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    Synthesizing method of polysuccinimide, its copolymer, and derivatives thereof
    22.
    发明专利
    Synthesizing method of polysuccinimide, its copolymer, and derivatives thereof 审中-公开
    聚碳酸酯，其共聚物及其衍生物的合成方法

    公开(公告)号：JP2005146277A

    公开(公告)日：2005-06-09

    申请号：JP2004317602

    申请日：2004-11-01

    申请人： Folia Inc ,  フォリア,インコーポレイテッド

    发明人： SWIFT GRAHAM ,  REDLICH GEORGE H

    IPC分类号： C08G69/10 ,  C07C227/40 ,  C07C229/24 ,  C08G69/04 ,  C08G69/08 ,  C08G73/00 ,  C08G73/10 ,  C08L79/08

    CPC分类号： C07C227/40 ,  C08G73/1092 ,  C08L79/08 ,  Y02P20/544 ,  C07C229/24

    摘要： PROBLEM TO BE SOLVED: To provide a water-soluble or water-wettable amido/imide polyamic acid as a polysuccinimide, its copolymer, and derivatives thereof. SOLUTION: A synthesizing method of the polysuccinimide derivatives comprises synthesizing the polysuccinimide by using L-aspartic acid as a starting material in a supercritical fluid (SCF) such as liquid CO 2 or in supercritical CO 2 in an organic cosolvent, and about its polymer or its copolymer, further making a ring-opening reaction of a polysuccinamide in water in the presence of an amine. COPYRIGHT: (C)2005,JPO&NCIPI

    摘要翻译： 要解决的问题：提供作为聚琥珀酰亚胺的水溶性或水可湿性的酰氨基/酰亚胺聚酰胺酸，其共聚物及其衍生物。 聚丁二酰亚胺衍生物的合成方法包括使用L-天冬氨酸作为起始原料在超临界流体（SCF）如液体CO 2 SBB或超临界CO 2中合成聚琥珀酰亚胺， SB> 2 ，并且关于其聚合物或其共聚物，在胺的存在下进一步进行聚琥珀酰胺在水中的开环反应。 版权所有（C）2005，JPO＆NCIPI

    POLYAMIDE HAVING EXCELLENT DRAWABILITY
    27.
    发明专利
    POLYAMIDE HAVING EXCELLENT DRAWABILITY 审中-公开

    公开(公告)号：JP2003138013A

    公开(公告)日：2003-05-14

    申请号：JP2001342761

    申请日：2001-11-08

    申请人： UBE INDUSTRIES

    发明人： NAKAMURA KOJI

    IPC分类号： C08J5/18 ,  C08G69/08 ,  D01F6/60

    摘要： PROBLEM TO BE SOLVED: To provide a polyamide having excellent drawability and particularly suitable for successive biaxial drawing. SOLUTION: This polyamide comprises (A) a unit composed of a lactam and/or an aminocarboxylic acid, (B) a unit composed of a dicarboxylic acid, and (C) a unit composed of a diamine including an alicyclic diamine having a tricyclodecane and/or pentacyclopentadecane structural unit. Those represented by the following general formula [1] are examples of the alicyclic diamine (wherein R1 -R4 are each independently a 1-4C alkyl group or a hydrogen atom; m is 1 or 2; and p and q are each an integer of 0-2).

    28.
    发明专利
    失效

    公开(公告)号：JP3353292B2

    公开(公告)日：2002-12-03

    申请号：JP8566499

    申请日：1999-03-29

    IPC分类号： H01L21/027 ,  C08G69/08 ,  C08G69/48 ,  C08K5/00 ,  C08L77/00 ,  G03F7/004 ,  G03F7/037 ,  G03F7/039

    摘要： A far-ultraviolet resist is a chemically amplified resist comprising a base resin and a photoacid generator. As the base resin, used are resins having a cyclic carbonate bonded by an amid bond, which is highly transparent to the far-ultraviolet radiation and is excellent in resistance to etching. These resins include t-butyl protective poly(2,5-carboxy nor-bornane amide), t-butyl protective poly(p-carboxy amino-cyclohexane amide), and t-butyl protective poly(2,5-carboxy amino-adamantane amide). These resins provide excellent adhesion to Si substrates, improved resistance to dragging and placement after exposure, and improved pattern shapes.