摘要:
A method for manufacturing printed circuit board by forming wiring pattern by chemical metal plating using a negative pattern made of a photosensitive resin composition layer as the plating resist, wherein the photosensitive resin comprises at least a linear high polymer composed of repeating units expressed by the following general formula (1) ; where, R 1 is any of H, an alkyl group having 1-9 carbon atoms, an alkoxy group having 1-9 carbon atoms, and a carboxyalkyl group having 1-9 carbon atoms, R 2 is an alkyl group having 0-9 carbon atoms, and n is the polymerized number of the repeating unit, and an organic compound expressed by the following general formula (2) ; where, R 3 is either of H or an alkyl group having 1-6 carbon atoms, X is either of NH or S, and Z is either of N or C-Y, where Y is any of H, NH 2 , or SH.
摘要:
A method for manufacturing printed circuit board by forming wiring pattern by chemical metal plating using a negative pattern made of a photosensitive resin composition layer as the plating resist, wherein the photosensitive resin comprises at least a linear high polymer composed of repeating units expressed by the following general formula (1) ; where, R 1 is any of H, an alkyl group having 1-9 carbon atoms, an alkoxy group having 1-9 carbon atoms, and a carboxyalkyl group having 1-9 carbon atoms, R 2 is an alkyl group having 0-9 carbon atoms, and n is the polymerized number of the repeating unit, and an organic compound expressed by the following general formula (2) ; where, R 3 is either of H or an alkyl group having 1-6 carbon atoms, X is either of NH or S, and Z is either of N or C-Y, where Y is any of H, NH 2 , or SH.
摘要:
A multilayer circuit board with blind via-holes (5) having a resolution in the range of 25 ∼ 80 µm and an aspect ratio in the range of 2.0 ∼ 0.6 for contacting the layers to each other thereby, wherein an insulating layer (1, 2) between said layers having the blind via-holes (5) has a glass transition temperature in the range of 150 ∼ 220 °C, and an epoxy group photosensitive resin composition being used therefor. A photosensitive resin composition having preferable resolution and heat resistance was found. A multilayer circuit board, of which thermal stress generated in the steps of a reflow process, a gold wire bonding process, and a repairing process in a bare chip mounting process, and peeling off the conductor wiring and deformation of the multilayer circuit board caused by mechanical stresses at the heating processes were suppressed, was obtained. Accordingly, decreasing size and weight of electronic apparatus became possible.
摘要:
A multilayer circuit board with blind via-holes (5) having a resolution in the range of 25 ∼ 80 µm and an aspect ratio in the range of 2.0 ∼ 0.6 for contacting the layers to each other thereby, wherein an insulating layer (1, 2) between said layers having the blind via-holes (5) has a glass transition temperature in the range of 150 ∼ 220 °C, and an epoxy group photosensitive resin composition being used therefor. A photosensitive resin composition having preferable resolution and heat resistance was found. A multilayer circuit board, of which thermal stress generated in the steps of a reflow process, a gold wire bonding process, and a repairing process in a bare chip mounting process, and peeling off the conductor wiring and deformation of the multilayer circuit board caused by mechanical stresses at the heating processes were suppressed, was obtained. Accordingly, decreasing size and weight of electronic apparatus became possible.
摘要:
In an additive process for producing printed wiring boards, by using a developer (103) comprising a chlorine-free organic solvent and an alkaline aqueous solution and as a resist material (101) a copolymer of methacrylic acid and methyl methacrylate or the like, the production steps are simplified even if a substrate having a large area is used, and abolishment of chlorine-containing organic solvent as a developer becomes possible.
摘要:
In an additive process for producing printed wiring boards, by using a developer (103) comprising a chlorine-free organic solvent and an alkaline aqueous solution and as a resist material (101) a copolymer of methacrylic acid and methyl methacrylate or the like, the production steps are simplified even if a substrate having a large area is used, and abolishment of chlorine-containing organic solvent as a developer becomes possible.