公开(公告)号：EP1589375A4

公开(公告)日：2010-02-17

申请号：EP04705532

申请日：2004-01-27

申请人： TOKYO OHKA KOGYO CO LTD

发明人： HIRAYAMA TAKU ,  HADA HIDEO ,  FUJIMURA SATOSHI ,  IWAI TAKESHI ,  SATO MITSURU ,  TAKASU RYOICHI ,  TACHIKAWA TOSHIKAZU ,  IWASHITA JUN ,  ISHIDUKA KEITA ,  YAMADA TOMOTAKA ,  TAKAYAMA TOSHIKAZU ,  YOSHIDA MASAAKI

IPC分类号： G03C1/76 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/26 ,  H01L21/027

CPC分类号： G03F7/70616 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/70341 ,  Y10S430/106 ,  Y10S430/111

公开(公告)号：EP1596251A4

公开(公告)日：2009-05-20

申请号：EP04713169

申请日：2004-02-20

申请人： TOKYO OHKA KOGYO CO LTD

发明人： HIRAYAMA TAKU ,  TAKASU RYOICHI ,  SATO MITSURU ,  WAKIYA KAZUMASA ,  YOSHIDA MASAAKI ,  TAMURA KOKI

IPC分类号： G03F7/11 ,  G03F7/039 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/2041 ,  G03F7/11

摘要： An immersion exposure process-use resist protection film forming material formed on a resist film, the material having characteristics of being transparent to an exposure light, having practically no miscibility with an immersion exposure-use liquid and causing no mixing with the resist film; a protection film formed by this material; a composite film having the resist film; and a resist pattern forming method using them. These can prevent the degeneration of a resist film during immersion exposing and the degeneration of a liquid being used at the same time, and can form a high-resolution resist pattern using immersion exposing.

公开(公告)号：EP1610178A4

公开(公告)日：2010-01-27

申请号：EP04722980

申请日：2004-03-24

申请人： TOKYO OHKA KOGYO CO LTD

发明人： ENDO KOTARO ,  YOSHIDA MASAAKI ,  HIRAYAMA TAKU ,  TSUJI HIROMITSU ,  OGATA TOSHIYUKI ,  SATO MITSURU

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  G03F7/26 ,  H01L21/027

CPC分类号： G03F7/0395 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/115

公开(公告)号：EP1601008A4

公开(公告)日：2009-02-18

申请号：EP04717274

申请日：2004-03-04

申请人： TOKYO OHKA KOGYO CO LTD

发明人： HIRAYAMA TAKU ,  SATO MITSURU ,  WAKIYA KAZUMASA ,  IWASHITA JYUN ,  YOSHIDA MASAAKI

IPC分类号： G03F7/032 ,  G03F7/20 ,  G03F7/075 ,  G03F7/207 ,  G03F7/38 ,  H01L21/027

CPC分类号： G03F7/2041

摘要： An immersion liquid for immersion exposure process wherein a resist film is exposed through a liquid is disclosed. The immersion liquid is composed of a fluorine-containing liquid that is transparent to the exposure light used for the exposure process and has a boiling point of 70-270˚C. A resist pattern forming method which comprises a step wherein such an immersion liquid is directly placed on a resist film or a protective film is also disclosed. The immersion liquid prevents changes of properties in both of the resist film and the liquid during the immersion exposure process, thereby enabling to form a high-resolution resist pattern through immersion exposure.

摘要翻译： 一种用于液浸光刻中的浸渍液，其中抗蚀剂膜经由流体暴露于光。 流体对于液浸光刻中使用的曝光是透明的，并且包括沸点为70〜270℃的氟系液体。形成抗蚀剂图案的方法包括将浸渍流体直接放置在抗蚀剂上的步骤 膜或保护膜沉积在抗蚀剂膜上。 本发明防止了在液浸光刻期间抗蚀剂膜和其它膜的改变以及流体的改变，并且能够使用液浸式光刻技术进行高分辨抗蚀剂图案化。