SULPHONIUM SALT INITIATORS
    2.
    发明公开
    SULPHONIUM SALT INITIATORS 有权
    硫磺盐引发剂

    公开(公告)号:EP2197840A1

    公开(公告)日:2010-06-23

    申请号:EP08804850.9

    申请日:2008-09-29

    Applicant: BASF SE

    Abstract: Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5- C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2- C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and inter- rupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1- C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6- C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6- C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

    Abstract translation: 其中X是单键,CRaRbO,S,NRC,NCORC,CO,SO或SO 2的式(I)化合物; L,L 1,L 2,L 3,L 4,L 5,L 6,L 7和L 8是例如氢,R 1或COT; T表示T1或O-T2; T 1和T 2例如是氢,C 1 -C 20烷基,C 3 -C 12环烷基,C 2 -C 20烯基,C 5 -C 12环烯基,C 6 -C 14芳基,C 3 -C 12杂芳基,被一个或多个D取代的C 1 -C 20烷基, E,被一个或多个D取代并被一个或多个E或Q中断的C2-C20烷基; R1,R2,R3,R4,Ra,Rb和Rc是T1; D例如是R5,OR5,SR5或Q1; E例如是O,S,COO或Q2; 例如R5和R6是氢,C1-C12烷基或苯基; Q为例如C 6 -C 12双环烷基,C 6 -C 12双环烯基或C 6 -C 12三环烷基; Q1是例如C6-C14芳基或C3-C12杂芳基; Q2是例如C 6 -C 14亚芳基或C 3 -C 12杂亚芳基; Y是阴离子; M是阳离子; 条件是L,L1,L2,L3,L4,L5,L6,L7和L8中的至少一个不是氢; 并且(i)T1或T2中的至少一个是Q组; 或(ii)至少一个D是基团Q1; 或(iii)至少一个E是基团Q2; 适合作为潜光催化剂。

    OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS
    6.
    发明授权
    OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 有权
    肟衍生物及其用途为递延酸

    公开(公告)号:EP1320785B1

    公开(公告)日:2010-02-17

    申请号:EP01985295.3

    申请日:2001-09-18

    Applicant: BASF SE

    CPC classification number: G03F7/0392 B33Y70/00 G03F7/0045 G03F7/0382

    Abstract: New oxime sulfonate compounds of formula (I, II, III, IV, V, VI and VII) wherein R1 is for example C1-C18 alkylsulfonyl, R2 is halogen or C1-C10 haloalkyl; R3 is for example unsubstituted or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar1 is for example a direct bond, C1-C12 alkylene; -O-C-bond or a O-Si-bond which cleaves upon the action of an acid; A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11 and A12 are for example a direct bond, -O-, or S-, or are C1-C12 alkylene or phenylene unsubstituted or substituted; Y1 is C1-C12 alkylene which is for example subsituted by OR4, or SR7; Y2 is e.g. a trivalent radical of C1-C12 alkylene; Y3 is e.g. a tetravalent radical of C1-C12 alkylene; X is halogen; Ar'1 is for example C1-C12 alkyl which is unsubstituted or substituted; Ar'1 is for example phenylene; provided that at least one of the radicals Ar'1, Ar'1, is substituted by 1 to 3 groups of (VIII), (IX), (X), (XI), (XII) and/or (XIII); M+ is e.g. (XIV); L- is for example halogen; R¿15?, R16, R17 and R18 are e.g. hydrogen or phenyl; R19, R20, R21, R22 and R23 are e.g. phenyl; are especially suitable for the preparation of photoresists.

    6H-PYRROLO[3,2-B:4,5-B']BIS[1,4]BENZOTHIAZINE-6-CARBOXYLIC ACID ESTERS AS ORGANIC SEMICONDUCTOR MATERIALS FOR USE IN ELECTRONIC DEVICES
    7.
    发明公开
    6H-PYRROLO[3,2-B:4,5-B']BIS[1,4]BENZOTHIAZINE-6-CARBOXYLIC ACID ESTERS AS ORGANIC SEMICONDUCTOR MATERIALS FOR USE IN ELECTRONIC DEVICES 审中-公开
    6H-PYRROLO [3,2-B:4,5-B'] BIS [1,4]苯并吖嗪-6-羧酸酯用作电子器件

    公开(公告)号:EP3233868A1

    公开(公告)日:2017-10-25

    申请号:EP15810633.6

    申请日:2015-12-16

    Applicant: BASF SE

    CPC classification number: H01L51/0071 C07D513/14 H01L51/0562

    Abstract: The present invention provides compounds of formula (I) wherein X is O, S or NR10,wherein R10 is H, C1-30-alkyl, substituted C1-30-alkyl, C2-30-alkenyl, substituted C2-30-alkenyl, C2-30-alkynyl, substituted C2-30-alkynyl or C(0)-OR11, R1 and R11 are independently from each other selected from the group consisting of C1-30-alkyl, substituted C1-30-alkyl, C2-30-alkenyl, substituted C2-30-alkenyl, C2-30-alkynyl, substituted C2-30-alkynyl, C5-8-cycloalkyl, substituted C5-8-cycloalkyl, C5-8-cycloalkenyl, and substituted C5-8-cycloalkenyl, and an electronic device comprising the compounds as semiconducting material.

    Abstract translation: 本发明提供了式(I)的化合物,其中X是O,S或NR 10,其中R 10是H,C 1-30烷基,取代的C 1-30烷基,C 2-30链烯基,取代的C 2-30-链烯基,C 2-30炔基,取代的C 2-30炔基或C(O)-OR 11,R 1和R 11彼此独立地选自C 1-30 - 烷基,取代的C 1-30烷基,C 2-30烯基,取代的C 2-30烯基,C 2-30炔基,取代的C 2-30炔基,C 5-8 - 环烷基,取代的C 5 -8-环烷基,C 5-8 - 环烯基和取代的C 5-8 - 环烯基的化合物,以及包含所述化合物作为半导体材料的电子器件。

    LATENT ACIDS AND THEIR USE
    9.
    发明公开
    LATENT ACIDS AND THEIR USE 审中-公开
    LATENTESÄURENUND IHRE VERWENDUNG

    公开(公告)号:EP2539316A1

    公开(公告)日:2013-01-02

    申请号:EP11702482.8

    申请日:2011-02-10

    Applicant: BASF SE

    Abstract: The invention pertains to a compound generating an acid of the formula (I) or (II), for instance corresponding sulfonium and iodonium salts, as well as corresponding sulfonyloximes, Formula (I) and Formula (II), wherein X is CH
    2 or CO; Y is O, NR
    4 , S, O(CO), O(CO)O, O(CO)NR
    4 , OSO
    2 , O(CS), or O(CS)NR
    4 ; R
    1 is for example C
    1 -C
    18 alkyl, C
    1 -C
    10 haloalkyl, C
    2 -C
    12 alkenyl, C
    4 -C
    30 cycloalkenyl, phenyl-C
    1 -C
    3 -alkyl, C
    3 -C
    30 cycloalkyl, C
    3 -C
    30 cycloalkyl-C
    1 -C
    18 alkyl, interrupted C
    2 -C
    18 alkyl, interrupted C
    3 -C
    30 cycloalkyl, interrupted C
    3 -C
    30 cycloalkyl-C
    1 -C
    18 alkyl, interrupted C
    4 -C
    30 cycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or heteroaryl, all unsubstituted or are substituted; or R
    1 is NR
    12 R
    13 ; R
    2 and R
    3 are for example C
    3 -C
    30 cycloalkylene, C
    3 -C
    30 cycloalkyl-C
    1 -C
    18 alkylene, C
    1 -C
    18 alkylene, C
    1 -C
    10 haloalkylene, C
    2 -C
    12 alkenylene, C
    4 -C
    30 cycloalkenylene, phenylene, naphthylene, anthracylene, phenanthrylene, biphenylene or heteroarylene; all unsubstituted or substituted; R
    4 is for example C
    3 -C
    30 cycloalkyl, C
    3 -C
    30 cycloalkyl-C
    1 -C
    18 alkyl, C
    1 -C
    18 alkyl, C
    1 -C
    10 haloalkyl, C
    2 -C
    12 alkenyl, C
    4 -C
    30 cycloalkenyl, phenyl-C
    1 -C
    3 -alkyl; R
    12 and R
    13 are for example C
    3 -C
    30 cycloalkyl, C
    3 -C
    30 cycloalkyl-C
    1 -C
    18 alkyl, C
    1 -C
    18 alkyl, C
    1 -C
    10 haloalkyl, C
    2 -C
    12 alkenyl, C
    4 -C
    30 cycloalkenyl, phenyl-C
    1 -C
    3 -alkyl, Ar, (CO)R
    15 , (CO)OR
    15 or SO
    2 R
    15 ; and Ar is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl or heteroaryl, all unsubstituted or substituted.

    Abstract translation: 本发明涉及产生式(I)或(II)的酸的化合物,例如相应的锍盐和碘鎓盐,以及相应的磺酰肟,式(I)和式(II),其中X是CH 2或CO ; Y是O,NR4,S,O(CO),O(CO)O,O(CO)NR4,OSO2,O(CS)或O(CS)NR4; R1是例如C1-C18烷基,C1-C10卤代烷基,C2-C12链烯基,C4-C30环烯基,苯基-C1-C3-烷基,C3-C30环烷基,C3-C30环烷基-C1-C18烷基,间断的C 2 -C 18烷基,间断的C 3 -C 30环烷基, 间断的C 3 -C 30环烷基-C 1 -C 18烷基,间断的C 4 -C 30环烯基,苯基,萘基,蒽基,菲基,联苯基,芴基或杂芳基,全部未取代或被取代; 或R1为NR12R13; R 2和R 3例如为C 3 -C 30亚环烷基,C 3 -C 30环烷基-C 1 -C 18亚烷基,C 1 -C 18亚烷基,C 1 -C 10卤代亚烷基,C 2 -C 12亚烯基,C 4 -C 30亚环烯基,亚苯基,亚萘基,亚蒽基,亚菲基,亚联苯基或亚杂芳基。 全部未取代或取代; R4是例如C 3 -C 30环烷基,C 3 -C 30环烷基-C 1 -C 18烷基,C 1 -C 18烷基,C 1 -C 10卤代烷基,C 2 -C 12链烯基,C 4 -C 30环烯基,苯基-C 1 -C 3烷基; R 12和R 13例如为C 3 -C 30环烷基,C 3 -C 30环烷基-C 1 -C 18烷基,C 1 -C 18烷基,C 1 -C 10卤代烷基,C 2 -C 12烯基,C 4 -C 30环烯基,苯基-C 1 -C 3烷基,Ar,(CO)R 15( CO)OR15或SO2R15; 并且Ar是苯基,联苯基,芴基,萘基,蒽基,菲基或杂芳基,全部是未取代或取代的。

    SULFONIUM DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS
    10.
    发明公开
    SULFONIUM DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 审中-公开
    锍衍生物和它们作为递延ACIDS

    公开(公告)号:EP2288599A1

    公开(公告)日:2011-03-02

    申请号:EP09761637.9

    申请日:2009-06-02

    Applicant: BASF SE

    CPC classification number: C07D339/08 C07D327/08

    Abstract: Compounds of the formula (I), wherein R
    1 , R
    2 and R
    3 for example are hydrogen, halogen, CN, C
    1 -C
    18 alkyl, C
    1 -C
    10 haloalkyl, (CO)R
    8 , (CO)OR
    4 , or (CO)NR
    5 R
    6 ; Y is O, S or CO; D
    2 , D
    3 and D
    4 for example are a direct bond, O, S, NR
    7 , CO, O(CO), (CO)O, S(CO), (CO)S, NR
    7 (CO), (CO)NR
    7 , SO, SO
    2 , or OSO
    2 , C
    1 -C
    18 alkylene, C
    3 -C
    30 cycloalkylene, C
    2 -C
    12 alkenylene, C
    4 -C
    30 cycloalkenylene, Ar
    1 ; Ar
    1 , Ar
    2 and Ar
    3 are for example phenylene, R
    4 , R
    5 , R
    6 , R
    7 and R
    8 are for example hydrogen, C
    3 -C
    30 cycloalkyl, C
    1 -C
    18 alkyl, C
    1 -C
    10 haloalkyl, C
    2 -C
    12 alkenyl, C
    4 -C
    30 cycloalkenyl, phenyl-C
    1 C
    3 -alkyl; X
    - is Formulae (IA), (IB) or (IC); R
    10 is for example C
    1 -C
    18 alkyl, C
    1 -C
    10 haloalkyl, camphoryl, phenyl-C
    1 -C
    3 alkyl, C
    3 -C
    30 cycloalkyl; and R
    11 , R
    12 , R
    13 , R
    14 and R
    15 are for example C
    1 -C
    10 haloalkyl; are useful as polymerizable photolatent acids.

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