公开(公告)号：US06862090B2

公开(公告)日：2005-03-01

申请号：US09927068

申请日：2001-08-09

申请人： Jianhui Chen ,  David M. Aikens

发明人： Jianhui Chen ,  David M. Aikens

IPC分类号： G01J3/10 ,  G01J3/00 ,  G01J3/28 ,  G01J3/42 ,  G01J4/00 ,  G01N21/00

CPC分类号： G01J3/10

摘要： A method and apparatus for combining the spectral outputs of multiple light sources to provide a high-efficiency broad-band illuminator for optical metrology is disclosed. The illuminator combines the output radiation from a plurality of broad-band lamps in a novel optical arrangement that creates a virtual source and avoids the use of beam-splitters. Consequently, the illuminator offers increased performance at reduced cost. The illuminator can be optimized and configured for application in a broad class of optical metrology instruments.

摘要翻译： 公开了一种用于组合多个光源的光谱输出以提供用于光学测量的高效宽带照明器的方法和装置。 照明器将来自多个宽带灯的输出辐射组合成新颖的光学布置，其创建虚拟源并避免使用光束分离器。 因此，照明器以降低的成本提供更高的性能。 照明器可以进行优化和配置，以应用于广泛的光学计量仪器。

公开(公告)号：US06744505B1

公开(公告)日：2004-06-01

申请号：US10208323

申请日：2002-07-30

申请人： David Y. Wang ,  David M. Aikens

发明人： David Y. Wang ,  David M. Aikens

IPC分类号： G01J314

CPC分类号： G01J3/02 ,  G01J3/0208 ,  G01J3/0256 ,  G01J3/1804 ,  G01J3/2823

摘要： The subject invention relates to the design of a compact imaging spectrometer for use in thin film measurement and general spectroscopic applications. The spectrometer includes only two elements, a rotationally symmetric aspheric reflector and a plane grating. When employed in a pupil centric geometry the spectrometer has no coma or image distortion. Both spherical aberration and astigmatism can be independently corrected. The invention is broadly applicable to the field of optical metrology, particularly optical metrology tools for performing measurements of patterned thin films on semiconductor integrated circuits

摘要翻译： 本发明涉及用于薄膜测量和一般光谱应用的紧凑型成像光谱仪的设计。 光谱仪仅包括两个元件，旋转对称非球面反射器和平面光栅。 当以瞳孔中心几何形式使用时，光谱仪没有昏迷或图像失真。 可以独立地校正球面像差和像散。 本发明广泛地适用于光学测量领域，特别是用于在半导体集成电路上执行图案化薄膜测量的光学测量工具

公开(公告)号：US4916536A

公开(公告)日：1990-04-10

申请号：US268337

申请日：1988-11-07

申请人： James R. Kerr ,  Michael E. Fossey ,  David M. Aikens ,  Bruce L. Cannon ,  John J. McDonald

发明人： James R. Kerr ,  Michael E. Fossey ,  David M. Aikens ,  Bruce L. Cannon ,  John J. McDonald

IPC分类号： G01S7/481 ,  G01S17/89

CPC分类号： G01S7/4817 ,  G01S17/89 ,  G01S7/4811

摘要： The imaging range finder of the invention includes a radiation transmitter, a transmitting section and a receiving section. The transmitting section directs radiation across an angular field of view by a first rotating mirror having a plurality of facets. The receiving section includes a second rotating mirror also with a plurality of facets which collects any reflected radiation. An image is produced by measuring the intensity of the reflected radiation at numerous points in the field of view. Range is determined by radiation modulation. Range may be determined more precisely at shorter ranges by modulating the radiation to produce two subcarriers and using one subcarrier to supply short range information. The finder is stabilized to preserve imaging and range finding accuracy when it is exposed to vibration or pitch-angle disturbance. The invention also discloses a method of imaging and range finding over very wide angles and at standard picture frame frequencies.

摘要翻译： 本发明的成像测距仪包括辐射发射器，发射部分和接收部分。 发射部分通过具有多个小平面的第一旋转反射镜引导横跨角度视场的辐射。 接收部分包括具有收集任何反射辐射的多个小面的第二旋转镜。 通过在视场中的多个点测量反射辐射的强度来产生图像。 范围由辐射调制决定。 通过调制辐射以产生两个子载波并且使用一个子载波来提供短距离信息，可以在较短范围内更准确地确定范围。 当它被暴露于振动或俯仰角扰动时，取景器被稳定以保持成像和测距精度。 本发明还公开了一种在非常宽的角度和标准图像帧频率下成像和测距的方法。

公开(公告)号：US08543557B2

公开(公告)日：2013-09-24

申请号：US11096845

申请日：2005-04-01

申请人： David M. Aikens ,  Youxian Wen ,  Walter Lee Smith

发明人： David M. Aikens ,  Youxian Wen ,  Walter Lee Smith

IPC分类号： G06F7/00

CPC分类号： G01N21/47 ,  G01N21/9501 ,  G01N21/956 ,  Y10S707/99936 ,  Y10S707/99943

摘要： An optical metrology includes a library, a metrology tool and a library evolution tool. The library is generated to include a series of predicted measurements. Each predicted measurement is intended to match the measurements that a metrology device would record when analyzing a corresponding physical structure. The metrology tool compares its empirical measurements to the predicted measurements in the library. If a match is found, the metrology tool extracts a description of the corresponding physical structure from the library. The library evolution tool operates to improve the efficiency of the library. To make these improvements, the library evolution tool statistically analyzes the usage pattern of the library. Based on this analysis, the library evolution tool increases the resolution of commonly used portions of the library. The library evolution tool may also optionally reduce the resolution of less used portions of the library.

公开(公告)号：US07154607B2

公开(公告)日：2006-12-26

申请号：US10700086

申请日：2003-11-03

申请人： James Lee Hendrix ,  David Y. Wang ,  David M. Aikens ,  Lawrence Rotter ,  Joel Ng

发明人： James Lee Hendrix ,  David Y. Wang ,  David M. Aikens ,  Lawrence Rotter ,  Joel Ng

IPC分类号： G01N21/55

CPC分类号： G01J3/02 ,  G01J3/0218 ,  G01J3/10 ,  G01N21/55 ,  G01N21/9501 ,  G01N2201/06146 ,  G01N2201/0826

摘要： A flat spectrum illumination source for use in optical metrology systems includes a first light source generating a visible light beam and a second light source generating an ultraviolet light beam. The illumination source also includes an auxiliary light source generating a light beam at wavelengths between the visible light beam and the ultraviolet light beam. The three light beams are combined to provide a broadband probe beam that has substantially even illumination levels across a broad range of wavelengths. Alternately, the illumination source may be fabricated as an array of light emitting diodes selected to cover a range of separate wavelengths. The outputs of the LED array are combined to produce the broadband probe beam.

摘要翻译： 用于光学测量系统的平面光谱照明源包括产生可见光束的第一光源和产生紫外光束的第二光源。 照明源还包括在可见光束和紫外光束之间的波长处产生光束的辅助光源。 三个光束被组合以提供在宽范围的波长上具有基本均匀的照明水平的宽带探测光束。 或者，照明源可以被制造为被选择以覆盖一定范围的分开的波长的发光二极管的阵列。 组合LED阵列的输出以产生宽带探测光束。

公开(公告)号：US06898596B2

公开(公告)日：2005-05-24

申请号：US10145848

申请日：2002-05-14

申请人： David M. Aikens ,  Youxian Wen ,  Walter Lee Smith

发明人： David M. Aikens ,  Youxian Wen ,  Walter Lee Smith

IPC分类号： G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G06F17/30

CPC分类号： G01N21/47 ,  G01N21/9501 ,  G01N21/956 ,  Y10S707/99936 ,  Y10S707/99943

摘要： An optical metrology includes a library, a metrology tool and a library evolution tool. The library is generated to include a series of predicted measurements. Each predicted measurement is intended to match the measurements that a metrology device would record when analyzing a corresponding physical structure. The metrology tool compares its empirical measurements to the predicted measurements in the library. If a match is found, the metrology tool extracts a description of the corresponding physical structure from the library. The library evolution tool operates to improve the efficiency of the library. To make these improvements, the library evolution tool statistically analyzes the usage pattern of the library. Based on this analysis, the library evolution tool increases the resolution of commonly used portions of the library. The library evolution tool may also optionally reduce the resolution of less used portions of the library.

摘要翻译： 光学计量学包括图书馆，计量工具和图书馆进化工具。 生成库以包括一系列预测的测量。 每个预测的测量旨在与测量设备在分析相应的物理结构时记录的测量值相匹配。 计量工具将其经验测量与库中的预测测量进行比较。 如果找到匹配项，则计量工具从库中提取对应物理结构的描述。 图书馆进化工具可以提高图书馆的效率。 为了进行这些改进，图书馆进化工具统计分析图书馆的使用模式。 基于此分析，图书馆进化工具增加了图书馆常用部分的分辨率。 图书馆进化工具还可以选择性地降低图书馆较少使用部分的分辨率。

公开(公告)号：US06879449B2

公开(公告)日：2005-04-12

申请号：US10429268

申请日：2003-05-02

申请人： David Y. Wang ,  David M. Aikens

发明人： David Y. Wang ,  David M. Aikens

IPC分类号： G02B9/14 ,  G02B9/16 ,  G02B13/14 ,  G02B9/12 ,  G02B9/04

CPC分类号： G02B13/146 ,  G02B9/14 ,  G02B9/16

摘要： The subject invention relates to broadband optical metrology tools for performing measurements of patterned thin films on semiconductor integrated circuits. Particularly a family of optical designs for broadband, multi-wavelength, DUV-IR (185

摘要翻译： 本发明涉及用于对半导体集成电路上的图案化薄膜进行测量的宽带光学测量工具。 特别是用于宽带，多波长，DUV-IR（185 <λ<900nm）全折射光学系统的光学设计系列。 这些设计具有净聚焦功率，这通过将至少一个带正电的光学元件与一个负电光学元件组合来实现。 这些设计在185-900nm的波长范围内具有小的尺寸，具有显着减小的球面像差，轴向颜色，球形色差和纬向球面像差。 折射光学系统广泛适用于大类宽带光学晶片计量工具，包括分光光度计，光谱反射计，光谱椭偏仪和分光散射仪。

公开(公告)号：US06587282B1

公开(公告)日：2003-07-01

申请号：US10222296

申请日：2002-08-16

申请人： David Y. Wang ,  David M. Aikens

发明人： David Y. Wang ,  David M. Aikens

IPC分类号： G02B900

CPC分类号： G02B13/146 ,  G02B9/14 ,  G02B9/16

摘要： The subject invention relates to broadband optical metrology tools for performing measurements of patterned thin films on semiconductor integrated circuits. Particularly a family of optical designs for broadband, multi-wavelength, DUV-IR (185

摘要翻译： 本发明涉及用于对半导体集成电路上的图案化薄膜进行测量的宽带光学测量工具。 特别是宽带，多波长，DUV-IR（185

公开(公告)号：US6099389A

公开(公告)日：2000-08-08

申请号：US166817

申请日：1998-10-05

申请人： Michael A. Nichols ,  David M. Aikens ,  David W. Camp ,  Ian M. Thomas ,  Craig Kiikka ,  Lynn M. Sheehan ,  Mark R. Kozlowski

发明人： Michael A. Nichols ,  David M. Aikens ,  David W. Camp ,  Ian M. Thomas ,  Craig Kiikka ,  Lynn M. Sheehan ,  Mark R. Kozlowski

IPC分类号： B24B1/00 ,  B24B9/14 ,  B24B13/00

CPC分类号： B24B9/14 ,  B24B1/00 ,  B24B13/0037

摘要： A method for forming optical parts used in laser optical systems such as high energy lasers, high average power lasers, semiconductor capital equipment and medical devices. The optical parts will not damage during the operation of high power lasers in the ultra-violet light range. A blank is first ground using a fixed abrasive grinding method to remove the subsurface damage formed during the fabrication of the blank. The next step grinds and polishes the edges and forms bevels to reduce the amount of fused-glass contaminants in the subsequent steps. A loose abrasive grind removes the subsurface damage formed during the fixed abrasive or "blanchard" removal process. After repolishing the bevels and performing an optional fluoride etch, the surface of the blank is polished using a zirconia slurry. Any subsurface damage formed during the loose abrasive grind will be removed during this zirconia polish. A post polish etch may be performed to remove any redeposited contaminants. Another method uses a ceria polishing step to remove the subsurface damage formed during the loose abrasive grind. However, any residual ceria may interfere with the optical properties of the finished part. Therefore, the ceria and other contaminants are removed by performing either a zirconia polish after the ceria polish or a post ceria polish etch.

摘要翻译： 用于形成用于诸如高能激光器，高平均功率激光器，半导体资本设备和医疗设备的激光光学系统中的光学部件的方法。 在紫外光范围内的大功率激光器的操作过程中，光学部件不会损坏。 使用固定的研磨研磨方法首先研磨坯料以去除在坯料制造期间形成的地下损伤。 下一步研磨和抛光边缘并形成斜面以减少随后步骤中熔融玻璃污染物的量。 松散的研磨研磨可消除在固定磨料或“漂白剂”去除过程中形成的地下损伤。 在重新抛光斜面并进行可选的氟化物蚀刻之后，使用氧化锆浆料对坯料的表面进行抛光。 在这种氧化锆抛光期间，在松散研磨研磨过程中形成的任何地下损伤将被去除。 可以进行后抛光蚀刻以去除任何再沉积的污染物。 另一种方法是使用二氧化铈抛光步骤来去除在磨料研磨过程中形成的地下损伤。 然而，任何残留的二氧化铈可能会干扰成品部件的光学性能。 因此，通过在二氧化铈抛光之后进行氧化锆抛光或氧化铈抛光蚀刻来除去二氧化铈和其它污染物。