-
1.发明公开RESIST PROTECTING FILM FORMING MATERIAL FOR IMMERSION EXPOSURE PROCESS AND RESIST PATTERN FORMING METHOD USING THE PROTECTING FILM 有权材料形成抗蚀剂浸曝光处理保护膜和方法形成抗蚀图案使用保护膜
公开(公告)号：EP1741730A4
公开(公告)日：2008-06-25
申请号：EP05734725
申请日：2005-04-25
发明人： ISHIZUKA KEITA , WAKIYA KAZUMASA , ENDO KOTARO , YOSHIDA MASAAKI
IPC分类号： C08F20/10 , C08F22/00 , C08F36/16 , C08F220/18 , C08F220/28 , C08F232/08 , G03F7/11 , G03F7/20 , H01L21/027
CPC分类号： G03F7/11 , C08F220/18 , C08F220/28 , C08F232/08 , G03F7/2041
摘要： An immersion exposure process, particularly, an immersion exposure process which improves resist pattern resolution by performing exposure under the conditions where a liquid, which has a refraction index higher than that of air but lower than that of a resist film and has a prescribed thickness, is provided at least on the resist film, in a path wherein lithography exposure beams reach the resist film. In the immersion exposure process, a quality change of the resist film during the immersion exposure using various types of immersion liquid such as water and a quality change of the immersion liquid used are prevented at the same time, without increasing the number of process steps, and the high resolution resist pattern can be formed. The protecting film having characteristics of substantially not having compatibility with water and soluble to alkalies is formed on a surface of the resist film to be used.
-
2.发明公开RESIST COMPOSITION FOR LIQUID IMMERSION EXPOSURE PROCESS AND METHOD OF FORMING RESIST PATTERN THEREWITH 审中-公开抗蚀剂组合物液浸曝光过程和方法形成抗蚀该结构
公开(公告)号：EP1610178A4
公开(公告)日：2010-01-27
申请号：EP04722980
申请日：2004-03-24
发明人： ENDO KOTARO , YOSHIDA MASAAKI , HIRAYAMA TAKU , TSUJI HIROMITSU , OGATA TOSHIYUKI , SATO MITSURU
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0382 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/115
-
3.发明公开IMMERSION LIQUID FOR IMMERSION EXPOSURE PROCESS AND RESIST PATTERN FORMING METHOD USING SUCH IMMERSION LIQUID 审中-公开IMMERSIONSFLÜSSIGKEITFÜREINEN IMMERSIONSBELICHTUNGSPROZESS UND RESISTSTRUKTURAUSBILDUNGSVERFAHREN MIT EINER SOLCHENIMMERSIONSFLÜSSIGKEIT
公开(公告)号：EP1601008A4
公开(公告)日：2009-02-18
申请号：EP04717274
申请日：2004-03-04
发明人： HIRAYAMA TAKU , SATO MITSURU , WAKIYA KAZUMASA , IWASHITA JYUN , YOSHIDA MASAAKI
CPC分类号： G03F7/2041
摘要： An immersion liquid for immersion exposure process wherein a resist film is exposed through a liquid is disclosed. The immersion liquid is composed of a fluorine-containing liquid that is transparent to the exposure light used for the exposure process and has a boiling point of 70-270˚C. A resist pattern forming method which comprises a step wherein such an immersion liquid is directly placed on a resist film or a protective film is also disclosed. The immersion liquid prevents changes of properties in both of the resist film and the liquid during the immersion exposure process, thereby enabling to form a high-resolution resist pattern through immersion exposure.
摘要翻译： 一种用于液浸光刻中的浸渍液，其中抗蚀剂膜经由流体暴露于光。 流体对于液浸光刻中使用的曝光是透明的，并且包括沸点为70〜270℃的氟系液体。形成抗蚀剂图案的方法包括将浸渍流体直接放置在抗蚀剂上的步骤 膜或保护膜沉积在抗蚀剂膜上。 本发明防止了在液浸光刻期间抗蚀剂膜和其它膜的改变以及流体的改变，并且能够使用液浸式光刻技术进行高分辨抗蚀剂图案化。
-
4.发明公开POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN 有权聚合物复合物，具有这种聚合物复合物的光致抗蚀剂组合物和形成电阻结构的方法
公开(公告)号：EP1736485A4
公开(公告)日：2010-03-03
申请号：EP05728789
申请日：2005-04-05
发明人： OGATA TOSHIYUKI , MATSUMARU SYOGO , HADA HIDEO , YOSHIDA MASAAKI
IPC分类号： C08F8/00 , C07C69/54 , C08F20/20 , C08F220/28 , C08F222/10 , C08F232/08 , G03F7/004 , G03F7/039
CPC分类号： C08F220/28 , C07C69/54 , C07C2601/14 , C08F222/1006 , C08F232/08 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: (wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).
-
5.发明公开MATERIAL FOR FORMING RESIST-PROTECTING FILM FOR IMMERSION EXPOSURE PROCESS, RESIST-PROTECTING FILM MADE OF SUCH MATERIAL, AND METHOD FOR FORMING RESIST PATTERN USING SUCH RESIST-PROTECTING FILM 审中-公开材料形成抗蚀剂保护膜生产此类材料的浸曝光处理抗蚀剂保护膜和方法形成抗蚀剂结构中使用这种保护保护膜
公开(公告)号：EP1662323A4
公开(公告)日：2010-01-20
申请号：EP04772165
申请日：2004-08-25
发明人： HIRAYAMA TAKU , ENDO KOTARO , YOSHIDA MASAAKI , WAKIYA KAZUMASA
IPC分类号： G03F7/11 , G03F7/039 , G03F7/20 , H01L21/027
CPC分类号： G03F7/2041 , G03F7/11
-
6.发明公开MATERIAL FOR FORMATION OF RESIST PROTECTION FILM AND METHOD OF FORMING RESIST PATTERN THEREWITH 审中-公开材料形成抗蚀剂保护膜和方法形成抗蚀图案
公开(公告)号：EP1788438A4
公开(公告)日：2009-07-29
申请号：EP05767298
申请日：2005-07-29
发明人： ENDO KOTARO , YOSHIDA MASAAKI , ISHIZUKA KEITA
IPC分类号： G03F7/11 , G03F7/039 , G03F7/20 , G03F7/38 , H01L21/027
CPC分类号： G03F7/2041 , G03F7/11
摘要： In a liquid immersion exposure process, it is intended to realize formation of a high-resolution resist pattern by the use of liquid immersion exposure without causing any increase of the number of treatment steps while simultaneously preventing the deterioration of resist film during liquid immersion exposure using various immersion liquids, such as water, and the deterioration of immersion liquid used. Further, ensuring applicability to a liquid immersion medium of higher refractive index, simultaneous employment with such a liquid immersion medium of higher refractive index would realize higher enhancement of pattern precision. A protection film is formed on the surface of employed resist film with the use of a composition comprising an acrylic resin component with the properties of having substantially no compatibility with a liquid for resist film immersion, especially water, and being soluble in alkali.
-
公开(公告)号：EP1589375A4
公开(公告)日：2010-02-17
申请号：EP04705532
申请日：2004-01-27
发明人： HIRAYAMA TAKU , HADA HIDEO , FUJIMURA SATOSHI , IWAI TAKESHI , SATO MITSURU , TAKASU RYOICHI , TACHIKAWA TOSHIKAZU , IWASHITA JUN , ISHIDUKA KEITA , YAMADA TOMOTAKA , TAKAYAMA TOSHIKAZU , YOSHIDA MASAAKI
CPC分类号： G03F7/70616 , G03F7/0382 , G03F7/0397 , G03F7/70341 , Y10S430/106 , Y10S430/111
-
8.发明公开IMMERSION EXPOSURE PROCESS-USE RESIST PROTECTION FILM FORMING MATERIAL, COMPOSITE FILM, AND RESIST PATTERN FORMING METHOD 审中-公开IMERSIONSBELICHTUNGSPROZESS使用率，抗蚀剂保护膜教学材料，复合膜的抗蚀图案形成方法
公开(公告)号：EP1596251A4
公开(公告)日：2009-05-20
申请号：EP04713169
申请日：2004-02-20
发明人： HIRAYAMA TAKU , TAKASU RYOICHI , SATO MITSURU , WAKIYA KAZUMASA , YOSHIDA MASAAKI , TAMURA KOKI
IPC分类号： G03F7/11 , G03F7/039 , G03F7/20 , H01L21/027
CPC分类号： G03F7/2041 , G03F7/11
摘要： An immersion exposure process-use resist protection film forming material formed on a resist film, the material having characteristics of being transparent to an exposure light, having practically no miscibility with an immersion exposure-use liquid and causing no mixing with the resist film; a protection film formed by this material; a composite film having the resist film; and a resist pattern forming method using them. These can prevent the degeneration of a resist film during immersion exposing and the degeneration of a liquid being used at the same time, and can form a high-resolution resist pattern using immersion exposing.
-
-
-
-
-
-
-
搜索结果
8 条记录 (耗时 0.01 秒)
