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公开(公告)号：EP3068927A1
公开(公告)日：2016-09-21
申请号：EP14784375.9
申请日：2014-10-13
发明人： SHASHKOV, Pavel , USOV, Sergey
CPC分类号： H05K1/028 , C25D11/02 , C25D11/024 , H05K1/0237 , H05K1/0306 , H05K1/05 , H05K1/053 , H05K3/0044 , H05K3/28 , H05K3/44 , H05K2201/0116 , H05K2201/0175 , H05K2203/0315 , H05K2203/1147
摘要： A flexible electronic substrate (FES) includes a metallic layer, a dielectric nanoceramic layer formed by oxidation of a surface of the metallic layer, and an electrical circuit formed on a surface of the dielectric layer. The FES may be used for supporting a device, for example a flexible display, an OLED, an optoelectronic device, or a rf device. The dielectric nanoceramic layer has a crystalline structure consisting of substantially equiaxed grains having an average grain size of 100 nanometres or less, a thickness of between 1 micrometre and 50 micrometres, a dielectric strength of greater than 20 KV mm−1, and a thermal conductivity of greater than 3 W/mK. The FES has a minimum bend radius of lower than 25 cm.
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公开(公告)号：EP2673403B1
公开(公告)日：2018-11-14
申请号：EP12706093.7
申请日：2012-02-07
IPC分类号： C25D5/18 , C25D11/00 , C25D11/04 , C25D11/26 , C25D11/30 , C25D11/32 , C25D13/02 , C25D21/12 , H01L23/14
CPC分类号： C25D5/18 , C25D11/00 , C25D11/005 , C25D11/02 , C25D11/024 , C25D11/026 , C25D11/04 , C25D11/06 , C25D11/26 , C25D11/30 , C25D11/32 , C25D13/02 , C25D15/00 , C25D21/12 , H01L23/142 , H01L23/3677 , H01L23/3735 , H01L2224/48227 , H01L2224/49109 , H01L2924/01327 , H01L2924/09701 , H01L2924/1305 , H01L2924/13055 , H05K1/021 , H05K1/053 , H05K1/115 , H05K1/18 , H05K2201/0116 , H05K2203/0315 , H05K2203/1147 , Y10T428/1317 , Y10T428/24917 , Y10T428/249969 , H01L2924/00
摘要： A method of forming a non-metallic coating on a metallic substrate involves the steps of positioning the metallic substrate in an electrolysis chamber and applying a sequence of voltage pulses of alternating polarity to electrically bias the substrate with respect to an electrode. Positive voltage pulses anodically bias the substrate with respect to the electrode and negative voltage pulses cathodically bias the substrate with respect to the electrode. The amplitude of the positive voltage pulses is potentiostatically controlled, whereas the amplitude of the negative voltage pulses is galvanostatically controlled.
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公开(公告)号：EP2673402B1
公开(公告)日：2017-08-16
申请号：EP12706092.9
申请日：2012-02-07
IPC分类号： C25D5/18 , C25D11/00 , C25D11/02 , C25D11/04 , C25D11/26 , C25D11/30 , C25D11/32 , C25D13/02 , C25D21/12 , C25D11/06 , H01L23/14 , H01L23/367 , H01L23/373 , H05K1/05
CPC分类号： C25D5/18 , C25D11/00 , C25D11/005 , C25D11/02 , C25D11/024 , C25D11/026 , C25D11/04 , C25D11/06 , C25D11/26 , C25D11/30 , C25D11/32 , C25D13/02 , C25D15/00 , C25D21/12 , H01L23/142 , H01L23/3677 , H01L23/3735 , H01L2224/48227 , H01L2224/49109 , H01L2924/01327 , H01L2924/09701 , H01L2924/1305 , H01L2924/13055 , H05K1/021 , H05K1/053 , H05K1/115 , H05K1/18 , H05K2201/0116 , H05K2203/0315 , H05K2203/1147 , Y10T428/1317 , Y10T428/24917 , Y10T428/249969 , H01L2924/00
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公开(公告)号：EP3069583A1
公开(公告)日：2016-09-21
申请号：EP14784376.7
申请日：2014-10-13
CPC分类号： H05K1/028 , C25D11/02 , C25D11/024 , H05K1/0237 , H05K1/0306 , H05K1/05 , H05K1/053 , H05K3/0044 , H05K3/28 , H05K3/44 , H05K2201/0116 , H05K2201/0175 , H05K2203/0315 , H05K2203/1147
摘要： A flexible electronic substrate (FES) includes a metallic layer, a dielectric nanoceramic layer formed by oxidation of a surface of the metallic layer, and an electrical circuit formed on a surface of the dielectric layer. The FES may be used for supporting a device, for example a flexible display, an OLED, an optoelectronic device, or a rf device. The dielectric nanoceramic layer has a crystalline structure consisting of substantially equiaxed grains having an average grain size of 100 nanometres or less, a thickness of between 1 micrometre and 50 micrometres, a dielectric strength of greater than 20 KV mm−1, and a thermal conductivity of greater than 3 W/mK. The FES has a minimum bend radius of lower than 25 cm.
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公开(公告)号：EP2673403A1
公开(公告)日：2013-12-18
申请号：EP12706093.7
申请日：2012-02-07
IPC分类号： C25D5/18 , C25D11/00 , C25D11/04 , C25D11/26 , C25D11/30 , C25D11/32 , C25D13/02 , C25D21/12 , H01L23/14
CPC分类号： C25D5/18 , C25D11/00 , C25D11/005 , C25D11/02 , C25D11/024 , C25D11/026 , C25D11/04 , C25D11/06 , C25D11/26 , C25D11/30 , C25D11/32 , C25D13/02 , C25D15/00 , C25D21/12 , H01L23/142 , H01L23/3677 , H01L23/3735 , H01L2224/48227 , H01L2224/49109 , H01L2924/01327 , H01L2924/09701 , H01L2924/1305 , H01L2924/13055 , H05K1/021 , H05K1/053 , H05K1/115 , H05K1/18 , H05K2201/0116 , H05K2203/0315 , H05K2203/1147 , Y10T428/1317 , Y10T428/24917 , Y10T428/249969 , H01L2924/00
摘要： A method of forming a non-metallic coating on a metallic substrate involves the steps of positioning the metallic substrate in an electrolysis chamber and applying a sequence of voltage pulses of alternating polarity to electrically bias the substrate with respect to an electrode. Positive voltage pulses anodically bias the substrate with respect to the electrode and negative voltage pulses cathodically bias the substrate with respect to the electrode. The amplitude of the positive voltage pulses is potentiostatically controlled, whereas the amplitude of the negative voltage pulses is galvanostatically controlled.
摘要翻译： 在金属基底上形成非金属涂层的方法包括以下步骤：将金属基底定位在电解室中，并且施加一系列具有交替极性的电压脉冲以使电极相对于电极偏置。 正电压脉冲相对于电极阳极偏置衬底，负电压脉冲相对于电极阴极偏置衬底。 正电压脉冲的幅度被电位控制，从而恒定地控制负电压脉冲的幅度。
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