公开(公告)号：US08475424B2

公开(公告)日：2013-07-02

申请号：US11818179

申请日：2007-06-13

申请人： Kenji Fujimoto ,  Haruko Sato ,  Masato Higaki ,  Toshiyuki Matsuda ,  Hiroshi Nakahata

发明人： Kenji Fujimoto ,  Haruko Sato ,  Masato Higaki ,  Toshiyuki Matsuda ,  Hiroshi Nakahata

IPC分类号： A61F13/15 ,  A61F13/20

CPC分类号： A61F13/49011 ,  A61F13/496

摘要： The disposable pull-on garment has a longitudinal centerline, a front region, a crotch region, and a back region. The front and back regions are joined at seams to form a waist opening and leg openings. The pull-on garment comprises a main portion, a side portion, and a waist portion. The side portion is disposed transversely outboard of the main portion. The waist portion comprises a center waist portion, an outer side waist portion, and an inner side waist portion. The contraction rate of the inner side waist portion is less than that of the center waist portion, and the contraction rate of the side portion longitudinally inboard of the inner side waist portion is greater than that of the inner side waist portion.

摘要翻译： 一次性上拉服装具有纵向中心线，前部区域，裆部区域和后部区域。 前部和后部区域在接缝处连接以形成腰部开口和腿部开口。 上拉服装包括主要部分，侧部分和腰部。 侧部横向设置在主体部分的外侧。 腰部包括中心腰部，外侧腰部和内侧腰部。 内侧腰部的收缩率小于中央腰部的收缩率，内侧腰部的纵向内侧的侧部的收缩率大于内侧腰部的收缩率。

公开(公告)号：US08452452B2

公开(公告)日：2013-05-28

申请号：US13148183

申请日：2010-01-28

申请人： Toshiyuki Kondo ,  Shinji Sawada ,  Nobuhiro Nanba ,  Yoshikazu Hayakawa ,  Kenji Fujimoto ,  Akira Nakashima ,  Takashi Uno

发明人： Toshiyuki Kondo ,  Shinji Sawada ,  Nobuhiro Nanba ,  Yoshikazu Hayakawa ,  Kenji Fujimoto ,  Akira Nakashima ,  Takashi Uno

IPC分类号： G05B15/00 ,  G06F19/00

CPC分类号： B25J15/0009 ,  B25J9/1612 ,  B25J15/10

摘要： The grip position calculator determines a grip position where the fingers can grip a workpiece in any orientation of the workpiece. The calculator then determines an initial position where the finger tips can grip the workpiece and set the initial position as a point of calculation. Then an allowable gripping force is calculated which is an index that indicates an allowable force to be applied to the workpiece at point. Then other allowable forces are calculated for a plurality of points near the point of calculation. Then the point of calculation is selected as a possible gripping position if the allowable force a point is greater than any of the allowable forces. Otherwise, one of the points is selected for another point of calculation where the greatest allowable force (De) has been calculated and return to calculating an allowable gripping force.

摘要翻译： 握持位置计算器确定手指可以在工件的任何取向上夹持工件的抓握位置。 然后，计算器确定指尖可握住工件的初始位置，并将初始位置设置为计算点。 然后，计算出允许的夹持力，其是指示在点处施加到工件的允许力的指标。 然后对于计算点附近的多个点计算其他容许力。 然后，如果允许的力一点大于任何允许的力，则选择计算点作为可能的夹持位置。 否则，在计算最大容许力（De）的另一个计算点中选择一个点，并返回到计算允许的夹紧力。

公开(公告)号：US20120270484A1

公开(公告)日：2012-10-25

申请号：US13504381

申请日：2010-12-21

申请人： Atsumi Imai ,  Takehide Aiga ,  Masanori Nagai ,  Takayuki Sato ,  Kenji Fujimoto ,  Tsuyoshi Matsumoto ,  Hiroshi Kihira

发明人： Atsumi Imai ,  Takehide Aiga ,  Masanori Nagai ,  Takayuki Sato ,  Kenji Fujimoto ,  Tsuyoshi Matsumoto ,  Hiroshi Kihira

IPC分类号： B24D3/06 ,  B24D7/00

CPC分类号： B24D3/06 ,  B24D7/02

摘要： An inexpensive rotary grinding tool with reduced noise level of the grinding is provided. The rotary grinding tool comprises a metal disk having a grinding surface on at least a part of its surface and a holder for supporting the metal disk. The grinding surface has hard grains having a Mohs hardness in excess of 9 brazed thereon at a surface density of at least 20 grains/cm2. The holder has at its center a securing means for securing the holder on rotary shaft of a rotary drive unit. The holder and the metal disk are joined together to constitute the rotary grinding tool.

摘要翻译： 提供了具有降低的磨削噪音水平的廉价的旋转磨削工具。 旋转研磨工具包括在其表面的至少一部分上具有研磨表面的金属盘和用于支撑金属盘的保持器。 磨削表面具有以至少20个/ cm 2的表面密度在其上钎焊的莫氏硬度超过9的硬质粒。 保持器在其中心具有用于将保持器固定在旋转驱动单元的旋转轴上的固定装置。 保持器和金属盘连接在一起以构成旋转研磨工具。

公开(公告)号：US20120079446A1

公开(公告)日：2012-03-29

申请号：US13238935

申请日：2011-09-21

申请人： Hiromichi KUMAKURA ,  Hiroyuki Ogino ,  Kenji Fujimoto ,  Masanori Ueno

发明人： Hiromichi KUMAKURA ,  Hiroyuki Ogino ,  Kenji Fujimoto ,  Masanori Ueno

IPC分类号： G06F17/50

CPC分类号： H01L23/49575 ,  H01L23/3107 ,  H01L2224/32245 ,  H01L2924/10272 ,  H01L2924/1033 ,  H01L2924/10344 ,  H01L2924/12032 ,  H01L2924/12036 ,  H01L2924/1305 ,  H01L2924/13055 ,  H01L2924/00

摘要： A semiconductor module made from a compound semiconductor or diamond and loaded with high performance power semiconductor devices can be obtained at low cost. In a semiconductor module, four (semiconductor chips) of same specifications are arranged in array, two longitudinally and two transversally, on a single lead frame. Achieving a high yield of manufacturing diode chips and reducing the unuseful area of diode chips need to be satisfied at the same time to obtain such a semiconductor module at low cost. The use of an index, which is the product of the yield YDie of manufacturing chips and the active region area ratio RA is effective for determining them. Thus, semiconductor modules can be obtained at a high yield by selecting a chip size that makes the index close to a peak value depending on the crystal defect density of a wafer to be used.

摘要翻译： 可以以低成本获得由化合物半导体或金刚石制成的负载高性能功率半导体器件的半导体模块。 在半导体模块中，具有相同规格的四个（半导体芯片）在一个引线框架上被排列成纵向和横向两个。 需要同时满足制造二极管芯片的高产量并减少二极管芯片的无用面积以便以低成本获得这种半导体模块。 使用指数，其是制造芯片的产量YDie和有效区域面积比RA的乘积对于确定它们是有效的。 因此，通过选择根据所使用的晶片的晶体缺陷密度使指标接近峰值的芯片尺寸，可以以高产率获得半导体模块。

公开(公告)号：US07569039B2

公开(公告)日：2009-08-04

申请号：US10985402

申请日：2004-11-10

申请人： Toshiyuki Matsuda ,  Kenji Fujimoto ,  Hiroshi Nakahata

发明人： Toshiyuki Matsuda ,  Kenji Fujimoto ,  Hiroshi Nakahata

IPC分类号： A61F13/496 ,  A61F13/64

CPC分类号： A61F13/49011 ,  A61F13/49014 ,  A61F13/496

摘要： A disposable pull-on garment includes an absorbent main body and a ring-like elastic belt forming a waist opening and two leg openings. The absorbent main body has longitudinal side edges and transverse end edges. The elastic belt includes a front belt and a back belt each having a transverse waist border and a transverse abdomen border. In the back belt, a waist border elastic material is disposed adjacent to the waist border between the waist border and the end edge of the absorbent main body, a side elastic material is disposed adjacent to the abdomen border, and a waist anchoring elastic material is disposed between them. A leg opening angle formed by the abdomen border and each of the longitudinal side edges of the absorbent main body is greater when the disposable pull-on garment is in a contracted configuration than when the disposable pull-on garment is in an uncontracted configuration.

摘要翻译： 一次性上拉服装包括吸收主体和形成腰部开口和两个腿部开口的环形弹性带。 吸收性主体具有纵向侧边缘和横向端部边缘。 弹性带包括前带和后腰带，每个腰带具有横向腰部边框和横向腹部边界。 在腰带中，腰围弹性材料与腰围和吸收体的端缘之间的腰边界相邻设置，侧面弹性材料邻近腹部边缘设置，腰部固定弹性材料为 在他们之间。 当一次性上拉的衣服处于收缩构型时，当一次性上拉的衣服处于非收缩构型时，由腹部边界和吸收性主体的每个纵向侧边缘形成的腿部开放角度较大。

公开(公告)号：US20050107763A1

公开(公告)日：2005-05-19

申请号：US10985208

申请日：2004-11-10

申请人： Toshiyuki Matsuda ,  Kenji Fujimoto ,  Hiroshi Nakahata

发明人： Toshiyuki Matsuda ,  Kenji Fujimoto ,  Hiroshi Nakahata

IPC分类号： A61F13/15

CPC分类号： A61F13/49011 ,  A61F13/49014 ,  A61F13/496 ,  A61F2013/15292 ,  A61F2013/49026 ,  A61F2013/49028 ,  A61F2013/49063

摘要： A disposable pull-on garment comprising an absorbent main body and a ring-like elastic belt is disclosed. The pull-on garment has a waist opening and leg openings and extends in a longitudinal direction and a transverse direction. The pull-on garment comprises an absorbent main body and a ring-like elastic belt. The absorbent main body comprises a liquid pervious topsheet, a liquid impervious backsheet and an absorbent core disposed therebetween. The absorbent main body has longitudinal side edges, transverse end edges, a front waist panel, a back waist panel and a crotch panel. The front waist panel and the back waist panel are not joined directly. The ring-like elastic belt is surrounded by a transverse waist border and a transverse abdomen border. The ring-like elastic belt has a central panel and side panels. The central panel is joined to the front waist panel and the back waist panel of the absorbent main body to form one waist opening and two leg openings. The ring-like elastic belt is not disposed in the crotch panel of the absorbent main body. The ring-like elastic belt comprises a front belt and a back belt. Each belt comprises a belt layer and a belt elastic material joined to the belt layer. The belt elastic material comprises a waist elastic material disposed adjacent the transverse waist border and a side elastic material disposed on the side panel. The waist elastic material of the back belt comprises a waist border elastic material and a waist anchoring elastic material extending between the waist border elastic material and the side elastic material. The waist anchoring elastic material generates a greater stress against an applied extension force than the side elastic material of the back belt.

摘要翻译： 公开了一种包括吸收主体和环形弹性带的一次性上拉服装。 上拉衣服具有腰部开口和腿部开口，并沿纵向和横向延伸。 上拉衣服包括吸收主体和环形弹性带。 吸收性主体包括液体可透过的顶片，不透液体的底片和设置在其间的吸收芯。 吸收性主体具有纵向侧边缘，横向端边缘，前腰围片，后腰围片和裆片。 前腰面板和后腰面板不直接接合。 环状弹性带由横向腰部边框和横向腹部边界包围。 环状弹性带具有中心板和侧板。 中央面板与吸收性主体的前腰围板和后腰围片接合，形成一个腰部开口和两个腿部开口。 环状弹性带没有设置在吸收性主体的裆片中。 环状弹性带包括前带和后带。 每个带包括带束层和连接到带束层的带状弹性材料。 带弹性材料包括邻近横向腰边缘设置的腰部弹性材料和设置在侧面板上的侧面弹性材料。 背带的腰部弹性材料包括腰围弹性材料和在腰围弹性材料和侧面弹性材料之间延伸的腰部锚定弹性材料。 腰部锚固弹性材料比背带的侧面弹性材料产生比施加的延伸力更大的应力。

公开(公告)号：US5681424A

公开(公告)日：1997-10-28

申请号：US553435

申请日：1996-02-20

申请人： Go Saito ,  Motohiko Yoshigai ,  Kenji Fujimoto

发明人： Go Saito ,  Motohiko Yoshigai ,  Kenji Fujimoto

IPC分类号： H01J37/32 ,  H01L21/02 ,  H01L21/3213 ,  B08B7/00 ,  H01L21/00

CPC分类号： H01L21/02071 ,  H01J37/32862 ,  H01L21/32136 ,  Y10S438/905

摘要： A method of cleaning an etching chamber, with a high throughput, of a plasma processing apparatus for etching by use of hydrogen bromide (HBr) as an etching gas while holding a wafer on an electrode by electrostatic chuck. When the static charge on the wafer electrostatically chucked on the electrode is eliminated after the completion of the etching, O.sub.2 gas is introduced into the etching chamber from a gas flow-rate controller. A plasma of O.sub.2 gas is generated to cause the electric charge on the wafer to flow to the earth through the plasma, and at the same time, the interior of the etching chamber is cleaned.

摘要翻译： PCT No.PCT / JP94 / 00812 Sec。 371日期1996年2月20日 102（e）日期1996年2月20日PCT 1994年5月20日PCT PCT。 出版物WO94 / 28578 日期1994年12月8日利用静电卡盘将晶片保持在电极上的方法，通过使用溴化氢（HBr）作为蚀刻气体来清洗用于蚀刻的等离子体处理装置的高通量的蚀刻室。 当在蚀刻完成之后静电吸附在电极上的晶片上的静电电荷被消除，从气体流量控制器将氧气引入蚀刻室。 产生O 2气体的等离子体，使晶片上的电荷通过等离子体流到地球，同时，清洁蚀刻室的内部。

公开(公告)号：US08417072B2

公开(公告)日：2013-04-09

申请号：US13030433

申请日：2011-02-18

申请人： Koichi Genei ,  Kenji Fujimoto ,  Miwa Ishida

发明人： Koichi Genei ,  Kenji Fujimoto ,  Miwa Ishida

IPC分类号： G02B6/12

CPC分类号： H01L33/10

摘要： According to one embodiment, a light emitting device includes a substrate, a light emitting layer, a first conductivity type layer, a first and a second distributed Bragg reflector layer. The first conductivity type layer is provided between the substrate and the light emitting layer. The first reflector layer is provided between the first conductivity type layer and the substrate. First and second layers are alternately stacked therein. The second layers have refractive index different from that of the first layers. The first reflector layer has a center wavelength substantially same as emission wavelength of emission light. The second reflector layer is provided between the light emitting layer and the first reflector layer. Third and fourth layers are alternately stacked therein. The fourth layers have refractive index different from that of the third layers. The second reflector layer has a center wavelength longer than the center wavelength of the first reflector layer.

摘要翻译： 根据一个实施例，发光器件包括衬底，发光层，第一导电类型层，第一和第二分布布拉格反射器层。 第一导电类型层设置在基板和发光层之间。 第一反射层设置在第一导电类型层和衬底之间。 第一层和第二层交替堆叠在其中。 第二层的折射率与第一层的折射率不同。 第一反射器层具有与发射光的发射波长基本相同的中心波长。 第二反射层设置在发光层与第一反射层之间。 第三层和第四层交替堆叠在其中。 第四层的折射率与第三层的折射率不同。 第二反射层的中心波长比第一反射层的中心波长长。

公开(公告)号：US20120235191A1

公开(公告)日：2012-09-20

申请号：US13235300

申请日：2011-09-16

申请人： Miwa ISHIDA ,  Kenji Fujimoto

发明人： Miwa ISHIDA ,  Kenji Fujimoto

IPC分类号： H01L33/60

CPC分类号： H01L25/167 ,  H01L33/10 ,  H01L2924/0002 ,  H01L2924/00

摘要： According to one embodiment, a semiconductor light emitting device includes a light emitting layer, a first layer, a second layer and a distributed Bragg reflector. The light emitting layer has a first and second surfaces and is capable of emitting emission light having a peak wavelength in a range of 740 nm or more and 830 nm or less. The first layer is provided on a side of the first surface and has a light extraction surface. The second layer is provided on a side of the second surface. The distributed Bragg reflector layer is provided on a side of the second layer. A third and fourth layers are alternately stacked. The distributed Bragg reflector layer is capable of reflecting the emission light toward the light extraction surface. The third and fourth layers each have a bandgap wavelength shorter than the peak wavelength.

摘要翻译： 根据一个实施例，半导体发光器件包括发光层，第一层，第二层和分布式布拉格反射器。 发光层具有第一表面和第二表面，并且能够发射峰值波长在740nm以上且830nm以下的范围内的发光。 第一层设置在第一表面的一侧并具有光提取表面。 第二层设置在第二表面的一侧。 分布式布拉格反射层设置在第二层的一侧。 交替堆叠第三层和第四层。 分布式布拉格反射层能够将发射光反射到光提取表面。 第三层和第四层各自具有比峰值波长短的带隙波长。

公开(公告)号：US20100092266A1

公开(公告)日：2010-04-15

申请号：US12449978

申请日：2008-03-10

申请人： Syouji Matsuo ,  Kenji Fujimoto ,  Masahiro Hosoi

发明人： Syouji Matsuo ,  Kenji Fujimoto ,  Masahiro Hosoi

IPC分类号： B21D51/26

CPC分类号： B21D51/2615 ,  B21D51/2607 ,  Y10T29/49803 ,  Y10T83/8845

摘要： A can manufacturing device in which a tool supporting base has: a plurality of working tool units that support a plurality of working tools; a supporting member that supports a plurality of working tool units; and a linear driving mechanism that reciprocates the working tool units with respect to the supporting member in the axial direction of a workpiece. The linear driving mechanism has: a guide section fixed on the supporting member with a base plate therebetween; a slide rail that is fixed on the working tool unit and slides along the guide section; an electromagnetic coil provided on the base plate; a magnet plate that is provided on the working tool unit and generates, between the electromagnetic coil and itself, a thrust force for the guide section; and a supply pipe that is provided at the electromagnetic coil and supplies coolant to the inside of the electromagnetic coil.

摘要翻译： 一种罐制造装置，其中工具支撑基座具有：支撑多个工作工具的多个作业工具单元; 支撑构件，其支撑多个工作单元; 以及线性驱动机构，其使工作单元相对于支撑构件在工件的轴向上往复运动。 线性驱动机构具有：导向部，其固定在支撑部件上，基板之间; 固定在所述作业工具单元上并沿着所述引导部滑动的滑轨; 设置在基板上的电磁线圈; 设置在所述作业工具单元上并在所述电磁线圈与其自身之间产生用于所述引导部的推力的磁板; 以及供给管，其设置在所述电磁线圈处，并且向所述电磁线圈的内部供给冷却剂。