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    SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL
    1.
    发明公开
    SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL 审中-公开

    公开(公告)号：EP4391011A2

    公开(公告)日：2024-06-26

    申请号：EP24174495.2

    申请日：2018-09-21

    申请人： LAM Research Corporation

    发明人： GREGOR, Mariusch

    IPC分类号： H01J37/32

    CPC分类号： H01L21/6719 ,  H01L21/67253 ,  C23C16/45544 ,  C23C16/45557 ,  H01J37/32449 ,  H01L21/67028 ,  H01L21/67017

    摘要： A substrate processing system for treating a substrate includes a manifold and a plurality of injector assemblies located in a processing chamber. Each of the plurality of injector assemblies is in fluid communication with the manifold and includes a valve including an inlet and an outlet. A dose controller is configured to communicate with the valve in each of the plurality of injector assemblies and adjust a pulse width supplied to the valve in each of the plurality of injector assemblies based on at least one of manufacturing differences between the valves in each of the plurality of injector assemblies and non-uniformities of the valves in each of the plurality of injector assemblies to cause a desired dose to be supplied from the valve in each of the plurality of injector assemblies.