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公开(公告)号:JP4938531B2
公开(公告)日:2012-05-23
申请号:JP2007101346
申请日:2007-04-09
Applicant: トヨタ自動車株式会社 , 株式会社豊田中央研究所
IPC: H01L29/12 , H01L21/337 , H01L21/338 , H01L29/778 , H01L29/78 , H01L29/808 , H01L29/812
CPC classification number: H01L29/2003 , H01L29/045 , H01L29/205 , H01L29/66462 , H01L29/7786 , H01L29/7788 , H01L29/7789 , H01L29/7828
Abstract: A semiconductor device 10 is provided with a first hetero junction 40b configured with two types of nitride semiconductors having different bandgap energy from each other, a second hetero junction 50b configured with two types of nitride semiconductors having different bandgap energy from each other, and a gate electrode 58 facing the second hetero junction 50b. The second hetero junction 50b is configured to be electrically connected to the first hetero junction 40b. The first hetero junction 40b is a c-plane and the second hetero junction 50b is either an a-plane or an m-plane.
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公开(公告)号:JP4818844B2
公开(公告)日:2011-11-16
申请号:JP2006212441
申请日:2006-08-03
Applicant: トヨタ自動車株式会社 , 株式会社豊田中央研究所
IPC: H01L21/28 , H01L21/338 , H01L29/12 , H01L29/417 , H01L29/778 , H01L29/78 , H01L29/80 , H01L29/812
CPC classification number: H01L29/7788
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公开(公告)号:JP5558196B2
公开(公告)日:2014-07-23
申请号:JP2010107657
申请日:2010-05-07
Applicant: トヨタ自動車株式会社 , 株式会社豊田中央研究所
IPC: H01L29/812 , H01L21/338 , H01L29/778 , H01L29/786
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公开(公告)号:JP5253006B2
公开(公告)日:2013-07-31
申请号:JP2008156472
申请日:2008-06-16
Applicant: 株式会社豊田中央研究所 , トヨタ自動車株式会社
IPC: H01L21/336 , H01L21/205 , H01L29/78 , H01L29/786
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公开(公告)号:JP4963455B2
公开(公告)日:2012-06-27
申请号:JP2007229153
申请日:2007-09-04
Applicant: トヨタ自動車株式会社 , 国立大学法人北海道大学 , 株式会社豊田中央研究所
IPC: H01L21/316 , C23C16/40 , H01L21/31
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公开(公告)号:JP4542178B2
公开(公告)日:2010-09-08
申请号:JP2008183496
申请日:2008-07-15
Applicant: トヨタ自動車株式会社 , 株式会社豊田中央研究所
IPC: H01L29/80 , H01L21/336 , H01L21/338 , H01L29/423 , H01L29/47 , H01L29/49 , H01L29/78 , H01L29/812 , H01L29/872
CPC classification number: H01L29/8122 , H01L29/0623 , H01L29/0657 , H01L29/1029 , H01L29/1037 , H01L29/1075 , H01L29/1079 , H01L29/42316 , H01L29/7828 , H01L29/7832 , H01L29/7838 , H01L29/812
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公开(公告)号:JP5302553B2
公开(公告)日:2013-10-02
申请号:JP2008053543
申请日:2008-03-04
Applicant: トヨタ自動車株式会社 , 株式会社豊田中央研究所 , 国立大学法人北海道大学
IPC: H01L21/338 , H01L21/336 , H01L29/778 , H01L29/78 , H01L29/812
Abstract: PROBLEM TO BE SOLVED: To provide a semiconductor device and a manufacturing method thereof, reducing a reduction in drain current incidental to operating temperature rise in the semiconductor device having heterojunction of a nitride semiconductor layer. SOLUTION: An HEMT 100 includes a semiconductor substrate 5 on which an undoped GaN layer 2 and an n-type AlGaN layer 4 are laminated in this order, a source electrode 6 and a drain electrode 10 formed on a surface of the semiconductor substrate 5 and a gate electrode 8 formed between the source electrode 6 and the drain electrode 10. A group of a plurality of recessed parts 14, each defining a first side face 12a extending in a direction of linking the source electrode 6 with the drain electrode 10 and a second side face 12b extending orthogonal to the first side face, is formed in the surface of the semiconductor substrate 5. The gate electrode 8 covers the first and second side faces 12a, 12b. In the HEMT 100, mesa-type conduction channels are connected in parallel. COPYRIGHT: (C)2009,JPO&INPIT
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公开(公告)号:JP5221577B2
公开(公告)日:2013-06-26
申请号:JP2010050058
申请日:2010-03-08
Applicant: トヨタ自動車株式会社 , 株式会社豊田中央研究所
IPC: H01L21/338 , H01L21/337 , H01L27/098 , H01L29/778 , H01L29/808 , H01L29/812
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公开(公告)号:JP4974454B2
公开(公告)日:2012-07-11
申请号:JP2004330123
申请日:2004-11-15
Applicant: トヨタ自動車株式会社 , 株式会社豊田中央研究所
IPC: H01L29/812 , H01L21/337 , H01L21/338 , H01L29/12 , H01L29/778 , H01L29/78 , H01L29/808 , H01L29/861 , H01L29/868
CPC classification number: H01L29/7788 , H01L29/0649 , H01L29/0653 , H01L29/0692 , H01L29/0696 , H01L29/0843 , H01L29/0847 , H01L29/0891 , H01L29/2003 , H01L29/41 , H01L29/778 , H01L29/7802 , H01L29/8122
Abstract: A semiconductor device is provided with a drain electrode 22, a semiconductor base plate 32, an electric current regulation layer 42 covering a part of a surface of the semiconductor base plate 32 and leaving a non-covered surface 55 at the surface of the semiconductor base plate 32, a semiconductor layer 50 covering a surface of the electric current regulation layer 42, and a source electrode 62 formed at a surface of the semiconductor layer 50. A drift region 56, a channel forming region 54, and a source region 52 are formed within the semiconductor layer 50. The drain electrode 22 is connected to a first terminal of a power source, and the source electrode 62 is connected to a second terminal of the power source. With this semiconductor layer 50, it is possible to increase withstand voltage or reduce the occurrence of current leakage.
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公开(公告)号:JP4932305B2
公开(公告)日:2012-05-16
申请号:JP2006095395
申请日:2006-03-30
Applicant: トヨタ自動車株式会社 , 株式会社豊田中央研究所
IPC: H01L21/338 , H01L21/205 , H01L21/331 , H01L29/737 , H01L29/778 , H01L29/812
CPC classification number: H01L29/7788 , H01L29/2003
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