THERMOLABILE VORLÄUFER-VERBINDUNGEN ZUR VERBESSERUNG DER INTERPARTIKULÄREN KONTAKTSTELLEN UND ZUM AUFFÜLLEN DER ZWISCHENRÄUME IN HALBLEITENDEN METALLOXIDPARTIKELSCHICHTEN
    1.
    发明公开
    THERMOLABILE VORLÄUFER-VERBINDUNGEN ZUR VERBESSERUNG DER INTERPARTIKULÄREN KONTAKTSTELLEN UND ZUM AUFFÜLLEN DER ZWISCHENRÄUME IN HALBLEITENDEN METALLOXIDPARTIKELSCHICHTEN 审中-公开
    不耐热的前体化合物用于改善间的联络点和填充房间之间的一半官员METALLOXIDPARTIKELSCHICHTEN

    公开(公告)号:EP2443650A1

    公开(公告)日:2012-04-25

    申请号:EP10725447.6

    申请日:2010-06-15

    Applicant: BASF SE

    Abstract: The present invention relates to a method for producing a layer containing at least one semiconductive metal oxide on a substrate, comprising at least the following steps: (A) a porous layer comprising at least one semiconductive metal oxide is applied to a substrate, (B) the porous layer from step (A) is treated with a solution containing at least one precursor compound of the semiconductive metal oxide, so that the pores of the porous layer are at least partially filled with this solution, and (C) the layer obtained in step (B) is heat-treated in order to convert at least one precursor compound of the semiconductive metal oxide into the semiconductive metal oxide, wherein the at least one precursor compound of the at least one semiconductive metal oxide is selected in step (B) from the group comprising carboxylates of monocarboxylic acids, dicarboxylic acids or polycarboxylic acids with at least three carbon atoms or derivatives of monocarboxylic acids, dicarboxylic acids or polycarboxylic acids, alcoholates, hydroxides, semicarbazides, carbamates, hydroxamates, isocyanates, amidines, amidrazones, urea derivatives, hydroxylamines, oximes, oximates, urethanes, ammonia, amines, phosphines, ammonium compounds, nitrates, nitrides or azides of the relevant metal and mixtures thereof.

    VERFAHREN ZUR HERSTELLUNG VON HALBLEITENDEN SCHICHTEN
    2.
    发明公开
    VERFAHREN ZUR HERSTELLUNG VON HALBLEITENDEN SCHICHTEN 审中-公开
    用于生产半导体层

    公开(公告)号:EP2425038A2

    公开(公告)日:2012-03-07

    申请号:EP10715825.5

    申请日:2010-04-26

    Applicant: BASF SE

    Abstract: The present invention relates to a method for producing a layer containing at least one semiconductive metal oxide on a substrate, comprising at least the steps of: (A) producing a solution containing at least one precursor compound of the at least one metal oxide selected from the group of carboxylates from monocarboxylic, dicarbonic, or polycarboxylic acids with at least three carbon atoms or derivatives of monocarboxylic, dicarbonic, or polycarboxylic acids, alcoholates, hydroxides, semicarbazides, carbamates, hydroxamates, isocyanates, amidins, amidrazones, carbamide derivatives, hydroxylamines, oximes, urethanes, ammonia, amines, phosphines, ammonium compounds, azides of the corresponding metal and compounds thereof, in at least one solvent; (B) application of the solvent of step (A) on the substrate; and (C) thermal treatment of the substrate of step (B) at a temperature of 20 to 200 degrees Celsius, in order to transfer the at least one precursor compound in at least one semiconductive metal oxide. In the event that in step (A), electrically neutral [(OH)
    x (NH
    3 )
    y Zn]
    z with x, y, and z independently from one another 0.01 to 10, is used as precursor compound, said precursor compound is obtained by conversion of zinc oxide or zinc hydroxide with ammonia; a substrate, which is coated with at least one semiconductive metal oxide, obtainable by said method; the application of said substrate in electronic components; and a method for producing electronically neutral [(OH)
    x (NH
    3 )
    y Zn]
    z with x, y, and z independently from one another 0.01 to 10, by conversion of zinc oxide and/or zinc hydroxide with ammonia.

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