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1.发明公开Inspection system by charged particle beam 审中-公开Untersuchungsvorrichtung mit geladenen teilchenstrahlen
公开(公告)号：EP2365512A2
公开(公告)日：2011-09-14
申请号：EP11004165.4
申请日：2001-06-27
发明人： Nakasuji, Mamoru , Noji, Nobuharu , Satake, Toru , Hatakeyama, Masahiro , Kimba, Toshifumi , Sobukawa, Hirosi , Yoshikawa, Shoji , Murakami, Takeshi , Watanabe, Kenji , Karimata, Tsutomu , Oowada, Shin , Saito, Mutsumi , Yamazaki, Yuichiro , Nagai, Takamitsu , Nagahama, Ichirota
IPC分类号： H01J37/063 , H01J37/29 , H01L21/027 , H01L21/66 , H01L21/677
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; ; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译： 电子束的检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子光学系统;以及用于检测由电子束投影的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳舞台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; ; 以及用于通过装载室将物体传送到舞台系统的装载器60。
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2.发明公开A tdi detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus 审中-公开装置TDI检测，实现系统，在该装置的电子束装置，以及设施和制造方法，具有该电子束装置的半导体器件
公开(公告)号：EP1936953A3
公开(公告)日：2009-12-30
申请号：EP08007124.4
申请日：2002-05-14
申请人： EBARA CORPORATION
IPC分类号： H04N3/15 , H01J37/26 , G01N21/956 , H01R13/00 , H01J37/22 , H01J37/244 , H01R13/24 , H04N5/225
CPC分类号： H01J37/222 , G01N21/956 , H01J37/224 , H01J37/244 , H01J2237/2445 , H01J2237/2447 , H01R13/2421 , H04N5/2253 , Y10S439/935
摘要： An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which the pin 52, the other pin 53 and the socket contact 54 together construct a connecting block, and the socket contact 54 has an elastic member 61. Accordingly, even if a large number of connecting blocks are provided, the connecting force may be kept to such a low level as to prevent the breakage in the sensor. The pin 53 is connected with the TDI sensor 64, in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system to as small as possible so that a maximal acceptable distortion within the field of view may be set larger. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.
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公开(公告)号：EP1914423A2
公开(公告)日：2008-04-23
申请号：EP08002135.5
申请日：1999-01-21
申请人： EBARA CORPORATION
发明人： Nomura, Norihiko , Noji, Nobuharu
摘要： The present invention provides a trap apparatus which is capable of increasing the trapping efficiency while fulfilling a conductance allowed by a vacuum chamber in a depositing process or the like, for thereby increasing the service life of a vacuum pump and protecting a toxic substance removing device for increased operation reliability, and reducing equipment and running costs. The trap apparatus has a trap unit (18) disposed in a discharge passage (14) for discharging therethrough a gas from a vacuum chamber (10) with a vacuum pump (12) for trapping and removing a product in a discharged gas. The trap unit (18) has trap passages comprising an upstream passage portion (44) spreading outwardly from the center and a downstream passage portion (42) directed inwardly toward the center.
摘要翻译： 本发明提供一种捕集装置，其能够在沉积过程等中实现真空室允许的导电性的同时提高捕集效率，从而提高真空泵的使用寿命并保护有毒物质去除装置 提高运行可靠性，降低设备运行成本。 捕集装置具有设置在排出通道（14）中的捕集单元（18），用于通过真空室（10）从真空室（10）中排出气体，用于在排放气体中捕获和去除产物。 捕集器（18）具有捕集通道，该通道包括从中心向外展开的上游通道部分（44）和向内朝向中心的下游通道部分（42）。
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公开(公告)号：EP0847789B1
公开(公告)日：2003-11-12
申请号：EP97122149.4
申请日：1997-12-16
申请人： EBARA CORPORATION
CPC分类号： C23C16/4412 , B01D53/002 , F25B21/02
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公开(公告)号：EP0809164B1
公开(公告)日：2001-09-05
申请号：EP97108201.1
申请日：1997-05-21
申请人： EBARA CORPORATION
发明人： Noji, Nobuharu , Kido, Koichi
IPC分类号： G05B19/414 , G05B19/05 , G05D16/20
CPC分类号： G05B19/4185 , F04B37/08 , F04B49/065 , F25B2400/06 , G05B2219/31102 , G05B2219/31103 , G05B2219/31104 , G05B2219/31105 , G05B2219/31115 , G05B2219/31123 , G05B2219/31206 , G05B2219/31237 , G05B2219/37252 , Y02P90/18
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公开(公告)号：EP0919722A2
公开(公告)日：1999-06-02
申请号：EP99104588.1
申请日：1995-04-26
申请人： EBARA CORPORATION
IPC分类号： F04B37/08
CPC分类号： F04B37/08 , F04B37/085 , F04B49/065 , F04B2205/01 , F04B2205/10 , Y10S417/901
摘要： A cryopump is provided with a detecting means for detecting an operation parameter at an elapsed operation time in a current operation cycle of the cryopump, a storing means for storing a value of another operation parameter in a past operation cycle of the cryopump as a management parameter, an arithmetic controlling means for calculating a succeeding rotational speed of the expander motor based on the current operational parameter and the management parameter stored in the storing means and outputting the same as a driving instruction signal, with which the succeeding rotational speed of the expander motor is controlled so as to maintain a temperature of a cryopanel or a pressure in a vacuum chamber to which the cryopump is attached at a predetermined value by using the operation parameter at the elapsed operation time in the current operation cycle of the cryopump detected by the detecting means and the operation parameter at the corresponding elapsed operation time in the past operation cycle of the cryopump stored in the storing means as the management parameter, and an expander motor driving means for driving the expander motor according to the driving instruction signal output from the arithmetic controlling means, whereby the cryopump may be operated stably even if a temporal load change has occurred.
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公开(公告)号：EP2190002B8
公开(公告)日：2016-09-14
申请号：EP10001779.7
申请日：2002-09-10
申请人： EBARA CORPORATION
发明人： Hatakeyama, Masahiro , Murakami, Takeshi , Satake, Tohru , Noji, Nobuharu , Nagahama, Ichirota , Yamazaki, Yuichiro
IPC分类号： H01J37/244 , H01J37/28 , H01J37/285
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446
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公开(公告)号：EP2557416A3
公开(公告)日：2013-02-27
申请号：EP12007216.0
申请日：2003-04-17
申请人： Ebara Corporation
IPC分类号： G01N23/227 , H01L21/66 , H01J37/28
CPC分类号： G03F7/162 , G01N23/225 , H01J37/285 , H01J2237/204 , H01J2237/2812 , H01J2237/2814 , H01J2237/2855 , H01J2237/2857
摘要： The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the surface of the sample. In the surface inspection method of the present invention, a resistive film having an arbitrarily determined thickness t1 is first coated on a surface of a sample. Thereafter, a part of the resistive film having the arbitrarily determined thickness t1 is dissolved in a solvent, to thereby reduce the thickness of the resistive film to a desired level. This enables precise control of a value of resistance of the resistive film and suppresses distortion of an image to be detected.
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公开(公告)号：EP2365512A3
公开(公告)日：2012-01-04
申请号：EP11004165.4
申请日：2001-06-27
发明人： Nakasuji, Mamoru , Noji, Nobuharu , Satake, Toru , Hatakeyama, Masahiro , Kimba, Toshifumi , Sobukawa, Hirosi , Yoshikawa, Shoji , Murakami, Takeshi , Watanabe, Kenji , Karimata, Tsutomu , Oowada, Shin , Saito, Mutsumi , Yamazaki, Yuichiro , Nagai, Takamitsu , Nagahama, Ichirota
IPC分类号： H01J37/063 , H01J37/29 , H01L21/027 , H01L21/66 , H01L21/677 , G01N23/225 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/67
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; ; and a loader 60 for transferring the object to the stage system through the loading chambers.
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10.发明公开Apparatus for detecting a fine geometry on a surface of a sample and method of manufacturing a semiconductor device 有权装置用于检测样品和方法的表面上的微细结构的用于制造半导体器件
公开(公告)号：EP1291900A3
公开(公告)日：2003-05-28
申请号：EP02020243.8
申请日：2002-09-10
发明人： Hatakeyama, Masahiro , Murakami, Takeshi , Satake, Tohru , Noji, Nobuharu , Nagahama, Ichirota , Yamazaki, Yuichiro
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446
摘要： A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.
摘要翻译： 用于样品的表面上检测精细的几何形状，worin照射光束的检测装置照射针对在不同的环境气氛的differentFrom和二次辐射从样品发出放置由传感器检测到的样品，并且所述worin 传感器设置在在不同的环境的内部布置为处理来自所述传感器的检测信号的处理装置在对不同环境的外部布置，并且一个传输装置从所述传感器到所述处理装置发送检测信号。
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