公开(公告)号：EP2799597A4

公开(公告)日：2015-08-19

申请号：EP12861985

申请日：2012-10-31

申请人： SUMCO CORP

发明人： SUDO TOSHIAKI ,  SATO TADAHIRO ,  KITAHARA KEN ,  YOSHIOKA TAKUMA ,  KISHI HIROSHI

IPC分类号： C30B29/06 ,  C03B19/09 ,  C03B20/00 ,  C30B15/10

CPC分类号： C30B15/10 ,  C03B19/095 ,  C30B11/002 ,  C30B29/06 ,  C30B35/002 ,  Y10T117/1032

摘要： Buckling of a vitreous silica crucible 12 or inward fall of a sidewall 15 is effectively suppressed. The vitreous silica crucible 12 includes the cylindrical sidewall 15 having an upward-opening rim, a mortar-shaped bottom 16 including a curve, and a round portion 17 connescting the sidewall 15 and the bottom 16. In the vitreous silica crucible 12, the per-unit area thermal resistance in the thickness direction of the sidewall 15 is higher than that of the round portion 17.

公开(公告)号：EP3018237A4

公开(公告)日：2017-02-22

申请号：EP13888584

申请日：2013-06-30

申请人： SUMCO CORP

发明人： SUDO TOSHIAKI ,  SATO TADAHIRO ,  KITAHARA KEN ,  OHARA MASAMI

IPC分类号： C30B29/06 ,  C03B20/00 ,  C30B15/10 ,  G01N21/3563 ,  G01N21/65 ,  G01N21/84 ,  G01N21/95

CPC分类号： H01J37/32935 ,  C30B15/00 ,  C30B15/10 ,  C30B15/14 ,  C30B29/06 ,  C30B35/002 ,  G01N21/3563 ,  G01N21/65 ,  G01N21/68 ,  G01N21/95 ,  G01N2021/8477 ,  G01N2201/105 ,  G01N2201/12

摘要： An inspection method of vitreous silica crucibles, includes: a measurement step of measuring an infrared absorption spectrum or a Raman shift of a measurement point on an inner surface of the vitreous silica crucible; a determining step of predicting whether or not a surface-defect region occurs at the measurement point based on an obtained spectrum to determine a quality of the vitreous silica crucible.

摘要翻译： 玻璃状石英坩埚的检查方法包括：测量石英坩埚内表面上的测量点的红外吸收光谱或拉曼偏移的测量步骤; 基于获得的光谱来预测在测量点是否出现表面缺陷区域以确定石英玻璃坩埚的质量的确定步骤。

公开(公告)号：EP2801787A4

公开(公告)日：2015-06-17

申请号：EP12861132

申请日：2012-10-31

申请人： SUMCO CORP

发明人： SUDO TOSHIAKI ,  SATO TADAHIRO ,  KITAHARA KEN

IPC分类号： G01B11/24 ,  C03B20/00 ,  C30B15/10 ,  C30B29/06

CPC分类号： G01B11/24 ,  C03B19/095 ,  C30B15/10 ,  C30B15/20 ,  C30B15/26 ,  C30B29/06 ,  H01L22/12

摘要： A method for measuring a three-dimensional shape of an inner surface of a vitreous silica crucible which enables the measurement of the three-dimensional shape of the inner surface of the crucible without contaminating the inner surface of the crucible, is provided. According to the present invention, a method for measuring a three-dimensional shape of a vitreous silica crucible, including a fogging step to form a fog onto an inner surface of the vitreous silica crucible, a three-dimensional shape measuring step to measure a three-dimensional shape of the inner surface, by measuring a reflected light from the inner surface irradiated with light, is provided.

公开(公告)号：EP3199668A4

公开(公告)日：2018-05-23

申请号：EP15844603

申请日：2015-09-24

申请人： SUMCO CORP

发明人： SATO TADAHIRO ,  KITAHARA ERIKO ,  SUDO TOSHIAKI ,  KITAHARA KEN

IPC分类号： C30B15/00 ,  C30B15/10 ,  C30B15/20 ,  C30B29/06 ,  C30B35/00

CPC分类号： C30B15/10 ,  C30B15/00 ,  C30B15/20 ,  C30B29/06 ,  C30B35/007

摘要： The capacity of respective vitreous silica crucible is grasped precisely to predict the initial liquid surface level of the silicon melt in the vitreous silica crucible. Thereby the dipping process of the seed crystal is reliably performed. Spatial coordinates of multiple points on an inner surface of the vitreous silica crucible prior to filling raw material in the vitreous silica crucible, and a three-dimensional shape of the inner surface of the vitreous silica crucible from a combination of polygons having each measurement point as a vertex coordinate is specified (S11); a predictive value of an initial liquid surface level of the silicon melt in the vitreous silica crucible is preset (S12); a volume of the silicon melt satisfying the predictive value of the initial liquid surface level is obtained based on the three-dimensional shape of the inner surface of the vitreous silica crucible (S13); a weight of the silicon melt having the volume is obtained (S14); raw material having the weight is filled in the vitreous silica crucible (S15); a dipping control of the seed crystal is performed based on the predictive value of the initial liquid surface level (S17).

公开(公告)号：EP3088573A4

公开(公告)日：2017-09-20

申请号：EP14874952

申请日：2014-12-25

申请人： SUMCO CORP

发明人： SUDO TOSHIAKI ,  SATO TADAHIRO ,  KITAHARA KEN ,  KITAHARA ERIKO

IPC分类号： C30B29/06 ,  C03B20/00 ,  C03C3/04 ,  C30B15/10 ,  G01L1/24 ,  G01L5/00 ,  G01N21/23 ,  H04N5/232

CPC分类号： G01N21/23 ,  C03C3/04 ,  C30B15/10 ,  C30B29/06 ,  G01L1/24 ,  G01L5/0047 ,  G01N2201/062 ,  G01N2201/0683 ,  H04N5/232

摘要： A distortion distribution of an entire vitreous silica crucible is measured in a non-destructive way. A distortion-measuring apparatus comprises: a light source 11 which irradiates the vitreous silica crucible 1 from outside; a first polarizer 12 and a first quarter-wave plate 13 disposed between the light source 11 and an outer surface of the vitreous silica crucible 1 wall; a camera 14 disposed inside of the vitreous silica crucible 1; a camera control mechanism 15 configured to control a photographing direction of the camera 14; a second polarizer 16 and a second quarter-wave plate 17 disposed between the camera 14 and an inner surface of the vitreous silica crucible 1's wall. An optical axis of the second quarter-wave plate 17 inclines 90 degrees with respect to the first quarter-wave plate 13. The camera 14 conducts photographing of a light which is emitted from the light source 11 and passes through the first polarizer 12, the first quarter-wave plate 13, the wall of the vitreous silica crucible 1, the second quarter-wave plate 17, and the second polarizer 16.

摘要翻译： 以非破坏性的方式测量整个氧化硅玻璃坩埚的变形分布。 变形测量装置具备：从外部照射氧化硅玻璃坩埚1的光源11， 第一偏振器12和设置在光源11与氧化硅玻璃坩埚1壁的外表面之间的第一四分之一波片13; 设置在氧化硅玻璃坩埚1内的照相机14; 相机控制机构15，用于控制相机14的拍摄方向; 配置在照相机14与石英玻璃坩埚1的壁的内表面之间的第二偏振片16和第二四分之一波片17。 第二四分之一波片17的光轴相对于第一四分之一波片13倾斜90度。照相机14对从光源11发出并穿过第一偏振片12的光进行拍摄， 第一四分之一波片13，氧化硅玻璃坩埚1的壁，第二四分之一波片17以及第二偏振片16。

公开(公告)号：EP3199669A4

公开(公告)日：2018-03-07

申请号：EP15844371

申请日：2015-09-24

申请人： SUMCO CORP

发明人： KITAHARA KEN ,  SATO TADAHIRO ,  SUDO TOSHIAKI ,  KITAHARA ERIKO ,  WATANABE TAKASHI

IPC分类号： C30B15/10 ,  C03B19/09 ,  C30B29/06 ,  C30B35/00 ,  G01N3/307

CPC分类号： G01N3/307 ,  C03B19/095 ,  C30B15/10 ,  C30B29/06 ,  C30B35/002 ,  G01N2203/001 ,  G01N2203/0035 ,  G01N2203/0064

摘要： Provided is a destructive inspection method and a quality determination method of vitreous silica crucible capable of inspecting in a condition as close as possible to the actual status of use. The destructive inspection method of the vitreous silica crucible according to the present disclosure, evaluates a crack state of an inner surface of a vitreous silica crucible 1 for pulling a silicon single crystal supported by a graphite susceptor 2 when a load is instantaneously applied to one point on the inner surface via an automatic center punch 10 while pushing the tip portion of the automatic center punch 10 against the inner surface.

公开(公告)号：EP3015574A4

公开(公告)日：2017-04-05

申请号：EP13887931

申请日：2013-06-29

申请人： SUMCO CORP

发明人： SUDO TOSHIAKI ,  SATO TADAHIRO ,  KITAHARA KEN ,  KITAHARA ERIKO

IPC分类号： C30B15/10 ,  C30B29/06

CPC分类号： C30B15/10 ,  C30B29/06

摘要： A pulling-up method of silicon single crystal comprises a process of laying a molded body between a susceptor's inner surface and a crucible's outer surface. The molded body is formed based on three-dimensional data of inner surface shape of the susceptor which can hold the vitreous silica crucible and three-dimensional data of the crucible so as to make the susceptor's central axis and the crucible's central axis substantially aligned when it is laid between the susceptor's inner surface and the crucible's outer surface.

公开(公告)号：EP3006606A4

公开(公告)日：2017-03-01

申请号：EP13886011

申请日：2013-05-31

申请人： SUMCO CORP

发明人： SUDO TOSHIAKI ,  KITAHARA KEN ,  AIBA AKIHIRO ,  OUSYUYA KAZUSHI ,  YOSHIDA FUMIE ,  HINOOKA MAKIKO ,  KITAHARA ERIKO ,  SATO TADAHIRO

IPC分类号： C30B15/10 ,  C03B19/09 ,  C30B29/06 ,  C30B35/00

CPC分类号： C30B15/10 ,  C03B19/095 ,  C30B29/06 ,  C30B35/002 ,  Y02P40/57

摘要： The present invention provides a vitreous silica crucible which inhibits a deformation even when used under a high temperature condition for a long time, and a method for manufacturing the same. The vitreous silica crucible comprises: a substantially cylindrical straight body portion having an opening on the top end and extending in a vertical direction, a curved bottom portion, and a corner portion connecting the straight body portion with the bottom portion and a curvature of which is greater than that of the bottom portion, wherein, the vitreous silica crucible comprises a transparent layer on the inside and a bubble layer on the outside thereof, a compressive stress layer in which compressive stress remains in the inner surface side of the transparent layer, and a tensile stress layer in which tensile stress remains and is adjacent to the compressive stress layer at a gradual rate of change of stress.

公开(公告)号：EP3018468A4

公开(公告)日：2017-01-04

申请号：EP13888555

申请日：2013-06-30

申请人： SUMCO CORP

发明人： SUDO TOSHIAKI ,  SATO TADAHIRO ,  KITAHARA KEN ,  HINOOKA MAKIKO

IPC分类号： G01N21/55 ,  C03B19/09 ,  C30B15/10 ,  C30B29/06 ,  G01N15/00 ,  G01N15/08 ,  G01N15/10 ,  G01N33/00

CPC分类号： C03B1/00 ,  C03B19/095 ,  C30B15/10 ,  C30B29/06 ,  G01N15/088 ,  G01N21/55 ,  G01N2015/0015 ,  G01N2015/0096 ,  G01N2033/0091 ,  G02B21/008 ,  Y02P40/57

摘要： An evaluation method of suitable silica powder for forming a bubble-free layer of a vitreous silica crucible for pulling of a silicon single crystal, includes: a process of measuring a porosity between silica particles in the silica powder, a process of melting the silica powder, a process of measuring a bubble content rate of a vitreous silica block obtained by cooling to harden the melted silica powder, and a process of determining whether the silica powder is suitable from the porosity of the silica powder and the bubble content rate of the vitreous silica block.

摘要翻译： 合适的二氧化硅粉末的用于硅单晶的提拉形成石英玻璃坩埚的无气泡的层的评价方法，包括：测量二氧化硅颗粒之间的孔隙率在该二氧化硅粉末的过程中，熔融二氧化硅粉末的工序 ，测量通过冷却以硬化熔融二氧化硅粉末获得的氧化硅玻璃块的气泡含有率，和确定性采矿的处理的处理是否二氧化硅粉末适合从所述二氧化硅粉末的孔隙率和玻璃体的气泡含有率 二氧化硅块。

公开(公告)号：EP3088572A4

公开(公告)日：2017-07-26

申请号：EP14873978

申请日：2014-12-25

申请人： SUMCO CORP

发明人： SUDO TOSHIAKI ,  SATO TADAHIRO ,  KITAHARA KEN ,  KITAHARA ERIKO

IPC分类号： C30B15/10 ,  C03B19/09 ,  C30B29/06 ,  C30B35/00

CPC分类号： C30B15/10 ,  C03B19/095 ,  C30B29/06 ,  C30B35/002 ,  Y02P40/57

摘要： Provided is a vitreous silica crucible suppressing deformation under high temperature, and a method for manufacturing the same. A vitreous silica crucible 1 includes a cylindrical straight body portion 10a, a corner portion 10c formed at lower end of the straight body portion 10a, and a bottom portion 10b connected with the straight body portion 10a via the corner portion 10c. Moreover, the vitreous silica crucible 1 includes a bubble-containing opaque layer 11 constituting an outer layer, and a bubble-free transparent layer 12 constituting an inner layer. A boundary surface, between the opaque layer 11 and the transparent layer 12 in at least the straight body portion 10a, forms a periodic wave surface in a vertical direction.

摘要翻译： 本发明提供抑制高温下变形的氧化硅玻璃坩埚及其制造方法。 氧化硅玻璃坩埚1具有圆筒状的直体部10a，形成于直体部10a的下端的角部10c以及经由角部10c与直体部10a连接的底部10b。 此外，氧化硅玻璃坩埚1具备构成外层的含气泡不透明层11和构成内层的无气泡透明层12。 至少在直体部分10a中的不透明层11和透明层12之间的边界表面在垂直方向上形成周期性波面。