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    NOVEL FLUOROPOLYMER, RESIST COMPOSITIONS CONTAINING THE SAME, AND NOVEL FLUOROMONOMERS
    3.
    发明公开
    NOVEL FLUOROPOLYMER, RESIST COMPOSITIONS CONTAINING THE SAME, AND NOVEL FLUOROMONOMERS 审中-公开
    关于荧光素酶，耐药物抗氧化剂

    公开(公告)号：EP1449860A4

    公开(公告)日：2005-06-01

    申请号：EP02772966

    申请日：2002-10-02

    申请人： DAIKIN IND LTD

    发明人： ARAKI TAKAYUKI ,  ISHIKAWA TAKUJI ,  KOH MEITEN

    IPC分类号： C07C31/38 ,  C07C33/42 ,  C07C33/44 ,  C07C35/52 ,  C08F214/18 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C35/48 ,  C07C57/56

    CPC分类号： C07C25/13 ,  C07C25/18 ,  C07C25/22 ,  C07C31/38 ,  C07C33/423 ,  C07C33/44 ,  C07C35/52 ,  C07C43/313 ,  C07C45/63 ,  C07C49/167 ,  C07C2601/08 ,  C07C2602/42 ,  C07F9/5407 ,  C07F9/5435 ,  C07F9/5442 ,  C07F9/5449 ,  C07F9/5456 ,  C07F9/591 ,  C08F8/00 ,  C08F214/18 ,  C08F214/186 ,  C08F2800/10 ,  C08F2800/20 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  Y02P20/55 ,  Y10S430/106 ,  Y10S430/108 ,  C08F214/265 ,  C08F232/04 ,  C08F234/00 ,  C08F220/22

    摘要： A fluorocopolymer having aliphatic monocyclic structures in the backbone chain, as represented by the general formula Ma: - M1 - M2a - N - Ma wherein structural unit M1 is a unit derived from an ethylenic monomer having two or three carbon atoms and at least one fluorine atom structural unit M2a is at least one kind of unit represented by the general formula a and forming an aliphatic monocyclic structure in the backbone chain: a [wherein R1 is at least one group selected from among divalent hydrocarbon groups which each have one to eight ring-constituting carbon atoms and may be substituted with hydrocarbyl or fluoroalkyl, and divalent hydrocarbon groups which each have an ether linkage with the sum of ring-constituting carbon and oxygen atoms ranging from 2 to 8 and may be substituted with hydrocarbyl or fluoroalkyl R2 is alkylene having one to three ring-constituting carbon atoms R3 and R4 are each independently alkylene having one or two carbon atoms and n1, n2, and n3 are each independently 0 or 1] and structural unit N is a unit derived from a monomer copolymerizable with structural units M1 and M2a, which comprises 1 to 99 mole % of structural units M1, 1 to 99 mole % of structural units M2a and 0 to 98 mole % of structural units N and has a number-average molecular weight of 500 to 1000000. This fluorocopolymer exhibits excellent dry etching resistance and transparency in the vacuum ultraviolet region.

    摘要翻译： 在聚合物主链中具有脂肪族单环结构的含氟共聚物，其数均分子量为500〜1,000,000，由式（Ma）表示： - （M1） - （M2a） - （ N） - 其中结构单元M1是源自具有2或3个碳原子和至少一个氟原子的烯属单体的结构单元，结构单元M2a是在聚合物中引入脂族单环结构的至少一个结构单元 主链，由式（a）表示：＆lt; CHEM＆gt;其中R 1为至少一个选自具有1至8个碳原子的二价烃基并可构成环的烃基 被烃基或含氟烷基取代，具有碳原子数和氧原子数之和为2〜8的醚键的二价烃基构成环，并且可以进一步被取代 具有烃基或含氟烷基; R 2是具有1至3个碳原子并构成环的亚烷基; R 3和R 4相同或不同，各自为具有1或2个碳原子并构成环的二价亚烷基; n1，n2和n3相同或不同，分别为0或1，结构单元N是衍生自可与单体共聚的单体的引入结构单元M1和M2a的结构单元，结构单元M1，M2a和 N的含量分别为1至99摩尔％，1至99摩尔％和0至98摩尔％。 含氟聚合物在真空紫外区域具有优异的耐干蚀刻性和透明性。

    METHOD FOR FORMING FINE PATTERN
    5.
    发明公开
    METHOD FOR FORMING FINE PATTERN 审中-公开
    法形成组织微细化

    公开(公告)号：EP1413927A4

    公开(公告)日：2006-06-21

    申请号：EP02746013

    申请日：2002-07-12

    申请人： SEMICONDUCTOR LEADING EDGE TEC ,  DAIKIN IND LTD

    发明人： TORIUMI MINORU ,  YAMAZAKI TAMIO ,  WATANABE HIROYUKI ,  ITANI TOSHIRO ,  ARAKI TAKAYUKI ,  ISHIKAWA TAKUJI

    IPC分类号： G03F7/004 ,  G03F7/023 ,  G03F7/039 ,  H01L21/027

    CPC分类号： H01L21/0275 ,  G03F7/0046 ,  G03F7/0233 ,  G03F7/0395 ,  H01L21/0277 ,  H01L21/0278 ,  H01L21/0279

    摘要： A method for forming a fine pattern which comprises a step of forming a photosensitive layer on a substrate or a predetermined layer on a substrate by the use of a photosensitive composition comprising a compound capable of producing an acid through the irradiation thereof with a light and a fluorine−containing polymer containing a norbornene derivative unit having an OH group or a functional group capable of converting to an OH group by the action of an acid, an exposure step of selectively irradiating a predetermined region of the above photosensitive layer with an energy ray, a step of treating with heat the photosensitive layer after exposure, and a step of subjecting the photosensitive layer after heat treatment to a development treatment to remove selectively an exposed portion or an unexposed portion of the photosensitive layer. The method is advantageous in that it uses as a resist a photosensitive composition comprising a material exhibiting high transparency with respect to an exposure light of a short wave length, such as F 2 excimer laser, and having high practical utility.

    PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES
    6.
    发明公开
    PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES 有权
    VERFAHREN ZUR HERSTELLUNG VON FLUORHALTIGEN NORBORNENDERIVATEN

    公开(公告)号：EP1415974A4

    公开(公告)日：2005-07-27

    申请号：EP02746012

    申请日：2002-07-12

    申请人： DAIKIN IND LTD

    发明人： ARAKI TAKAYUKI ,  ISHIKAWA TAKUJI ,  KUME TAKUJI ,  YAMAMOTO AKINORI

    IPC分类号： C07C33/44 ,  C07C43/313 ,  C07C45/45 ,  C07C49/567 ,  C07C61/28 ,  C07C69/96 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C45/68 ,  C07C29/36 ,  C07C43/172 ,  C08F32/00

    CPC分类号： G03F7/0395 ,  C07C33/44 ,  C07C43/313 ,  C07C45/45 ,  C07C49/567 ,  C07C61/28 ,  C07C69/96 ,  C07C2602/42 ,  C07C2603/86 ,  G03F7/0046 ,  G03F7/0382

    摘要： Novel norbornene derivatives bearing fluorinated ketone or fluorinated alcohol moieties attached directly to norbornene skeleton, which are useful as material of chemically amplified photoresists for F 2 laser lithography having excellent transparency and improved dry etching resistance; fluorine −containing polymers produced by using the derivatives as comonomer; and chemically amplified photoresist compositions each comprising a fluorine−containing polymer described above, a photoacid generator, and a solvent.

    摘要翻译： 具有含氟酮结构的含氟降冰片烯衍生物的制造包括使降冰片烯衍生物与氟烷基化剂反应。 具有式（II）的含氟酮结构的含氟降冰片烯衍生物的制造包括将式（I）的降冰片烯衍生物和引入Rf 1>的氟烷基化剂与（I）中的X反应。 [图像] [图像] X： - （R 1>）n2-X 1>; X 1> -COOR 2>或-C（= O）X 2>; R 2> 1-5C烷基; X 2>卤素原子; R 1>二价有机基团; n2：0或1; Y：H，F，Cl，1-10C烷基或任选含有醚键的氟代烷基; n：0-5; m：1-5; m + n1：6; 任选含有醚键的Rf 1> 1-10C氟代烷基; 和Z： - （R 1）n 2 -C（= O）R f 1。 还包括以下独立权利要求：（1）制造具有氟代醇结构的含氟降冰片烯衍生物; （2）具有式（V）的含氟酮结构的降冰片烯衍生物; （3）具有氟代醇结构的降冰片烯衍生物; （4）式 - （M1） - （M2） - （N） - 的数均分子量为500-1000000的含氟聚合物; （5）包含聚合物，光酸产生剂和溶剂的化学放大光致抗蚀剂组合物。 [图像] [图像] [图像] Z 3> -C（= O）Rf 3>; 任选含有醚键或式（VI）或（VII）的Rf 3> 1-10C氟代烷基; M1：衍生自降冰片烯衍生物的单元; M2：衍生自2-3C烯属单体的单元; N：可共聚单体。