SCANNING ELECTRON MICROSCOPE AND METHODS OF INSPECTING AND REVIEWING SAMPLES
    1.
    发明公开
    SCANNING ELECTRON MICROSCOPE AND METHODS OF INSPECTING AND REVIEWING SAMPLES 审中-公开
    腓特烈港民主主义人民共和国

    公开(公告)号:EP3140849A1

    公开(公告)日:2017-03-15

    申请号:EP15835724.4

    申请日:2015-08-28

    IPC分类号: H01J37/28

    摘要: A scanning electron microscope incorporates a multi-pixel solid-state electron detector. The multi-pixel solid-state detector may detect back-scattered and/or secondary electrons. The multi-pixel solid-state detector may incorporate analog-to-digital converters and other circuits. The multi-pixel solid state detector may be capable of approximately determining the energy of incident electrons and/or may contain circuits for processing or analyzing the electron signals. The multi-pixel solid state detector is suitable for high-speed operation such as at a speed of about 100 MHz or higher. The scanning electron microscope may be used for reviewing, inspecting or measuring a sample such as unpatterned semiconductor wafer, a patterned semiconductor wafer, a reticle or a photomask. A method of reviewing or inspecting a sample is also described.

    摘要翻译: 扫描电子显微镜结合了多像素固态电子检测器。 多像素固态检测器可以检测反向散射和/或二次电子。 多像素固态检测器可以并入模数转换器和其他电路。 多像素固态检测器可以能够近似地确定入射电子的能量和/或可以包含用于处理或分析电子信号的电路。 多像素固态检测器适用于高速操作,例如以大约100MHz或更高的速度。 扫描电子显微镜可以用于检查,检查或测量诸如未图案化的半导体晶片,图案化半导体晶片,掩模版或光掩模的样品。 还描述了检查或检查样品的方法。

    PHOTOMULTIPLIER TUBE, IMAGE SENSOR, AND AN INSPECTION SYSTEM USING A PMT OR IMAGE SENSOR
    2.
    发明公开
    PHOTOMULTIPLIER TUBE, IMAGE SENSOR, AND AN INSPECTION SYSTEM USING A PMT OR IMAGE SENSOR 有权
    光电倍增管,图像传感器和检查系统带有影像传感器PMT OR

    公开(公告)号:EP2973713A1

    公开(公告)日:2016-01-20

    申请号:EP14779717.9

    申请日:2014-04-01

    IPC分类号: H01L27/146

    摘要: A photomultiplier tube includes a semiconductor photocathode and a photodiode. Notably, the photodiode includes a p-doped semiconductor layer, an n-doped semiconductor layer formed on a first surface of the p-doped semiconductor layer to form a diode, and a pure boron layer formed on a second surface of the p-doped semiconductor layer. A gap between the semiconductor photocathode and the photodiode may be less than about 1 mm or less than about 500 µm. The semiconductor photocathode may include gallium nitride, e.g. one or more p-doped gallium nitride layers. In other embodiments, the semiconductor photocathode may include silicon. This semiconductor photocathode can further include a pure boron coating on at least one surface.

    BACK-ILLUMINATED SENSOR WITH BORON LAYER
    7.
    发明公开
    BACK-ILLUMINATED SENSOR WITH BORON LAYER 有权
    带有硼层的背照式传感器

    公开(公告)号:EP2837031A1

    公开(公告)日:2015-02-18

    申请号:EP13775490.9

    申请日:2013-04-08

    IPC分类号: H01L27/148 H01L27/146

    摘要: An image sensor for short-wavelength light and charged particles includes a semiconductor membrane, circuit elements formed on one surface of the semiconductor membrane, and a pure boron layer on the other surface of the semiconductor membrane. This image sensor has high efficiency and good stability even under continuous use at high flux for multiple years. The image sensor may be fabricated using CCD (charge coupled device) or CMOS (complementary metal oxide semiconductor) technology. The image sensor may be a two-dimensional area sensor, or a one-dimensional array sensor. The image sensor can be included in an electron-bombarded image sensor and/or in an inspection system.

    摘要翻译: 用于短波长光和带电粒子的图像传感器包括半导体膜,在半导体膜的一个表面上形成的电路元件以及在半导体膜的另一个表面上的纯硼层。 该图像传感器即使在多年的高通量连续使用下也具有高效率和高稳定性。 图像传感器可以使用CCD(电荷耦合器件)或CMOS(互补金属氧化物半导体)技术制造。 图像传感器可以是二维区域传感器或一维阵列传感器。 图像传感器可以包含在电子轰击图像传感器和/或检查系统中。

    BACK-ILLUMINATED SENSOR WITH BORON LAYER
    9.
    发明授权
    BACK-ILLUMINATED SENSOR WITH BORON LAYER 有权
    RÜCKBELEUCHTETER传感器麻省理工学院

    公开(公告)号:EP2837031B1

    公开(公告)日:2017-06-07

    申请号:EP13775490.9

    申请日:2013-04-08

    摘要: An image sensor for short-wavelength light and charged particles includes a semiconductor membrane, circuit elements formed on one surface of the semiconductor membrane, and a pure boron layer on the other surface of the semiconductor membrane. This image sensor has high efficiency and good stability even under continuous use at high flux for multiple years. The image sensor may be fabricated using CCD (charge coupled device) or CMOS (complementary metal oxide semiconductor) technology. The image sensor may be a two-dimensional area sensor, or a one-dimensional array sensor. The image sensor can be included in an electron-bombarded image sensor and/or in an inspection system.

    摘要翻译: 用于短波长光和带电粒子的图像传感器包括半导体膜,形成在半导体膜的一个表面上的电路元件和在半导体膜的另一个表面上的纯硼层。 该图像传感器具有高效率和良好的稳定性,即使在高通量下连续使用多年。 图像传感器可以使用CCD(电荷耦合器件)或CMOS(互补金属氧化物半导体)技术来制造。 图像传感器可以是二维区域传感器或一维阵列传感器。 图像传感器可以包括在电子轰击图像传感器和/或检查系统中。