公开(公告)号：EP2082288A1

公开(公告)日：2009-07-29

申请号：EP07804999.6

申请日：2007-09-24

申请人： AZ Electronic Materials USA Corp.

发明人： ABDALLAH, David ,  DAMMEL, Ralph, R.

IPC分类号： G03F7/09 ,  G03F7/20

CPC分类号： G03F7/091 ,  G03F7/2041

摘要： The present invention relates to a spin-on anti reflective coating composition for a photoresist comprising a polymer, a crosslinking compound and a thermal acid generator, where the polymer comprises at least one functional moiety capable of increasing the refractive index of the anti reflective coating composition to a value equal or greater than 1.8 at exposure radiation used for imaging the photoresist and a functional moiety capable of absorbing exposure radiation used for imaging the photoresist. The invention further relates to a process for imaging the antireflective coating of the present invention.

公开(公告)号：EP2132253A1

公开(公告)日：2009-12-16

申请号：EP08709885.1

申请日：2008-02-25

申请人： AZ Electronic Materials USA Corp.

发明人： ZHANG, Ruzhi ,  ABDALLAH, David ,  LU, PingHung ,  NEISSER, Mark

IPC分类号： C08G77/06 ,  C09D183/06 ,  G03F7/075 ,  H01L21/312

CPC分类号： C09D183/06 ,  C08G77/06 ,  G03F7/0752 ,  G03F7/091 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122

摘要： The present invention relates to process for making a siloxane polymer which comprises at least one Si-OH group and at least one Si-OR group, where R is a moiety other than hydrogen, comprising reacting one or more silane reactants together in the presence of a hydrolysis catalyst in either a water/alcohol mixture or in one or more alcohols to form the siloxane polymer; and separating the siloxane polymer from the water/alcohol mixture or the alcohol(s).

公开(公告)号：EP2004725A1

公开(公告)日：2008-12-24

申请号：EP07733970.3

申请日：2007-03-06

申请人： AZ Electronic Materials USA Corp.

发明人： ABDALLAH, David ,  HOULIHAN, Francis

IPC分类号： C08G75/20 ,  G03F7/039

CPC分类号： G03F7/091 ,  C08G75/20 ,  C08G75/22 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/111

摘要： Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or Ϝ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.

摘要翻译： 包含至少一个磺酰基的碱溶性聚合物，其中相对于磺酰基的α-位和/或/位和/或γ位上的至少一个碳原子具有羟基，其中羟基被保护或 描述不受保护的。

公开(公告)号：EP2297610A1

公开(公告)日：2011-03-23

申请号：EP09742415.4

申请日：2009-03-30

申请人： AZ Electronic Materials USA Corp.

发明人： MCKENZIE, Douglas ,  ABDALLAH, David ,  TIMKO, Allen, G. ,  RAHMAN, M., Dalil

IPC分类号： G03F7/075 ,  G03F7/09

CPC分类号： G03F7/091

摘要： The invention relates to an anti reflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3), where R
1 to R
9 is independently selected from H and C
1 -C
6 alkyl, R' and R" is independently selected from H and C
1 -C
6 alkyl, X is C
1 -C
6 alkylene, Y is C
1 -C
6 alkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.

公开(公告)号：EP2158279A2

公开(公告)日：2010-03-03

申请号：EP08751011.1

申请日：2008-05-20

申请人： AZ Electronic Materials USA Corp.

发明人： HOULIHAN, Francis ,  ABDALLAH, David ,  RAHMAN, M., Dalil ,  MCKENZIE, Douglas ,  ZHANG, Ruzhi ,  TIMKO, Allen, G. ,  KIM, Wookyu ,  LU, Ping-Hung

IPC分类号： C09D165/00

CPC分类号： C09D165/00 ,  G03F7/091 ,  H01L21/0276

摘要： The present invention relates to an organic spin coatable anti reflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moiety in the backbone of the polymer. The invention further relates to a process for imaging the present composition.

公开(公告)号：EP2158279B1

公开(公告)日：2012-08-29

申请号：EP08751011.1

申请日：2008-05-20

申请人： AZ Electronic Materials USA Corp.

发明人： HOULIHAN, Francis ,  ABDALLAH, David ,  RAHMAN, M., Dalil ,  MCKENZIE, Douglas ,  ZHANG, Ruzhi ,  TIMKO, Allen, G. ,  KIM, Wookyu ,  LU, Ping-Hung

IPC分类号： C09D165/00

CPC分类号： C09D165/00 ,  G03F7/091 ,  H01L21/0276

公开(公告)号：EP2004725B1

公开(公告)日：2009-10-07

申请号：EP07733970.3

申请日：2007-03-06

申请人： AZ Electronic Materials USA Corp.

发明人： ABDALLAH, David ,  HOULIHAN, Francis

IPC分类号： C08G75/20 ,  G03F7/039

CPC分类号： G03F7/091 ,  C08G75/20 ,  C08G75/22 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/111

摘要： Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or Ϝ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.

公开(公告)号：EP2121857B1

公开(公告)日：2014-06-04

申请号：EP08709863.8

申请日：2008-02-15

申请人： AZ Electronic Materials USA Corp.

发明人： WU, Hengpeng ,  KIM, Wookyu ,  ZHUANG, Hong ,  LU, PingHung ,  NEISSER, Mark ,  ABDALLAH, David ,  ZHANG, Ruzhi

IPC分类号： C09D183/04 ,  H01L21/312 ,  C08G77/06

CPC分类号： C09D183/04 ,  C08G77/06

公开(公告)号：EP2183292A2

公开(公告)日：2010-05-12

申请号：EP08789081.0

申请日：2008-08-11

申请人： AZ Electronic Materials USA Corp.

发明人： XIANG, Zhong ,  SHAN, Jianhui ,  YIN, Jian ,  ABDALLAH, David

IPC分类号： C08G12/12 ,  C08G12/32 ,  C08L61/32 ,  G03F7/09

CPC分类号： C08G12/12 ,  C08G12/32 ,  C08L61/32 ,  G03F7/091

摘要： An antireflective coating composition which forms films with high n values is described.

公开(公告)号：EP2129733A2

公开(公告)日：2009-12-09

申请号：EP08709884.4

申请日：2008-02-18

申请人： AZ Electronic Materials USA Corp.

发明人： ABDALLAH, David ,  ZHANG, Ruzhi

IPC分类号： C09D183/06 ,  G03F7/075 ,  H01L21/312

CPC分类号： C09D183/06 ,  G03F7/0752 ,  G03F7/091 ,  H01L21/02126 ,  H01L21/02137 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122

摘要： The present invention relates to an antireflecting coating composition which is capable of forming a crosslinked coating underneath a layer of photoresist comprising a silicon polymer, where the silicon polymer comprises at least one unit with the structure 1, where, R1 is selected from C1-C4 alkyl. The invention also relates to a process for imaging this composition.