DISPOSITIF D'AFFICHAGE A PLASMA ET PROCEDE DE COMMANDE DE CELUI-CI
    5.
    发明授权
    DISPOSITIF D'AFFICHAGE A PLASMA ET PROCEDE DE COMMANDE DE CELUI-CI 有权
    等离子体显示设备及其控制方法

    公开(公告)号:EP1459345B1

    公开(公告)日:2007-06-20

    申请号:EP02799845.9

    申请日:2002-12-23

    IPC分类号: H01J11/00

    CPC分类号: H01J11/20 H01J11/12

    摘要: The invention concerns a plasma display device comprising in a screen a chamber (17) containing a discharge gas capable of being excited to generate, alone or in combination with luminophor means (18) themselves designed to be excited by a radiation emitted by said gas, a visible light. The device comprises means for generating on one side of said chamber (17) a uniformly distributed electric field (E) designed to ignite a plasma in the gas, as well as a matrix of controllable elements (19) and means controlling said elements (19) so that they modulate individually the electric field (E) or the radiation emitted by the plasma or the generated visible light thereby generating selectively luminous zones on the screen.

    APPLICATEUR MICRO-ONDE COAXIAL POUR LA PRODUCTION DE PLASMA
    9.
    发明公开
    APPLICATEUR MICRO-ONDE COAXIAL POUR LA PRODUCTION DE PLASMA 审中-公开
    KOAXIALER MIKROWELLENAPPLIKATOR ZUR PLASMAERZEUGUNG

    公开(公告)号:EP2873306A1

    公开(公告)日:2015-05-20

    申请号:EP13735269.6

    申请日:2013-07-10

    IPC分类号: H05H1/46

    摘要: The invention relates to a coaxial microwave applicator (1) for plasma production, comprising a coaxial tube formed by a central core (11) and an outer conductor (12) separated from the central core by an annular space (13) allowing propagation of microwaves. The applicator comprises: a cylindrical permanent magnet (21) disposed at the end of the central core (11); and at least one annular permanent magnet (22) disposed at the end of the outer conductor (12), all of the magnets (21, 22) disposed at the end of the coaxial tube (11, 12) having the same direction of magnetisation. The magnetisation of the magnets (21, 22) forms a magnetic field suitable for generating, in a zone (Z
    RCE ) away from the end of the applicator, an electronic cyclotronic resonance coupling with the electric microwave field of the applicator (1). The external radius and the magnetisation of the annular magnet are selected such that the magnetic field lines (L) generated by the magnets pass through the coupling zone in a direction substantially parallel to the axis (X) of the applicator (1).

    摘要翻译: 本公开包括用于等离子体生产的同轴微波施加器,包括由中心芯和外部导体形成的同轴管,所述同轴管由通过环形空间与中心芯分开,允许微波的传播。 涂敷器包括:设置在中心芯的端部处的圆柱形永磁体; 以及设置在外部导体的端部处的至少一个环形永磁体,设置在同轴管的端部处的所有磁体具有相同的磁化方向。 磁体的磁化形成适于在远离施加器端部的区域中产生与施加器的电微波场耦合的电子循环谐振耦合的磁场。 选择外部半径和环形磁体的磁化,使得由磁体产生的磁场线在基本上平行于施加器的轴线的方向上通过耦合区域。