 失效
    与两个Object持有人定位平版印刷装置对

    公开(公告)号：EP0900412B1

    公开(公告)日：2005-04-06

    申请号：EP98903239.6

    申请日：1998-02-27

    申请人： ASML Netherlands B.V.

    发明人： LOOPSTRA, Erik, Roelof ,  BONNEMA, Gerrit, Maarten ,  VAN DER SCHOOT, Harmen, Klaas ,  VELDHUIS, Gerjan, Peter ,  KWAN, Yim-Bun, Patrick

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70733 ,  B23Q1/621 ,  B23Q1/623 ,  B23Q11/0032 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/709 ,  H01L21/682

    摘要： A positioning device (3) suitable for use in a lithographic device with an exposure position and a characterization position has a displacement system (35) comprising a first displacement unit (39) and a second displacement unit (41) to which object holders (21, 23) can be coupled alternately. The first displacement unit is suitable for carrying out a first series of positioning steps of a first object holder (21) in a first position and for displacing the first object holder from the first position into an intermediate position (M', M'') between the first position and a second position. The second displacement unit is suitable for carrying out a second series of positioning steps of a second object holder (23) in the second position simultaneously with an independently from the first displacement unit and for displacing the second object holder from the second position into the intermediate position. In the intermediate position, the object holders are exchanged, after which the first series of positioning steps can be carried out by the first displacement unit with the second object holder in the first position and the second series of positioning steps can be carried out by the second displacement unit with the first object holder in the second position.

    POSITIONING DEVICE HAVING THREE COIL SYSTEMS MUTUALLY ENCLOSING ANGLES OF 120 DEGREES, AND LITHOGRAPHIC DEVICE COMPRISING SUCH A POSITIONING DEVICE
    9.
    发明授权
    POSITIONING DEVICE HAVING THREE COIL SYSTEMS MUTUALLY ENCLOSING ANGLES OF 120 DEGREES, AND LITHOGRAPHIC DEVICE COMPRISING SUCH A POSITIONING DEVICE 有权
    以120度的相对于彼此COIL的角度三个对准装置，该EQUIPPED光刻设备

    公开(公告)号：EP0963572B1

    公开(公告)日：2004-09-29

    申请号：EP98946687.5

    申请日：1998-10-22

    申请人： ASML Netherlands B.V.

    发明人： SPERLING, Frank, Bernard ,  LOOPSTRA, Erik, Roelof ,  PEIJNENBURG, Antonius, Theodorus, Adrianus

    IPC分类号： G03F9/00 ,  G03F7/20

    CPC分类号： G03F7/70716 ,  Y10T74/20341

    摘要： The invention relates to a positioning device (3) comprising a first part (33) and a second part (35) having an object table (5). The second part can be displaced relative to the first part parallel to an X-direction and parallel to a Y-direction which is perpendicular to the X-direction and can be rotated relative to the first part about an axis of rotation (73) directed parallel to a Z-direction which is perpendicular to the X-direction and perpendicular to the Y-direction by means of three motors (75, 77, 79) which each comprises a permanent-magnet system (97, 99, 101) and an electrical-coil system (81, 83, 85) cooperating with the permanent-magnet system. The electrical-coil systems each comprises windings which are mainly directed parallel to a main axis (87, 89, 91) of the electrical-coil system which is directed perpendicularly to the Z-direction. According to the invention, the main axis of each of the three motors encloses an angle of substantially 120° with the main axis of each of the two other motors. In this manner, the points of application on the second part of the driving forces of the three motors are uniformly distributed relative to the second part, so that the driving forces can be uniformly transmitted to the object table by means of a relatively light and simple stiffening structure (119) of the second part. In a special embodiment of the positioning device, the main axes of the three motors are mutually arranged in a star-shaped configuration. In a further embodiment of the positioning device (3'), the main axes (87', 89', 91') of the three motors (75', 77', 79') are mutually arranged in a triangular configuration. The positioning device is used in a lithographic device according to the invention for displacing a substrate table (5) of the lithographic device relative to a focusing unit of the lithographic device.