摘要:
Disclosed is a manufacturing method of a solar cell, including forming a photoelectric converter including an amorphous semiconductor layer, forming an electrode connected to the photoelectric converter, and performing a post-treatment by providing light to the photoelectric converter and the electrode.
摘要:
A thin film solar cell module includes a substrate, at least one first cell positioned in a central area of the substrate, and at least one second cell positioned in an edge area of the substrate. Each of the first and second cells includes a first electrode, a second electrode, and at least one photoelectric conversion unit positioned between the first electrode and the second electrode. An amount of germanium contained in the photoelectric conversion unit of the first cell is less than an amount of germanium contained in the photoelectric conversion unit of the second cell positioned on the same level layer as the photoelectric conversion unit of the first cell.
摘要:
A method for fabricating a solar cell using inductively coupled plasma chemical vapor deposition (ICP-CVD) including a first electrode, a P layer, an intrinsic layer, an N-type layer and a second electrode. The method includes forming an intrinsic layer including a hydrogenated amorphous silicon (Si) thin film by an inductively coupled plasma chemical vapor deposition (ICP-CVD) device using mixed gas including hydrogen (H 2 ) gas and silane (SiH 4 ) gas. In the mixed gas, silane gas is in a ratio of 8 to10 relative to mixed gas.
摘要:
A thin film solar cell module includes a substrate, at least one first cell positioned in a central area of the substrate, and at least one second cell positioned in an edge area of the substrate. Each of the first and second cells includes a first electrode, a second electrode, and at least one photoelectric conversion unit positioned between the first electrode and the second electrode. An amount of germanium contained in the photoelectric conversion unit of the first cell is less than an amount of germanium contained in the photoelectric conversion unit of the second cell positioned on the same level layer as the photoelectric conversion unit of the first cell.
摘要:
This invention provides a photovoltaic semiconductor device of high efficiency capable of maintaining good interface characteristics of an amorphous semiconductor layer and a transparent electrode (5) by eliminating damage caused by plasma of a plasma doping layer formed by doping impurity to the i-type amorphous semiconductor layer (2). The i-type amorphous semiconductor layer (2) substantially does not contain impurity for reducing electric resistance on a textured surface of an n-type single crystalline substrate. Then, the plasma doping layer is formed by exposing the n-type single crystalline substrate (1) with the amorphous semiconductor layer formed thereon in an atmosphere of excited gas containing p-type impurity and diffusing the impurity to the amorphous semiconductor layer. A p-type amorphous semiconductor thin film layer containing p-type impurity is formed on the plasma doping layer by chemical vapor deposition and a transparent electrode (5) is formed on the p-type amorphous semiconductor thin film.
摘要:
Substrate temperatures are maintained above 400 °C during the microwave energized glow discharge deposition of Group IV semiconductor materials. The substrate temperature range provides for the preparation of materials having improved electrical properties.
摘要:
Plasma deposition of substantially amorphous semiconductor materials is carried out under a set of deposition parameters which are selected so that the process operates near the amorphous/microcrystalline threshold. This threshold varies as a function of the thickness of the depositing semiconductor layer; and, deposition parameters, such as diluent gas concentrations, must be adjusted as a function of layer thickness. Also, this threshold varies as a function of the composition of the depositing layer, and in those instances where the layer composition is profiled throughout its thickness, deposition parameters must be adjusted accordingly so as to maintain the amorphous/microcrystalline threshold.
摘要:
Provided are an apparatus of forming a non-single-crystal semiconductor thin film comprising a film deposition chamber having a film-forming space surrounded by a film deposition chamber wall and a beltlike substrate, and an external chamber surrounding the deposition chamber wall, wherein while the beltlike substrate is moved in a longitudinal direction thereof, a film-forming gas is introduced through a gas supply device into the film-forming space and microwave energy is radiated from a microwave applicator into the film-forming space to induce a microwave plasma therein, thereby forming a non-single-crystal semiconductor thin film on a surface of the beltlike substrate, and wherein a cooling mechanism and a temperature-increasing mechanism are provided such that the mechanisms cover a part of an outside surface of the deposition chamber wall, and wherein the gas supply device comprises a gas manifold, the gas manifold being provided apart from the deposition chamber wall, and methods of forming a non-single-crystal semiconductor thin film using the above forming apparatus and methods of producing a photovoltaic device by using the methods of forming the thin film. These permit a non-single-crystal semiconductor thin film to be formed across a large area on the substrate and with high quality and excellent uniformity.
摘要:
The photovoltaic element of the present invention is a photovoltaic element comprised of a semiconductor-junctioned element, characterized in that the element includes a first electrically conductive type semiconductor layer, a non-crystalline i type semiconductor layer, a microcrystalline i type semiconductor layer and a microcrystalline second electrically conductive type semiconductor layer and is pin-junctioned, and a method of and an apparatus for manufacturing the same are characterized by efficiently and continuously mass-producing the photovoltaic element having an excellent current-voltage characteristic and excellent photoelectric conversion efficiency. Thereby, there are provided a photovoltaic element in which the junction interface between the non-crystalline i type layer and the microcrystalline electrically conductive type layer has good grating consistency and which has an excellent current-voltage characteristic and excellent photoelectric conversion efficiency, and a method of and an apparatus for continuously mass-producing the same.