Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor integrated circuit device capable of immediately investigating the cause of fault. SOLUTION: When the ambient temperature of a diode 4 is raised to a predetermined temperature which exceeds a rated upper limit temperature, for example, voltage between the anode and the cathode of the diode 4 is lowered whereby the voltage of positive input terminal of a comparator 3 is lowered than the voltage of a negative input terminal. Then, a voltage which exceeds a blown-out threshold voltage is applied on both ends of a blown-out resistance element 7. Then, the blown-out resistance element 7 is cut and fracture mark remains in the semiconductor integrated circuit device 1. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device, in which a semiconductor element mounting substrate is bonded onto an island portion of a lead frame through a silicone-based thermosetting adhesive, wherein the sticking of an outgas component of the silicone-based thermosetting adhesive on a lead portion can be stably suppressed at low cost, and high reliability can be secured in a subsequent wire bonding stage. SOLUTION: When the semiconductor element mounting substrate 2 is bonded onto the island portion 1i of the lead frame 1 through the silicone-based thermosetting adhesive 3, set temperatures T2a and T2b of lead portions 1a and 1b, respectively, of the lead frame 1 are set higher than a set temperature T2i of the island portion 1i. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To materialize an inspection apparatus and an inspection method of an insulation isolated semiconductor device which can certainly detect insulation failure in an insulator which performs insulated isolation of an insulation isolated semiconductor device. SOLUTION: A predetermined voltage is applied to a first and a second voltage applied pads 20c and 30c by contacting a first and a second voltage applying probes 41 and 42 respectively, so as to detect the current which flows between an element formation region 20 and an isolation region 30. Furthermore, the electrical connection between a second voltage applied pad 30c and a second inspection applying probe 42 is detected by detecting the voltage between a second voltage applying probe 42 and an inspection probe 43, while contacting the inspection probe 43 with an inspection pad 31c. When current is not detected and electrical connection is detected, it is judged that the relation between the element formation region 20 and the isolation region 30 is in an insulated state. COPYRIGHT: (C)2008,JPO&INPIT