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    신규 에스테르, 중합체, 레지스트 조성물 및 패턴 형성 방법
    4.
    发明公开
    신규 에스테르, 중합체, 레지스트 조성물 및 패턴 형성 방법 有权
    新西兰，聚合物，耐火组合物和图案形成方法

    公开(公告)号：KR1020040010072A

    公开(公告)日：2004-01-31

    申请号：KR1020030018412

    申请日：2003-03-25

    Applicant: 신에쓰 가가꾸 고교 가부시끼가이샤 ,  센트럴가라스 가부시기가이샤 ,  파나소닉 주식회사

    Inventor： 하라다유지 ,  하타케야마준 ,  가와이요시오 ,  사사고마사루 ,  엔도마사유키 ,  기시무라신지 ,  마에다가즈히코 ,  오오타니미치타카 ,  고모리야하루히코

    IPC: G03F7/039

    CPC classification number: C07C309/67 ,  C07C2603/68 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

    Abstract: PURPOSE: A sulfonate compound, a polymer prepared from the sulfonate compound, a resist composition containing the polymer and a pattern formation method using the composition are provided, to obtain a resist composition sensitive to high energy radiation and having excellent transparency, contrast and adhesion. CONSTITUTION: The sulfonate compound is represented by the formula 1 or 1a, wherein R1 to R3 are independently H, F, or a linear, branched or cyclic alkyl or fluoroalkyl group of C1-C20; R4 is a valent bond or a linear, branched or cyclic alkylene or fluoroalkylene group of C1-C20; R5 is a linear, branched or cyclic fluoroalkyl group of C1-C30; R6 to R8 are independently H, F or a linear, branched or cyclic alkyl or fluoroalkyl group of C1-C20, or R7 and R8 can form a ring in combination (wherein R7 and R8 are an alkylene group of C1-C20 capable of containing hetero atoms); R9 to R12 are independently H, F or a linear, branched or cyclic alkyl or fluoroalkyl group of C1-C20, at least one among them contains F, or two among them can form a ring in combination; and a is 0 or 1.

    Abstract translation: 目的：提供一种磺酸盐化合物，由磺酸盐化合物制备的聚合物，含有聚合物的抗蚀剂组合物和使用该组合物的图案形成方法，以获得对高能量辐射敏感且具有优异的透明度，对比度和粘附性的抗蚀剂组合物。 构成：磺酸盐化合物由式1或1a表示，其中R 1至R 3独立地为H，F或C 1 -C 20的直链，支链或环状烷基或氟代烷基; R4是C1-C20的价键或直链，支链或环状的亚烷基或氟亚烷基; R5是C1-C30的直链，支链或环状氟代烷基; R 6至R 8独立地为H，F或C 1 -C 20的直链，支链或环状烷基或氟代烷基，或者R 7和R 8可以组合形成环（其中R 7和R 8是能够含有 杂原子）; R9至R12独立地为H，F或C1-C20的直链，支链或环状烷基或氟代烷基，其中至少一个含有F，或者其中两个可以组合形成环; a是0或1。

    2-아릴 프로피온산 및 이를 함유하는 약제학적 조성물
    6.
    发明授权
    2-아릴 프로피온산 및 이를 함유하는 약제학적 조성물 有权
    2-아릴프로피온산및이를함유하는약제학적조성물

    公开(公告)号：KR101060064B1

    公开(公告)日：2011-08-29

    申请号：KR1020107017598

    申请日：2002-11-19

    Applicant: 돔페 파르마 에스.피.에이.

    Inventor： 알레그레티,마르첼로 ,  세스타,마리아칸디다 ,  베르티니,리카르도 ,  비짜리,신지아 ,  콜로타,프란세스코

    IPC: A61K31/192 ,  C07C57/42 ,  C07C63/08 ,  A61P29/00

    CPC classification number: A61K31/192 ,  A61K31/196 ,  C07C57/30 ,  C07C57/38 ,  C07C57/42 ,  C07C57/46 ,  C07C57/58 ,  C07C59/135 ,  C07C59/48 ,  C07C229/42 ,  C07C307/02 ,  C07C307/10 ,  C07C309/65 ,  C07C309/67 ,  C07C309/73 ,  C07C311/08 ,  C07C311/09 ,  C07C311/21 ,  C07C317/44

    Abstract: (R,S)-2-Aryl-propionic acids are useful as inhibitors of interleukin-8 induced human polymorphonucleated neutrophils (PMN) chemotaxis. (R,S)-2-Aryl-propionic acids of formula (I), their single (R) and (S) enantiomers or salts are useful as inhibitors of interleukin-8 (IL-8) induced human polymorphonucleated neutrophils (PMN) chemotaxis. [Image] Ar : phenyl ring (substituted by T in meta position, T1 in para position or T2 in ortho position); T : linear or branched 1-5C alkyl, 2-5C alkenyl, or 2-5C alkynyl (optionally substituted by 1-5C alkoxycarbonyl, optionally substituted phenyl, linear or branched 1-5C hydroxyalkyl or arylhydroxymethyl); T1benzoyloxy, benzoylamino, benzenesulfonyloxy, benzenesulfonylamino, benzenesulfonylmethyl (all optionally substituted), 1-5C acyloxy, 1-5C acylamino, 1-5C sulfonyloxy, 1-5C alkanesulfonylamino, 1-5C alkanesulfonylmethyl, 3-6C cycloalkyl, 2-furyl, 3-tetrahydrofuryl, 2- thiophenyl, 2-tetrahydrothiophenyl or ((1-8C)-alkanoyl, -cycloalkanoyl or -arylalkanoyl)-1-5C-alkylamino (preferably acetyl-N-methyl-amino or pivaloyl-N-ethyl-amino); and T2arylmethyl, aryloxy or acylamino (all optionally substituted by 1-4C alkyl, 1-4C-alkoxy, chlorine, fluorine or trifluoromethyl). The meta linear or branched 1-5C alkyl together with a substituent in ortho or para position and the benzene ring forms optionally saturated or optionally substituted bicyclo aryls. INDEPENDENT CLAIM are included for the following: (1) preparation of (I); and (2) use of (I) in the preparation of a medicament for the treatment of e.g. psoriasis, ulcerative colitis, melanoma and chronic obstructive pulmonary disease (COPD). - ACTIVITY : Antipsoriatic; Antiulcer; Respiratory-Gen.; Antirheumatic; Antiarthritic; Nephrotropic; Vasotropic; Antiinflammatory; Gastrointestinal-Gen.; Cytostatic. - MECHANISM OF ACTION : Interleukin-8 (IL-8) inhibitor; GROalpha inhibitor; CXCR2 agonist/antagonist. The ability of (R,S) 2-[(3'-isopropyl)phenyl]propionic acid (A) to inhibit IL-8 induced chemotaxis of human monocytes was tested as described in Van Damme J. et al. (Eur. J. Immunol., 19, 2367, 1989). (A) showed inhibition (%) of 51+-12.

    Abstract translation: （R，S）-2-芳基 - 丙酸可用作白细胞介素-8诱导的人多形核中性粒细胞（PMN）趋化性的抑制剂。 （I）的（R，S）-2-芳基 - 丙酸，它们的单（R）和（S）对映体或盐可用作白细胞介素-8（IL-8）诱导的人多形核中性粒细胞（PMN） 趋化作用。 Ar：苯环（由间位T取代，对位取代T1或邻位T2取代）; T：直链或支链1-5C烷基，2-5C链烯基或2-5C炔基（任选被1-5C烷氧基羰基，任选取代的苯基，直链或支链1-5C羟烷基或芳基羟甲基取代）; 苯磺酰基氨基，苯磺酰基甲基（全部任选被取代），1-5C酰氧基，1-5C酰基氨基，1-5C磺酰氧基，1-5C烷基磺酰基氨基，1-5C烷基磺酰基甲基，3-6C环烷基，2-呋喃基，3 （（1-8C） - 烷酰基，环烷酰基或 - 芳基烷酰基）-1-5C-烷基氨基（优选乙酰基-N-甲基 - 氨基或新戊酰基-N-乙基 - 氨基） ; 和二芳基甲基，芳氧基或酰氨基（全部任选被1-4C烷基，1-4C-烷氧基，氯，氟或三氟甲基取代）。 间位直链或支链1-5C烷基与邻位或对位的取代基一起形成并且苯环任选地形成饱和的或任选取代的双环芳基。 独立请求包括以下内容：（1）准备（I）; 和（2）（I）在制备用于治疗例如心脏病的药物中的用途。 牛皮癣，溃疡性结肠炎，黑素瘤和慢性阻塞性肺病（COPD）。 - 活动：抗牛皮癣; 抗溃疡; 呼吸根; 抗风湿; 抗关节炎; Nephrotropic; Vasotropic; 抗炎; 胃肠道根; 抑制细胞生长。 - 作用机制：白细胞介素-8（IL-8）抑制剂; GROalpha抑制剂; CXCR2激动剂/拮抗剂。 如Van Damme J.等人所述测试（R，S）2 - [（3'-异丙基）苯基]丙酸（A）抑制IL-8诱导的人单核细胞趋化性的能力。 （Eur.J.Immunol。，19,2367,1989）。 （A）显示51±12的抑制（％）。

    술폰산 에스테르, 폴리머, 레지스트 조성물 및 패턴형성방법
    9.
    发明公开
    술폰산 에스테르, 폴리머, 레지스트 조성물 및 패턴형성방법 有权
    新型磺化酸酯化合物，含有化合物的聚合物的聚合物，含聚合物的耐酸性组合物和使用具有改进的对比度和等离子体蚀刻电阻的组合物的耐蚀图案的形成方法

    公开(公告)号：KR1020040072479A

    公开(公告)日：2004-08-18

    申请号：KR1020040008686

    申请日：2004-02-10

    Applicant: 신에쓰 가가꾸 고교 가부시끼가이샤 ,  센트럴가라스 가부시기가이샤 ,  파나소닉 주식회사

    Inventor： 하라다유지 ,  하타케야마준 ,  가와이요시오 ,  사사고마사루 ,  엔도마사유키 ,  기시무라신지 ,  마에다가즈히코 ,  고모리야하루히코 ,  미야자와사토루

    IPC: C07C309/67

    CPC classification number: C07C309/67 ,  C07C2601/08 ,  C07C2601/14 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

    Abstract: PURPOSE: A sulfonic acid ester compound, a polymer containing the repeating unit derived from the compound, a resist composition containing the polymer and a formation method of a resist pattern using the composition are provided, to improve contrast and adhesion without the deterioration of transparency at a wavelength of below 200 nm. CONSTITUTION: The sulfonic acid ester compound is represented by the formula 1. The polymer comprises the repeating unit represented by the formula 2 and has a weight average molecular weight of 1,000-500,000. In the formulas 1 and 2, R1 to R3 are independently H, F or a linear, branched or cyclic C1-C20 alkyl or fluorinated alkyl group; at least one of R1 to R3 contains F; and R1 and R2, R1 and R3 or R2 and R3 can combine together to form a ring, and in this case R1 to R3 are independently a linear or branched C1-C18 alkylene or fluorinated alkylene group.

    Abstract translation: 目的：提供磺酸酯化合物，含有由化合物衍生的重复单元的聚合物，含有聚合物的抗蚀剂组合物和使用该组合物的抗蚀剂图案的形成方法，以改善对比度和粘附性，而不会降低透明度 波长低于200nm。 构成：磺酸酯化合物由式1表示。聚合物包含由式2表示的重复单元，其重均分子量为1,000-500,000。 在式1和式2中，R 1至R 3独立地为H，F或直链，支链或环状的C 1 -C 20烷基或氟化烷基; R1至R3中的至少一个含有F; 并且R 1和R 2，R 1和R 3或R 2和R 3可以结合在一起形成环，并且在这种情况下，R 1至R 3独立地为直链或支链C 1 -C 18亚烷基或氟化亚烷基。

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