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    Common deposition platform, processing station and method of operation thereof
    3.
    发明公开
    Common deposition platform, processing station and method of operation thereof 审中-公开
    HerkömmlicheAbscheidungsplattform，Verarbeitungsstation und Betriebsverfahrendafür

    公开(公告)号：EP2762609A1

    公开(公告)日：2014-08-06

    申请号：EP13153498.4

    申请日：2013-01-31

    申请人： Applied Materials, Inc.

    发明人： Morrison, Neil ,  Dieguez-Campo, Jose Manuel ,  Landgraf, Heike ,  Stolley, Tobias ,  HEIN, Stefan ,  Ries, Florian ,  Buschbeck, Wolfgang

    IPC分类号： C23C16/455 ,  C23C16/54 ,  H01J37/32 ,  H05H1/24

    CPC分类号： C23C16/545 ,  C23C16/45517 ,  C23C16/45519 ,  C23C16/50 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32568 ,  H01J37/32752 ,  H01J37/32761 ,  H01J37/3277

    摘要： An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate along a surface of the substrate support through a first vacuum processing region and at least one second vacuum processing region, a first deposition sources corresponding to the first processing region and at least one second deposition source corresponding to the at least one second vacuum processing region, wherein at least the first deposition source includes: an electrode having a surface, wherein the surface of the electrode opposes the surface of the substrate support, a processing gas inlet and a processing gas outlet, wherein the processing gas inlet and the processing gas outlet are arranged at opposing sides of the surface of the electrode, and at least one separation gas inlet having one or more separation gas inlet openings, wherein the one or more separation gas inlet openings are at least provided at one of opposing sides of the surface of the electrode such that the processing gas inlet and/or the processing gas outlet are provided between the one or more separation gas inlet openings and the surface of the electrode. The apparatus further includes one or more vacuum flanges providing at least a further gas outlet between the first deposition source and the at least one second deposition source.

    摘要翻译： 描述了一种用于在衬底上沉积薄膜的设备。 该设备包括一个衬底支撑件，该衬底支撑件具有外表面，用于通过第一真空处理区域和至少一个第二真空处理区域沿衬底支撑件的表面引导衬底，对应于第一处理区域的第一沉积源和至少一个 第二沉积源对应于所述至少一个第二真空处理区域，其中至少所述第一沉积源包括：具有表面的电极，其中所述电极的表面与所述基板支撑件的表面相对，处理气体入口和处理 气体出口，其中处理气体入口和处理气体出口布置在电极的表面的相对侧，以及至少一个具有一个或多个分离气体入口的分离气体入口，其中一个或多个分离气体入口 至少设置在电极的表面的相对侧中的一个处，使得该处理 气体入口和/或处理气体出口设置在一个或多个分离气体入口与电极的表面之间。 该装置还包括一个或多个真空凸缘，其在第一沉积源和至少一个第二沉积源之间提供至少另外的气体出口。

    Gas separation by adjustable separation wall
    5.
    发明公开
    Gas separation by adjustable separation wall 审中-公开
    Gastrennung durch einstellbare Trennwand

    公开(公告)号：EP2762608A1

    公开(公告)日：2014-08-06

    申请号：EP13153501.5

    申请日：2013-01-31

    申请人： Applied Materials, Inc.

    发明人： Lotz, Hans-Georg ,  Morrison, Neil ,  Dieguez-Campo, Manuel Jose ,  Landgraf, Heike ,  Stolley, Tobias ,  HEIN, Stefan ,  Ries, Florian ,  Buschbeck, Wolfgang

    IPC分类号： C23C14/56 ,  H01J37/32

    CPC分类号： C23C16/458 ,  C23C14/562 ,  C23C16/45519 ,  C23C16/545 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32761 ,  H01J37/3277 ,  Y10T29/49826

    摘要： An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.

    摘要翻译： 描述了一种用于在柔性基板上涂覆薄膜的设备。 该设备包括：涂层滚筒，其具有用于引导柔性基板穿过第一真空处理区域和至少一个第二真空处理区域的外表面;气体分离单元，用于分离第一真空处理区域和至少一个第二真空处理区域;以及 适于形成狭缝，柔性基底可以通过该狭缝在涂布滚筒的外表面和气体分离单元之间通过，其中气体分离单元适于通过调节第一处理区域和第二处理区域之间的流体连通 气体分离单元的位置。

    VACUUM PROCESSING SYSTEM AND METHOD FOR MOUNTING A PROCESSING SYSTEM
    9.
    发明公开
    VACUUM PROCESSING SYSTEM AND METHOD FOR MOUNTING A PROCESSING SYSTEM 审中-公开
    VERFAHREN ZUR MONTAGE EINES VERARBEITUNGSSYSTEMS VAKUUMVERARBEITUNGSSYSTEM

    公开(公告)号：EP3126541A1

    公开(公告)日：2017-02-08

    申请号：EP14715572.5

    申请日：2014-04-02

    申请人： Applied Materials, Inc.

    发明人： RIES, Florian ,  HEIN, Stefan ,  HENRICH, Jürgen ,  SAUER, Andreas

    IPC分类号： C23C14/52 ,  C23C14/56 ,  C23C16/54

    CPC分类号： C23C14/24 ,  C23C14/52 ,  C23C14/56 ,  C23C14/562 ,  C23C16/54 ,  C23C16/545

    摘要： A vacuum processing system for a flexible substrate is provided. The processing system includes a first chamber adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate; a second chamber adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate; a maintenance zone between the first chamber and the second chamber; and a first process chamber for depositing material on the flexible substrate, wherein the second chamber is provided between the maintenance zone and the first process chamber. The maintenance zone allows for maintenance access to at least one of the first chamber and the second chamber.

    摘要翻译： 提供了一种用于柔性基底的真空处理系统。 处理系统包括适于容纳用于提供柔性基板的供应辊之一和用于存储柔性基板的卷取辊的第一室; 第二室，适于容纳用于提供柔性基板的供应辊中的一个;以及用于存储柔性基板的卷取辊; 第一室和第二室之间的维护区; 以及用于在柔性基板上沉积材料的第一处理室，其中第二室设置在维护区和第一处理室之间。 维护区允许对第一室和第二室中的至少一个进行维护。

    EVAPORATION UNIT AND VACUUM COATING APPARATUS
    10.
    发明公开
    EVAPORATION UNIT AND VACUUM COATING APPARATUS 审中-公开
    蒸发站和真空镀膜设备

    公开(公告)号：EP2646594A1

    公开(公告)日：2013-10-09

    申请号：EP10784314.6

    申请日：2010-12-01

    申请人： Applied Materials, Inc.

    发明人： HEIN, Stefan ,  HOFFMANN, Gerd

    IPC分类号： C23C14/56

    CPC分类号： C23C14/24 ,  C23C14/562

    摘要： Vacuum coating apparatus for coating a web includes a first rotatable coating drum and a second rotatable coating drum disposed parallel to the first drum with a gap formed between the first and the second coating drums for transporting at least one web. A first evaporator has at least one evaporation source for generating a first evaporation beam, wherein the first evaporator is arranged next to the first coating drum. A second evaporator has at least one evaporation source for generating a second evaporation beam, wherein the second evaporator is arranged next to the second coating drum. The first and the second evaporators are inclined relative to each other.