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    Photoacid generators
    2.
    发明公开
    Photoacid generators 审中-公开
    Fotosäuregeneratoren

    公开(公告)号：EP2458440A1

    公开(公告)日：2012-05-30

    申请号：EP11190453.8

    申请日：2011-11-24

    申请人： Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

    发明人： Thackeray, James W. ,  Coley, Suzanne ,  Cameron, James F. ,  Labeaume, Paul J. ,  Ongayi, Owendi ,  Jain, Vipul ,  Madkour, Ahmad E.

    IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039

    CPC分类号： C07C381/12 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

    摘要： A photoacid generator compound has the formula (I):

             G + Z-     (I)

    wherein G has the formula (II):

    wherein in formula (II), X is S or I, each R 0 is commonly attached to X and is independently a C 1-30 alkyl group; a polycyclic or monocyclic C 3-30 cycloalkyl group; a polycyclic or monocyclic C 6-30 aryl group; or a combination comprising at least one of the foregoing, G has a molecular weight of greater than 263.4 g/mol, or G has a molecular weight of less than 263.4 g/mol and one or more R 0 groups are further attached to an adjacent R 0 group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3, and Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator and a polymer, and a method of forming an electronic device uses the photoresist.

    摘要翻译： 光致酸发生剂化合物具有式（I）：ƒ€ƒ€ƒ€ƒ€ƒ€ƒG + Z-ƒ€ƒ€ƒ€ƒ（I）其中G具有式（ II）：其中在式（II）中，X为S或I，每个R 0通常与X连接，独立地为C 1-30烷基; 多环或单环C 3-30环烷基; 多环或单环C 6-30芳基; 或包含上述至少一种的组合，G具有大于263.4g / mol的分子量，或G具有小于263.4g / mol的分子量，并且一个或多个R 0基团进一步连接到相邻的 R 0基团，a为2或3，其中当X为I时，a为2，或当X为S时，a为2或3，式（I）中的Z为磺酸阴离子，磺酰亚胺， 或磺酰胺。 光致抗蚀剂和涂膜也包括光致酸产生剂和聚合物，并且形成电子器件的方法使用光致抗蚀剂。

    Polymerizable photoacid generators
    3.
    发明公开
    Polymerizable photoacid generators 审中-公开
    PolymerisierbareFotosäuregeneratoren

    公开(公告)号：EP2472323A2

    公开(公告)日：2012-07-04

    申请号：EP11195707.2

    申请日：2011-12-23

    申请人： Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

    发明人： Thackeray, James W. ,  Coley, Suzanne M. ,  Jain, Vipul ,  Ongayi, Owendi ,  Cameron, James F. ,  Labeaume, Paul J. ,  Madkour, Ahmad E.

    IPC分类号： G03F7/004 ,  G03F7/039 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C08F220/18 ,  C08F220/24

    CPC分类号： G03F7/0045 ,  C07C309/12 ,  C07C309/42 ,  C07C381/12 ,  C07D333/76 ,  C08F220/38 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/126

    摘要： A compound has formula (I):

             Q-O-(A)-Z - G +      (I)

    wherein Q is a halogenated or non-halogenated, C 2-30 olefin-containing group, A is a fluorine-substituted C 1-30 alkylene group, a fluorine-substituted C 3-30 cycloalkylene group, a fluorine-substituted C 6-30 arylene group, or a fluorine-substituted C 7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G + has formula (II):

    wherein X is S or I, each R 0 is halogenated or non-halogenated and is independently C 1-30 alkyl group; a polycyclic or monocyclic C 3-30 cycloalkyl group; a polycyclic or monocyclic C 4-30 aryl group; or a combination of these, wherein when X is S, one of the R 0 groups is optionally attached to one adjacent R 0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.

    摘要翻译： 一个复合体有公式（I）：€ƒ€ƒ€ƒ€ƒ€ƒ€ƒQO-（A）-Z - G +€ƒ€ƒ€ƒ€ƒ（I）其中Q是 卤代或非卤代的含C 2-30烯烃的基团，A是氟取代的C 1-30亚烷基，氟取代的C 3-30亚环烷基，氟取代的C 6-30亚芳基 ，或氟取代的C 7-30亚烷基 - 亚芳基，Z是包含磺酸盐，磺酰胺或磺酰胺的阴离子基团，G +具有式（II）：其中X是S或I，每个R 0是卤素或 非卤代，独立地为C 1-30烷基; 多环或单环C 3-30环烷基; 多环或单环C 4-30芳基; 或这些的组合，其中当X是S时，R 0中的一个任选地通过单键连接到一个相邻的R 0基团，a是2或3，其中当X是I时，a是2或 当X为S时，a为3.共聚物，光致抗蚀剂，涂布基材和图案化方法。

    Coating compositions suitable for use with an overcoated photoresist
    9.
    发明公开
    Coating compositions suitable for use with an overcoated photoresist 审中-公开
    Beschichtungszusammensetzungen，死者zur Beschichtung eines Photoresists eignen

    公开(公告)号：EP2261738A2

    公开(公告)日：2010-12-15

    申请号：EP10165624.7

    申请日：2010-06-11

    申请人： Rohm and Haas Electronic Materials, LLC

    发明人： Amara, John P. ,  Cameron, James F. ,  Sung, Jin Wuk ,  Prokopowicz, Gregory P.

    IPC分类号： G03F7/09 ,  C08F220/36

    CPC分类号： C09D5/006 ,  C07C69/76 ,  C07C69/94 ,  C08F220/36 ,  C09D133/14 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/322 ,  H01L21/0276

    摘要： In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

    摘要翻译： 一方面，提供了包含二烯/亲二烯体反应产物的有机涂料组合物，特别是抗反射涂料组合物。 在另一方面，提供了包含包含羟基 - 萘甲酸基团的组分的有机涂料组合物，特别是抗反射涂料组合物，例如6-羟基-2-萘甲酸基团。本发明的优选组合物可用于减少曝光辐射的反射 从衬底返回到外涂光致抗蚀剂层和/或用作平坦化，共形或通孔填充层。