摘要:
The invention relates to a method for processing glass containers, in particular for washing and coating of vials for pharmaceutical, medical or cosmetic applications, wherein a plurality of glass containers is simultaneously subjected to a first processing step and thereafter the plurality of glass containers is simultaneously subjected to a second processing step, and wherein before and/or during the first and/or second processing step the outer container surface of the glass container is contact-free or in contact with a material having a lower hardness than that of the glass container or only in contact with such materials, and to an apparatus for processing, in particular for washing and coating, glass containers with a capturing device which is designed to capture and hold a plurality of glass containers simultaneously, wherein the capturing device comprises a plurality of individual holding sockets, each of which is designed to capture and hold one of the glass containers individually and without contact to the other glass containers, at least two processing stations, each of which being designed to simultaneously subject the plurality of glass containers held by the capturing device to a specific processing step, and a transport device which is adapted to move the capturing device from one processing station to the next processing station such that the plurality of glass containers held by the capturing device is simultaneously transported from one processing station to the next processing station.
摘要:
In order to improve particularly the ease of discharge of product residue in containers, such as pharmaceutical packaging means, the invention provides to equip corresponding substrates with a hydrophobic coating. For this purpose, a composite material is provided comprising a substrate and a coating deposited thereon, which forms at least part of the surface of the coated substrate, wherein the coating comprises a compound having the elements C, O, and H, wherein further elements, except Si, C, H, have a content of less than 10 at%, preferably less than 5 at%, and wherein the compound comprises a composition of SiOxCyHz, wherein x is a maximum of 1.2.
摘要:
The invention relates to a device and a method for treating layers using a plasma zone sealed from the outer atmospheric pressure. Said device comprises a plasma reactor having a substrate carrier in the form of a container receiving device and a closing element that is connected to the substrate carrier by means of a lifting device.
摘要:
The invention relates to an installation for vacuum-coating substrates, said installation comprising a vacuum chamber, a system for holding at least one substrate, and a transport device for transporting the substrate into the coating regions, at least one first coating region of the vacuum chamber being provided with at least one device for plasma impulse chemical vapour deposition (PICVD) and at least one second coating region of the vacuum chamber being provided with at least one device for sputter coating.
摘要:
The aim of the invention is to render vacuum coating of substrates (11) more economical. Said aim is achieved by a device (1) for vacuum-coating substrates, comprising a conveying device, at least one coating station (7, 71, 72, , 7N) which is provided with several coating locations (91 - 94) and is conveyed on the conveying device, an evacuating device, and a device for rotating the coating locations (91 - 94) on the conveying device.
摘要:
The invention relates to a device for producing optically homogeneous, streak-free quartz glass bodies (11) having a large diameter comprising a furnace device (12), an inner chamber (16) with facing openings (13, 13'). In one (13) of said facing openings at least one burner (14) is provided and in the other the respective glass body (11) to be produced is located in the other facing opening (13') are movably positioned. Both said burner and said glass body are movably positioned. In the course of the production of the quartz glass body (11), a relative movement is effected place in the axial and radial direction between the burner (14) and the quartz glass body (11) in such a way that the distance from the burner outlet opening (15) pertaining to the quarz glass body (11) decreases (Fig. 3) as the distance from the burner (14) to the X-X axis of the quartz glass body increases.