公开(公告)号：EP2472322A2

公开(公告)日：2012-07-04

申请号：EP11195706.4

申请日：2011-12-23

申请人： Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

发明人： Coley, Suzanne M. ,  Timmers, Francis J. ,  Wilson, David R.

IPC分类号： G03F7/004 ,  G03F7/039 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C08F220/18 ,  C08F220/24 ,  C07C303/06

CPC分类号： G03F7/0046 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0397

摘要： A monomer compound has the formula (I):

where each R 1 , R 2 , and R 3 is independently H, F, C 1-10 alkyl, fluoro-substituted C 1-10 alkyl, C 1-10 cycloalkyl, or fluoro-substituted C 1-10 cycloalkyl, provided that at least one of R 1 , R 2 , or R 3 is F; n is an integer of from 1 to 10, A is a halogenated or non-halogenated C 2-30 olefin-containing polymerizable group, and G + is an organic or inorganic cation. The monomer is the reaction product of a sultone precursor and the oxyanion of a hydroxy-containing halogenated or non-halogenated C 2-30 olefin-containing compound. A polymer includes the monomer of formula (I).

摘要翻译： 单体化合物具有式（I）：其中每个R 1，R 2和R 3独立地为H，F，C 1-10烷基，氟取代的C 1-10烷基，C 1-10环烷基或氟 取代的C 1-10环烷基，条件是R 1，R 2或R 3中的至少一个为F; n为1〜10的整数，A为卤化或非卤化的含C 2-30烯烃的聚合性基团，G +为有机或无机阳离子。 单体是磺内酯前体与含羟基的卤代或非卤代C 2-30烯烃化合物的氧阴离子的反应产物。 聚合物包括式（I）的单体。

公开(公告)号：EP2472323A3

公开(公告)日：2013-01-16

申请号：EP11195707.2

申请日：2011-12-23

申请人： Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

发明人： Thackeray, James W. ,  Coley, Suzanne M. ,  Jain, Vipul ,  Ongayi, Owendi ,  Cameron, James F. ,  Labeaume, Paul J. ,  Madkour, Ahmad E.

IPC分类号： G03F7/004 ,  G03F7/039 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C08F220/18 ,  C08F220/24 ,  C07C381/12 ,  C07C309/42

CPC分类号： G03F7/0045 ,  C07C309/12 ,  C07C309/42 ,  C07C381/12 ,  C07D333/76 ,  C08F220/38 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/126

摘要： A compound has formula (I):

         Q-O-(A)-Z - G +      (I)

wherein Q is a halogenated or non-halogenated, C 2-30 olefin-containing group, A is a fluorine-substituted C 1-30 alkylene group, a fluorine-substituted C 3-30 cycloalkylene group, a fluorine-substituted C 6-30 arylene group, or a fluorine-substituted C 7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G + has formula (II):

wherein X is S or I, each R 0 is halogenated or non-halogenated and is independently C 1-30 alkyl group; a polycyclic or monocyclic C 3-30 cycloalkyl group; a polycyclic or monocyclic C 4-30 aryl group; or a combination of these, wherein when X is S, one of the R 0 groups is optionally attached to one adjacent R 0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.

公开(公告)号：EP2472323A2

公开(公告)日：2012-07-04

申请号：EP11195707.2

申请日：2011-12-23

申请人： Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

发明人： Thackeray, James W. ,  Coley, Suzanne M. ,  Jain, Vipul ,  Ongayi, Owendi ,  Cameron, James F. ,  Labeaume, Paul J. ,  Madkour, Ahmad E.

IPC分类号： G03F7/004 ,  G03F7/039 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C08F220/18 ,  C08F220/24

CPC分类号： G03F7/0045 ,  C07C309/12 ,  C07C309/42 ,  C07C381/12 ,  C07D333/76 ,  C08F220/38 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/126

摘要： A compound has formula (I):

         Q-O-(A)-Z - G +      (I)

wherein Q is a halogenated or non-halogenated, C 2-30 olefin-containing group, A is a fluorine-substituted C 1-30 alkylene group, a fluorine-substituted C 3-30 cycloalkylene group, a fluorine-substituted C 6-30 arylene group, or a fluorine-substituted C 7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G + has formula (II):

wherein X is S or I, each R 0 is halogenated or non-halogenated and is independently C 1-30 alkyl group; a polycyclic or monocyclic C 3-30 cycloalkyl group; a polycyclic or monocyclic C 4-30 aryl group; or a combination of these, wherein when X is S, one of the R 0 groups is optionally attached to one adjacent R 0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.

摘要翻译： 一个复合体有公式（I）：€ƒ€ƒ€ƒ€ƒ€ƒ€ƒQO-（A）-Z - G +€ƒ€ƒ€ƒ€ƒ（I）其中Q是 卤代或非卤代的含C 2-30烯烃的基团，A是氟取代的C 1-30亚烷基，氟取代的C 3-30亚环烷基，氟取代的C 6-30亚芳基 ，或氟取代的C 7-30亚烷基 - 亚芳基，Z是包含磺酸盐，磺酰胺或磺酰胺的阴离子基团，G +具有式（II）：其中X是S或I，每个R 0是卤素或 非卤代，独立地为C 1-30烷基; 多环或单环C 3-30环烷基; 多环或单环C 4-30芳基; 或这些的组合，其中当X是S时，R 0中的一个任选地通过单键连接到一个相邻的R 0基团，a是2或3，其中当X是I时，a是2或 当X为S时，a为3.共聚物，光致抗蚀剂，涂布基材和图案化方法。

公开(公告)号：EP2472321A1

公开(公告)日：2012-07-04

申请号：EP11195705.6

申请日：2011-12-23

申请人： Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

发明人： Coley, Suzanne M. ,  Timmers, Francis J. ,  Wilson, David R.

IPC分类号： G03F7/004 ,  C07C303/32 ,  C08F20/38 ,  G03F7/038 ,  G03F7/039 ,  C07C309/12

CPC分类号： G03F7/0045 ,  C07C303/32 ,  C07C381/12 ,  C08F220/38 ,  C08F228/00 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  C07C309/12

摘要： A method of preparing a monomer comprises reacting a sultone of the formula (I):

wherein each R is independently F, C 1-10 alkyl, fluoro-substituted C 1-10 alkyl, C 1-10 cycloalkyl, or fluoro-substituted C 1-10 cycloalkyl, provided that at least one R is F; n is an integer of from 0 to 10, and m is an integer of 1 to 4+2n, with a nucleophile having a polymerizable group. Monomers, including a photoacid-generating monomer, may be prepared by this method.

摘要翻译： 制备单体的方法包括使式（I）的磺内酯：其中每个R独立地为F，C 1-10烷基，氟取代的C 1-10烷基，C 1-10环烷基或氟取代的C 1-10环烷基，条件是至少一个R为F; n为0〜10的整数，m为1〜4 + 2n的整数，具有可聚合基团的亲核试剂。 包括产生光致酸的单体的单体可以通过该方法制备。