ANALYSIS AND PURGING OF MATERIALS IN MANUFACTURING PROCESSES

    公开(公告)号:US20180095025A1

    公开(公告)日:2018-04-05

    申请号:US15827192

    申请日:2017-11-30

    Applicant: H2OPTX INC.

    Abstract: Various systems and methods of analyzing one or more properties of a sample are provided. The system includes a self-contained purging device having a sample holder and one or more analyzers for analyzing one or more properties of the sample. The purging device is configured to remove sample contained within the sample holder when an analysis is complete. In one embodiment the purging device is configured via an air pump having a tube in fluid communication with an air inlet of the sample holder, wherein the air pump is configured to deliver pressurized air to the air inlet and thereby purge the sample. The pressurized air is localized ambient air, and substantially free of contaminants. Methods and other systems are also described and illustrated.

    Optical and chemical analytical systems and methods
    4.
    发明授权
    Optical and chemical analytical systems and methods 有权
    光学和化学分析系统和方法

    公开(公告)号:US09562862B2

    公开(公告)日:2017-02-07

    申请号:US14507637

    申请日:2014-10-06

    Applicant: H2Optx Inc.

    Abstract: Optical and chemical analytical systems and methods are provided herein. In one embodiment, a method includes exposing a mixture sample to electromagnetic radiation, the mixture sample including analytes, detecting responsiveness of one or more of the analytes to the electromagnetic radiation, calculating average responsiveness of the one or more of the analytes, and calculating a concentration of the one or more of the analytes in the mixture sample using the average responsiveness.

    Abstract translation: 本文提供光学和化学分析系统和方法。 在一个实施方案中,一种方法包括将混合物样品暴露于电磁辐射,混合物样品包括分析物,检测一种或多种分析物对电磁辐射的响应性,计算一种或多种分析物的平均响应性,并计算 使用平均响应度浓缩混合物样品中一种或多种分析物。

    ANALYSIS AND PURGING OF MATERIALS IN MANUFACTURING PROCESSES
    6.
    发明申请
    ANALYSIS AND PURGING OF MATERIALS IN MANUFACTURING PROCESSES 有权
    材料在制造过程中的分析和清洗

    公开(公告)号:US20160041087A1

    公开(公告)日:2016-02-11

    申请号:US14454483

    申请日:2014-08-07

    Applicant: H2Optx Inc.

    Abstract: Various systems and methods of analyzing one or more properties of a sample are provided. The system includes a self-contained purging device having a sample holder and one or more analyzers for analyzing one or more properties of the sample. The purging device is configured to remove sample contained within the sample holder when an analysis is complete. In one embodiment the purging device is configured via an air pump having a tube in fluid communication with an air inlet of the sample holder, wherein the air pump is configured to deliver pressurized air to the air inlet and thereby purge the sample. The pressurized air is localized ambient air, and substantially free of contaminants. Methods and other systems are also described and illustrated.

    Abstract translation: 提供了分析样品的一种或多种性质的各种系统和方法。 该系统包括具有样品保持器和用于分析样品的一个或多个性质的一个或多个分析器的独立清洗装置。 清洗装置被配置为当分析完成时除去样品架中包含的样品。 在一个实施例中,清洗装置经由具有与样品保持器的空气入口流体连通的管的空气泵配置,其中空气泵构造成将加压空气输送到空气入口并由此吹扫样品。 加压空气是局部环境空气,并且基本上没有污染物。 还描述和示出了方法和其他系统。

    OPTICAL AND CHEMICAL ANALYTICAL SYSTEMS AND METHODS
    9.
    发明申请
    OPTICAL AND CHEMICAL ANALYTICAL SYSTEMS AND METHODS 有权
    光学和化学分析系统和方法

    公开(公告)号:US20160069805A1

    公开(公告)日:2016-03-10

    申请号:US14507637

    申请日:2014-10-06

    Applicant: H2Optx Inc.

    Abstract: Optical and chemical analytical systems and methods are provided herein. In one embodiment, a method includes exposing a mixture sample to electromagnetic radiation, the mixture sample including analytes, detecting responsiveness of one or more of the analytes to the electromagnetic radiation, calculating average responsiveness of the one or more of the analytes, and calculating a concentration of the one or more of the analytes in the mixture sample using the average responsiveness.

    Abstract translation: 本文提供光学和化学分析系统和方法。 在一个实施方案中,一种方法包括将混合物样品暴露于电磁辐射,混合物样品包括分析物,检测一种或多种分析物对电磁辐射的响应性,计算一种或多种分析物的平均响应性,并计算 使用平均响应度浓缩混合物样品中一种或多种分析物。

    Optical and chemical analytical systems and methods

    公开(公告)号:US10041885B2

    公开(公告)日:2018-08-07

    申请号:US15391370

    申请日:2016-12-27

    Applicant: H2Optx Inc.

    Abstract: Optical and chemical analytical systems and methods are provided herein. In one embodiment, a method includes exposing a mixture sample to electromagnetic radiation, the mixture sample including analytes, detecting responsiveness of one or more of the analytes to the electromagnetic radiation, calculating average responsiveness of the one or more of the analytes, and calculating a concentration of the one or more of the analytes in the mixture sample using the average responsiveness.

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