Negative photo sensitive resin composition, interlayer insulating film and forming method thereof
    2.
    发明专利
    Negative photo sensitive resin composition, interlayer insulating film and forming method thereof 审中-公开
    负离子敏感性树脂组合物,层间绝缘膜及其形成方法

    公开(公告)号:JP2013101365A

    公开(公告)日:2013-05-23

    申请号:JP2012278290

    申请日:2012-12-20

    CPC classification number: H01L21/02118 C08F277/00 G03F7/033 C08F222/1006

    Abstract: PROBLEM TO BE SOLVED: To provide a negative photo sensitive resin composition in which, when film thickness is increased, an interlayer insulating film having sufficiently superior characteristics such as resolution, translucency, thermal resistance, thermal discoloration resistance and solvent resistance, can be formed.SOLUTION: A negative photo sensitive resin composition includes (A) cycloolefin resin including repeating unit represented by the following formula (1), where R, R, Rand Rindependently represent substituent selected from hydrogen atom, alkyl group, alkenyl group, cycloalkyl group, aryl group or alkoxy group, or hydrolysis silyl group, alkoxycarbonyl group, trialkylsiloxycarbonyl group, alkylcarbonyloxy group, alkenylcarbonyloxy group and oxetanyl group, (B) multifunctional acryl monomer and (C) photo-polymerize initiator.

    Abstract translation: 要解决的问题:为了提供一种负片感光树脂组合物,其中当膜厚度增加时,具有足够优异特性如分辨率,半透明度,耐热性,耐热变色性和耐溶剂性的层间绝缘膜可以 形成。 解决方案:负型光敏树脂组合物包括(A)包含由下式(1)表示的重复单元的环烯烃树脂,其中R 1 ,R 2 ,R 3 和R 4 独立地表示选自氢原子,烷基, 烯基,环烷基,芳基或烷氧基,或水解甲硅烷基,烷氧基羰基,三烷基甲硅烷氧基羰基,烷基羰基氧基,烯基羰基氧基和氧杂环丁烷基,(B)多官能丙烯酰基单体和(C)光聚合引发剂。 版权所有(C)2013,JPO&INPIT

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