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公开(公告)号：EP1609026A2
公开(公告)日：2005-12-28
申请号：EP03799889.5
申请日：2003-12-11
发明人： NAIINI, Ahmad, A. , RUSHKIN, Ii'ya , HOPLA, Richard , WATERSON, Pamela, J. , WEBER, William, D.
CPC分类号： G03F7/094 , G03F7/11 , Y10T428/31721 , Y10T428/31725
摘要： A process for producing a heat resistant relief structure on a substrate, the process comprising the steps of: (a) providing a substrate; (b) in a first coating step, coating the substrate with a composition comprising a polyamic acid and gamma-butyrolactone to form a layer of polyamic acid having a thickness of at least about 0.5 umicro;m; (c) baking the layer of polyamic acid at a temperature or temperatures below 140 °C; (d) in a second coating step, coating a layer of a photoresist over the layer of polyamic acid to form a bilayer coating; (e) exposing the bilayer coating to radiation
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公开(公告)号：EP1609024B1
公开(公告)日：2015-09-30
申请号：EP04718478.3
申请日：2004-03-08
发明人： RUSHKIN, Ilya , NAIINI, Ahmad, A. , HOPLA, Richard, J. , WATERSON, Pamela, J. , WEBER, William, D.
CPC分类号： C08G73/22 , C08L79/00 , G03F7/0382 , G03F7/0387 , G03F7/0751 , Y10S430/107
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公开(公告)号：EP1885819A2
公开(公告)日：2008-02-13
申请号：EP06771813.0
申请日：2006-06-02
IPC分类号： C09K13/00
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/023 , G03F7/0233 , G03F7/0382 , G03F7/0392 , G03F7/0751 , Y10T428/12528
摘要： A pretreatment composition of (a) at least one compound having structure Vl wherein Y is selected from the group consisting of S, O, NR2, (HOCH)P, and each R1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is independently H, SH, CH3, C2H5, and a linear or branched C1-C4 alkyl group containing a thiol group; and wherein V1 and V2 are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can = 0 only when Y = n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R1 is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure Vl present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.
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公开(公告)号：EP1886187A2
公开(公告)日：2008-02-13
申请号：EP06771936.9
申请日：2006-06-02
IPC分类号： G03C1/00
CPC分类号： G03F7/023 , G03F7/022 , G03F7/0226 , G03F7/0233 , G03F7/0751 , G03F7/085
摘要： A photosensitive resin composition comprising: (d) at least one polybenzoxazole precursor polymer (e) at least one compound having structure VI : V1-Y-V2, wherein Y is selected from S, O, NR2, (HOCH)P , and Formula (A) each R1 is selected H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is selected from H, SH, CH3, C2H5, and a linear or branched C1-C4 alkyl group containing a thiol group; p is an integer of from 1 to 4, and wherein V1 and V2 are independently selected from the group consisting of Formula (B) and Formula (C) wherein, m is independently an integer from 0 to 4 with the proviso that m = 0 only when Y = Formula (D) n is an integer from 1 to 5; and each R1 is defined as above; and (f) at least one solvent; wherein the amount of the compound of Structure VI present is an amount effective to inhibit residue from forming when the composition is coated on a substrate and the substrate is subsequently processed to form an image, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (d) at least one photoactive compound is also present in the composition.
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公开(公告)号：EP1861749A2
公开(公告)日：2007-12-05
申请号：EP06739266.2
申请日：2006-03-22
IPC分类号： G03C1/00
CPC分类号： G03F7/023 , G03F7/0046 , G03F7/022 , G03F7/0233 , G03F7/038 , G03F7/0382 , G03F7/039 , G03F7/0751 , G03F7/085
摘要： A photosensitive resin composition comprising: (a) at least one polybenzoxazole precursor polymer; (b) at least one compound having Structure Vl wherein, V is CH or N, Y is O or NR3 wherein R3 is H, CH3 or C2H5, R1 and R2 each independently are H, C1 - C4 alkyl group, C1 - C4 alkoxy group, cyclopentyl or cyclohexyl, or alternatively, R1 and R2 can be fused to produce a substituted or unsubstituted benzene ring; and (c) at least one solvent; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the composition is coated on a substrate and the coated substrate is subsequently processed to form an image on the substrate, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety in the polymer, then (d) at least one photoactive compound is also present in the composition.. The present invention also concerns a process for forming a relief pattern and electronic parts using the composition.
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公开(公告)号：EP1606326A2
公开(公告)日：2005-12-21
申请号：EP04718820.6
申请日：2004-03-09
发明人： NAIINI, Ahmad, A. , RUSHKIN, Iyla , HOPLA, Richard , RACICOT, Don
IPC分类号： C08F36/00
CPC分类号： G03F7/023 , C08G73/18 , C08L79/04 , G03F7/0751 , G03F7/0757
摘要： New photosensitive PBO precursor polymers which contain diazoquinone moieties attached to its backbone and in which all amino end groups are converted into amide groups. The photosensitive formulation based on the disclosed PBO precursor polymers have good imaging and mechanical properties as well as superior shelf life stability. Photosensitive polybenzoxazole precursor polymers having (sulfon)amide end groups (with or without attached diazoquinone groups) can be formulated into photosensitive compositions with diazoquinone photoactive compounds which lack benzylic hydrogens on the backbone to yield compositions producing films significantly lighter in color after curing.
摘要翻译： 新的光敏PBO前体聚合物含有连接在其骨架上的重氮醌部分，并且其中所有的氨基端基都转化为酰胺基团。 基于公开的PBO前体聚合物的光敏制剂具有良好的成像和机械性能以及优越的储存期限稳定性。 具有（磺酰）酰胺端基（具有或不具有连接的重氮醌基团）的光敏聚苯并恶唑前体聚合物可以配制成具有在主链上缺少苄基氢的重氮醌光活性化合物的光敏组合物，以产生在固化后产生颜色明显较浅的膜的组合物。
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公开(公告)号：EP1946185A2
公开(公告)日：2008-07-23
申请号：EP06789760.3
申请日：2006-08-15
CPC分类号： G03F7/0233 , G03F7/023 , G03F7/0392 , G03F7/0751
摘要： A heat resistant positive-working photosensitive PBO precursor composition comprising: (a) at least one polybenzoxazole precursor polymer; (a) at least one plasticizer compound; (b) at least one solvent; wherein the amount of the plasticizer p resent i n the composition is an amount effective to reduce the sidewall angle of imaged and cured features in the coated film on the substrate to prevent stress failures in subsequent metallization of the substrate due to steep angles of the imaged features, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (c) at least one photoactive compound is also present in the composition.
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公开(公告)号：EP1636649A2
公开(公告)日：2006-03-22
申请号：EP04754154.5
申请日：2004-06-03
发明人： RUSHKIN, Il'ya , NAIINI, Ahmad, A. , HOPLA, Richard , WATERSON, Pamela, J. , WEBER, William, D. , POWELL, David, B.
IPC分类号： G03F1/00
CPC分类号： G03F7/038 , G03F7/0382 , G03F7/0751 , Y10S430/106
摘要： A heat resistant negative working photosensitive composition that comprises (a) one or more polybenzoxazole precursor polymers (I): wherein x is an integer from about 10 to about 1000, y is an integer from 0 to about 900 and (x+y) is about less then 1000; Ar 1 is a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof; Ar 2 is a divalent aromatic, a divalent heterocyclic, a divalent alicyclic, or a divalent aliphatic group that may contain silicon; Ar 3 is a divalent aromatic group, a divalent aliphatic group, a divalent heterocyclic group, or mixtures thereof; Ar 4 is Ar 1 (OH) 2 or Ar 2 ; G is a monovalent organic group a carbonyl, carbonyloxy or sulfonyl group; (b) one or more photo-active compounds which release acid upon irradiation (PAGs); (c) one or more latent crosslinkers each of which contains at least two ~N-(CH 2 OR) n units (n=1 or 2, wherein R is a linear or branched C 1 -C 8 alkyl group); (d) at least one solvent, and (e) at least one dissolution rate modifier, with the proviso that when the latent crosslinker is highly reactive, the dissolution rate modifier does not contain carboxylic acid groups.
摘要翻译： 一种耐热负型光敏组合物，其包含（a）一种或多种聚苯并恶唑前体聚合物（I）：其中x是约10至约1000的整数，y是0至约900的整数并且（x + y）是 大约少于1000; Ar 1是四价芳族基团，四价杂环基团或其混合物; Ar 2是可以含有硅的二价芳族基团，二价杂环基团，二价脂环族基团或二价脂族基团; Ar 3是二价芳族基团，二价脂族基团，二价杂环基团或其混合物; Ar4是Ar1（OH）2或Ar2; G为一价有机基团，为羰基，羰氧基或磺酰基; （b）一种或多种在照射时释放酸的光敏化合物（PAG）; （c）一种或多种潜伏性交联剂，其每种含有至少两个N-（CH 2 OR）n单元（n = 1或2，其中R是直链或支链的C 1 -C 8烷基）; （d）至少一种溶剂，和（e）至少一种溶解速率调节剂，条件是当潜交联剂具有高度反应性时，溶解速率调节剂不含羧酸基团。
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公开(公告)号：EP1636648A2
公开(公告)日：2006-03-22
申请号：EP04754202.2
申请日：2004-06-03
发明人： RUSHKIN, Il'ya , NAIINI, Ahmad, A. , HOPLA, Richard , WATERSON, Pamela, J. , WEBER, William, D.
IPC分类号： G03C1/73
CPC分类号： C08G73/22 , C09D179/04 , G03F7/0046 , G03F7/0392 , G03F7/0758 , Y10S430/107
摘要： An end-capped polybenzoxazole precursor having acid labile functional groups, positive working photosensitive compositions thereof and use of the compositions for producing heat resistant relief images on substrates.
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公开(公告)号：EP1609024A2
公开(公告)日：2005-12-28
申请号：EP04718478.3
申请日：2004-03-08
发明人： RUSHKIN, Ilya , NAIINI, Ahmad, A. , HOPLA, Richard, J. , WATERSON, Pamela, J. , WEBER, William, D.
IPC分类号： G03F1/00
CPC分类号： C08G73/22 , C08L79/00 , G03F7/0382 , G03F7/0387 , G03F7/0751 , Y10S430/107
摘要： A heat resistant negative working photosensitive composition that comprises (a) one or more polybenzoxazole precursor polymers (I): wherein x is an integer from about 10 to about 1000, y is an integer from 0 to about 900 and (x+y) is about less then 1000; Ar1 is selected from the group consisting of a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof; Ar2 is selected from the group consisting a divalent aromatic, a divalent heterocyclic, a divalent alicyclic, a divalent aliphatic group that may contain silicon, or mixtures thereof; Ar3 is selected from the group consisting a divalent aromatic group, a divalent aliphatic group, a divalent heterocyclic group, or mixtures thereof; Ar4 is selected from the group consisting Ar1 (OH)2 or Ar2; G is an organic group selected from the group consisting groups having a carbonyl, carbonyloxy or sulfonyl group attached directly to the terminal NH group of the polymer; (b) one or more photo-active compounds which release acid upon irradiation (PACs); (c) a latent crosslinker which contains at least two ~N-(CH2OR)n units wherein n=1 or 2 and R is a linear or branched C1-C8 alkyl group, with the proviso that when a glycoluril is employed as the latent crosslinker, the G group in the polybenzoxazole precursor polymer is produced from the reaction of a cyclic anhydride; and (d) at least one solvent that is not NMP.
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