公开(公告)号：JP2020097613A

公开(公告)日：2020-06-25

申请号：JP2020022050

申请日：2020-02-13

Applicant: 株式会社エーピーアイ コーポレーション

Inventor： 竹原 潤 ,  村井 真人 ,  大谷 鷹士 ,  前田 智子 ,  日高 次彦

IPC: C07D498/08 ,  C07D309/12 ,  C07F7/18 ,  C07C309/68 ,  C07C309/75 ,  C07C233/47 ,  C07C233/83 ,  C07D211/60

Abstract: 【課題】(2S,5S)/(2R,5R)−5−ヒドロキシピペリジン−2−カルボン酸およびその合成中間体の製造方法の提供。 【解決手段】式(7)で表される化合物の水酸基を脱保護する工程等を含む製造方法。 (Pは保護基を、R 3 は炭素数1〜4のアルキル基を、Aはアルキル基等を示す。) 【選択図】なし

公开(公告)号：JP6467414B2

公开(公告)日：2019-02-13

申请号：JP2016525415

申请日：2014-07-08

IPC: A61K8/42 ,  A61K8/46 ,  A61Q5/02 ,  A61Q19/10 ,  C07C233/05 ,  C07C309/17 ,  C07C309/20 ,  C07C309/68 ,  C11D1/14 ,  C11D1/28 ,  C11D1/29 ,  C11D1/90 ,  C11D3/04 ,  C11D3/20 ,  C11D3/32 ,  C11D3/50

公开(公告)号：JP2009191000A

公开(公告)日：2009-08-27

申请号：JP2008032312

申请日：2008-02-13

Applicant: Institute Of Physical & Chemical Research ,  Tokyo Univ Of Science ,  学校法人東京理科大学 ,  独立行政法人理化学研究所

Inventor： HAYASHI YUJIRO ,  OSADA HIROYUKI ,  KAKEYA HIDEAKI

IPC: C07D407/04 ,  C07C59/58 ,  C07C309/68 ,  C07D225/06 ,  C07D307/40 ,  C07F7/18

CPC classification number: Y02P20/55

Abstract: PROBLEM TO BE SOLVED: To establish the total synthesis method of cytotrienin A, to provide an intermediate compound for synthesizing an ansamycin-based antibiotic comprising the cytotrienin A, to provide a method for producing the intermediate compound, and to provide a method for producing the ansamycin-based antibiotic. SOLUTION: The cytotrienin A is divided into four segments of a C1-C6 segment, a C7-C16 segment, a cyclopropanecarboxylic acid, and an aromatic segment, and the segments are linked, respectively to synthesize the cytotrienin A. A triene is constructed from a compound represented by formula (g) by a ring-closing metathesis reaction, and the protecting groups are then removed, particularly in the final stage of the synthesis. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了建立细胞色素A的总合成方法，提供用于合成包含细胞色素A的基于安莎霉素的抗生素的中间体化合物，以提供中间体化合物的制备方法，并提供一种方法 用于生产基于安莎霉素的抗生素。 解决方案：细胞色素A分为C1-C6片段，C7-C16片段，环丙烷羧酸和芳香片段的四个片段，并将片段分别连接以合成细胞色素A.将三烯 通过闭环复分解反应由式（g）表示的化合物构成，然后除去保护基，特别是在合成的最后阶段。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP4150509B2

公开(公告)日：2008-09-17

申请号：JP2001132546

申请日：2001-04-27

Applicant: 富士フイルム株式会社

Inventor： 邦彦 児玉 ,  利明 青合

IPC: G03F7/004 ,  C07C25/02 ,  C07C309/09 ,  C07C309/68 ,  C07C317/28 ,  C07C381/12 ,  C08K5/42 ,  C08L101/12 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To overcomes problems on a technology for enhancing performance proper to microphotofabrication using far ultraviolet light, particularly ArF excimer laser light and to provide a positive photosensitive composition excellent in sensitivity, resolving power and margin for exposure and less liable to generate scum. SOLUTION: The positive photosensitive composition contains a compound which generates a sulfonic acid of formula (X) when irradiated with active light or radiation and a resin having a mono- or polycyclic alicyclic hydrocarbon structure and having solubility in an alkali developing solution increased when decomposed by the action of the acid.

公开(公告)号：JP2006202766A

公开(公告)日：2006-08-03

申请号：JP2006034046

申请日：2006-02-10

Applicant: Aisin Seiki Co Ltd ,  アイシン精機株式会社

Inventor： KAMIYAMA KOJI

IPC: H01M8/02 ,  C07C309/67 ,  C07C309/68 ,  C08F112/14 ,  C08F116/36 ,  C08F255/00 ,  C08F259/08 ,  H01B1/06 ,  H01B13/00 ,  H01M8/10

CPC classification number: Y02E60/521

Abstract: PROBLEM TO BE SOLVED: To provide an electrolyte composite for a fuel cell high in oxidation resistance and low in water-absorbing property. SOLUTION: The electrolyte composite containing a polymer electrolyte material having a structure expressed by a general formula (1) is provided. In the general formula (1), BP is a base material composed of a polymer having a carbonaceous skeleton. R 1 and R 2 are each hydrogen or alkyl groups of which the structures are independently decided. R 3 is a straight-chain or branching alkylene group of which the carbon number is m, p is an integer≥0, and m, n, and p are each selected from positive integers. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供高耐氧化性和低吸水性的燃料电池用电解质复合材料。 解决方案：提供含有具有由通式（1）表示的结构的聚合物电解质材料的电解质复合材料。 在通式（1）中，BP是由具有碳质骨架的聚合物构成的基材。 R 1 和R 2 分别是氢或其结构独立决定的烷基。 R 3是直链或支链亚烷基，其碳数为m，p为整数≥0，m，n和p各自为正整数。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP3554539B2

公开(公告)日：2004-08-18

申请号：JP2000552085

申请日：1999-05-31

Applicant: アストラゼネカ アクチボラグ

Inventor： アンデルッソン，キエル

IPC: A61P3/06 ,  A61K31/19 ,  A61K31/192 ,  A61K31/216 ,  A61K31/255 ,  A61P3/04 ,  A61P3/08 ,  A61P3/10 ,  A61P9/10 ,  A61P9/12 ,  A61P43/00 ,  C07C69/734 ,  C07C217/76 ,  C07C233/25 ,  C07C233/29 ,  C07C233/75 ,  C07C235/42 ,  C07C255/54 ,  C07C271/28 ,  C07C271/38 ,  C07C271/44 ,  C07C271/58 ,  C07C275/34 ,  C07C303/26 ,  C07C309/65 ,  C07C309/66 ,  C07C309/68 ,  C07C309/73 ,  C07C311/08 ,  C07C311/13 ,  C07C311/16 ,  C07C317/22 ,  C07C317/28 ,  C07C323/19 ,  C07C323/44 ,  C07C323/56 ,  C07C335/18 ,  C07D263/04

CPC classification number: C07C303/30 ,  C07C217/76 ,  C07C233/25 ,  C07C233/29 ,  C07C233/75 ,  C07C235/42 ,  C07C255/54 ,  C07C271/28 ,  C07C271/38 ,  C07C271/44 ,  C07C271/58 ,  C07C275/34 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C311/08 ,  C07C311/13 ,  C07C311/16 ,  C07C317/22 ,  C07C317/28 ,  C07C323/19 ,  C07C323/44 ,  C07C323/56 ,  C07C335/18 ,  C07C2601/14

公开(公告)号：JP2003515581A

公开(公告)日：2003-05-07

申请号：JP2001541857

申请日：2000-11-29

IPC: A61P3/10 ,  A61K31/085 ,  A61K31/09 ,  A61K31/10 ,  A61K31/137 ,  A61K31/165 ,  A61K31/255 ,  A61K31/27 ,  A61K31/275 ,  A61K31/277 ,  A61P3/00 ,  A61P5/48 ,  C07C43/23 ,  C07C211/48 ,  C07C217/64 ,  C07C233/18 ,  C07C255/54 ,  C07C271/28 ,  C07C309/66 ,  C07C309/68 ,  C07C317/22 ,  C07C323/16

Abstract: The present invention relates to certain phenalkyloxy-phenyl derivatives of formula (I)and analogs, to a process for preparing such compounds, which compounds have utility in treating clinical conditions associated with insulin resistance, to methods for their therapeutic use and to pharmaceutical compositions containing them.

公开(公告)号：JP2003515580A

公开(公告)日：2003-05-07

申请号：JP2001541856

申请日：2000-11-29

IPC: A61P3/04 ,  A61K9/14 ,  A61K31/19 ,  A61K31/192 ,  A61K31/255 ,  A61P3/00 ,  A61P3/06 ,  A61P3/10 ,  A61P5/48 ,  A61P9/12 ,  C07C303/44 ,  C07C309/66 ,  C07C309/68

Abstract: The present invention relates to a reduced particle size form of the compound (S)-2-ethoxy-3-[4-(2-{4-methanesulfonyloxyphenyl}ethoxy)phenyl] propanoic acid, as shown in formula (I), or a pharmaceutically acceptable salt thereof or a solvate of either thereof. The invention also concerns methods of treating one or more conditions associated with Insulin Resistance Syndrome using the reduced particle size form of the compound, or a pharmaceutically acceptable salt thereof in the manufacture of a medicament for use in one or more of said conditions. The invention further concerns pharmaceutical compositions containing the reduced particle size form of the compound, or a pharmaceutically acceptable salt thereof, or a solvate thereof, as an active ingredient, as well as processes for the manufacture of the reduced particle size form of the compound, or a pharmaceutically acceptable salt thereof.

公开(公告)号：JP2002214774A

公开(公告)日：2002-07-31

申请号：JP2001132546

申请日：2001-04-27

Applicant: FUJI PHOTO FILM CO LTD

Inventor： KODAMA KUNIHIKO ,  AOSO TOSHIAKI

IPC: G03F7/004 ,  C07C25/02 ,  C07C309/09 ,  C07C309/68 ,  C07C317/28 ,  C07C381/12 ,  C08K5/42 ,  C08L101/12 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To overcomes problems on a technology for enhancing performance proper to microphotofabrication using far ultraviolet light, particularly ArF excimer laser light and to provide a positive photosensitive composition excellent in sensitivity, resolving power and margin for exposure and less liable to generate scum. SOLUTION: The positive photosensitive composition contains a compound which generates a sulfonic acid of formula (X) when irradiated with active light or radiation and a resin having a mono- or polycyclic alicyclic hydrocarbon structure and having solubility in an alkali developing solution increased when decomposed by the action of the acid.

公开(公告)号：JPH093016A

公开(公告)日：1997-01-07

申请号：JP13195096

申请日：1996-05-27

Applicant: ADIR

Inventor： DANIERU RUSHIYUURU ,  BUERONIKU REKUREERU ,  PATORITSUKU DOUPURIYU ,  FUIRITSUPU DOURAGURANJIYU ,  PIEERU RENAARU

IPC: A61K31/16 ,  A61K31/165 ,  A61K31/17 ,  A61K31/34 ,  A61K31/343 ,  A61K31/38 ,  A61K31/381 ,  A61K31/40 ,  A61K31/403 ,  A61K31/404 ,  A61P25/00 ,  A61P25/04 ,  A61P25/18 ,  A61P25/28 ,  C07C231/02 ,  C07C231/12 ,  C07C233/05 ,  C07C233/18 ,  C07C233/19 ,  C07C233/20 ,  C07C233/25 ,  C07C233/27 ,  C07C233/31 ,  C07C233/40 ,  C07C233/60 ,  C07C235/34 ,  C07C273/18 ,  C07C275/24 ,  C07C309/68 ,  C07C327/42 ,  C07C327/46 ,  C07C335/08 ,  C07C335/10 ,  C07C335/12 ,  C07D209/14 ,  C07D307/81 ,  C07D333/58

Abstract: Arylalkyl propylamide derivs. of formula (I), their enantiomers and diastereoisomers and their salts, are new except for N-Ä3-(4-hydroxy-naphth-1-yl)propylÜacetamide or N-Ä3-(4-benzyloxy-naphth-1-yl)propylÜacetamide. In (I), R1 = H, OH, R6 or OR6; R6 = e.g. opt. substd (cyclo)alkyl, opt. substd cycloalkylalkyl, alkenyl, alkynyl, cycloalkenyl, opt. substd phenyl etc.; R1' = R6', OR6', OH, COR7, CH2R7 or OCOR7; R6' = as R6; R7 = opt. substd 1-5C alkyl, opt. substd cycloalkyl or opt. substd cycloalkyl-(1-5C) alkyl, opt. substd phenyl etc.; Het A = e.g. dihydro- or tetrahydronaphthalene, naphthalene, benzothiophene etc.; n = 3-6; R2 = H or alkyl; R3 = C(=X)-R4 or C(=X)-NH-R5; X, X' = O or S; R4 = e.g. H, opt. substd. alkyl, alkenyl, alkynyl, opt. substd. cycloalkyl or opt. substd. cycloalkylalkyl; and R5 = H, opt. substd. alkyl, opt. substd cycloalkyl or opt. substd. cycloalkyl alkyl; with provisos.