公开(公告)号：US20080148875A1

公开(公告)日：2008-06-26

申请号：US11641944

申请日：2006-12-20

Applicant: Thomas Leo Maria Hoogenboom ,  Reinder Teun Plug ,  Maurits Van Der Schaar

Inventor： Thomas Leo Maria Hoogenboom ,  Reinder Teun Plug ,  Maurits Van Der Schaar

IPC: G01M19/00

CPC classification number: G03F7/70616

Abstract: Two drive systems are responsible for moving a substrate beneath, for example, an illumination system or a measurement radiation beam. A first drive system drives a substrate in a X direction and a second drive system drives the substrate in a Y direction. In order to make a measurement of a feature of the substrate surface, targets are arranged in a lattice. Rather than having the lattice aligned with the X and Y directions such that only one drive system operates at a time to step between the targets, the lattice of targets is arranged at an angle with respect to the X and Y axes such that both drive systems operate simultaneously in order to move between the targets. The targets (or sub-targets within the targets) may also be arranged with respect to each other so as to save scribelane space and to create a most economical path between them.

Abstract translation: 两个驱动系统负责在例如照明系统或测量辐射束之下移动衬底。 第一驱动系统沿X方向驱动基板，第二驱动系统沿Y方向驱动基板。 为了测量衬底表面的特征，靶被布置成格子。 不是使格子与X和Y方向对准，使得只有一个驱动系统一次在目标之间步进操作，目标的格子相对于X和Y轴以一定角度布置，使得两个驱动系统 同时操作，以便在目标之间移动。 目标（或目标内的子目标）也可以相对于彼此布置，以便节省scribelane空间并且在它们之间创建最经济的路径。

公开(公告)号：US07586598B2

公开(公告)日：2009-09-08

申请号：US11802257

申请日：2007-05-21

Applicant: Reinder Teun Plug ,  Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast

Inventor： Reinder Teun Plug ,  Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast

IPC: G01N21/00

CPC classification number: G03F7/70758 ,  G03F7/70766

Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, a sensor constructed and arranged to measure a parameter of the substrate, a displacement system configured to displace the substrate table or the sensor with respect to the other in a first direction, a balance mass, and a bearing configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.

Abstract translation: 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 测量工具包括基架，构造和布置成保持基板的基板台，构造和布置成测量基板的参数的传感器，构造成将基板台或传感器相对于彼此移位的位移系统 第一方向，平衡块和轴承，其构造成可移动地支撑所述第一平衡块，以便在与所述第一方向相反的方向上基本上自由地平移，以抵消所述第一平衡块中的所述基板台或传感器在所述第一方向 方向。

公开(公告)号：US20080145791A1

公开(公告)日：2008-06-19

申请号：US11546546

申请日：2006-10-12

Applicant: Johannes Onvlee ,  Reinder Teun Plug ,  Hubert Marie Segers ,  David Christopher Ockwell ,  Paul Jacques Van Wijnen ,  Suzan Leonie Auer-Jongepier

Inventor： Johannes Onvlee ,  Reinder Teun Plug ,  Hubert Marie Segers ,  David Christopher Ockwell ,  Paul Jacques Van Wijnen ,  Suzan Leonie Auer-Jongepier

IPC: G03B27/42 ,  G03C5/00

CPC classification number: H01L21/67745 ,  G03F7/70991 ,  H01L21/67225

Abstract: A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate includes an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle. A post-exposure bake step of the substrate (a temperature cycle) is executed within a predetermined time period after the transfer of the pattern. The lithographic apparatus may be combined with a processing system having one or more processing modules. More efficient use may be made of the combination, allowing flexibility for a device manufacturing method.

Abstract translation: 被配置为将图案从图案形成装置传送到基板上的光刻设备包括集成的曝光后烘烤装置，后曝光烘烤装置被配置为使基板经受预定的温度循环。 在图案的转印之后的预定时间段内执行基板的曝光后烘烤步骤（温度循环）。 光刻设备可以与具有一个或多个处理模块的处理系统组合。 可以更有效地使用组合，从而允许设备制造方法的灵活性。

公开(公告)号：US20090296081A1

公开(公告)日：2009-12-03

申请号：US12536301

申请日：2009-08-05

Applicant: Reinder Teun PLUG ,  Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast

Inventor： Reinder Teun PLUG ,  Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast

IPC: G01N21/00

CPC classification number: G03F7/70758 ,  G03F7/70766

Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and arranged to hold the substrate. The sensor is constructed and arranged to measure a parameter of the substrate. The displacement system is configured to displace the substrate table or the sensor with respect to the other in a first direction. The bearing is configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.

Abstract translation: 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 测量工具包括底架，底座台，传感器，排量系统，平衡块和轴承。 衬底台被构造和布置成保持衬底。 传感器被构造和布置以测量衬底的参数。 位移系统构造成在第一方向相对于另一个移动衬底台或传感器。 轴承构造成可移动地支撑第一平衡块，以便在与第一方向相反的方向上基本上自由地平移，以抵消基板台或传感器在第一方向上的位移。

公开(公告)号：US08411287B2

公开(公告)日：2013-04-02

申请号：US12855394

申请日：2010-08-12

Applicant: Hendrik Jan Hidde Smilde ,  Arno Jan Bleeker ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Henricus Petrus Maria Pellemans ,  Reinder Teun Plug ,  Willem Marie Julia Marcel Coene

Inventor： Hendrik Jan Hidde Smilde ,  Arno Jan Bleeker ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Henricus Petrus Maria Pellemans ,  Reinder Teun Plug ,  Willem Marie Julia Marcel Coene

IPC: G01B11/14

CPC classification number: G03F7/70633 ,  G03F7/70616

Abstract: A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.

Abstract translation: 计量装置被布置成以离轴照明模式照亮多个目标。 仅使用一个一阶衍射光束获得目标图像。 在目标是复合光栅的地方，可以从不同光栅的图像的强度获得覆盖测量。 可以对由图像场中的光栅位置的变化引起的误差来校正叠加测量。

公开(公告)号：US07679714B2

公开(公告)日：2010-03-16

申请号：US11546546

申请日：2006-10-12

Applicant: Johannes Onvlee ,  Reinder Teun Plug ,  Hubert Marie Segers ,  David Christopher Christopher Ockwell ,  Paul Jacques Van Wijnen ,  Suzan Leonie Auer-Jongepier

Inventor： Johannes Onvlee ,  Reinder Teun Plug ,  Hubert Marie Segers ,  David Christopher Christopher Ockwell ,  Paul Jacques Van Wijnen ,  Suzan Leonie Auer-Jongepier

IPC: G03B27/00 ,  G03B27/42 ,  G03B27/52

CPC classification number: H01L21/67745 ,  G03F7/70991 ,  H01L21/67225

Abstract: A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate includes an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle. A post-exposure bake step of the substrate (a temperature cycle) is executed within a predetermined time period after the transfer of the pattern. The lithographic apparatus may be combined with a processing system having one or more processing modules. More efficient use may be made of the combination, allowing flexibility for a device manufacturing method.

Abstract translation: 被配置为将图案从图案形成装置传送到基板上的光刻设备包括集成的曝光后烘烤装置，后曝光烘烤装置被配置为使基板经受预定的温度循环。 在图案的转印之后的预定时间段内执行基板的曝光后烘烤步骤（温度循环）。 光刻设备可以与具有一个或多个处理模块的处理系统组合。 可以更有效地使用组合，从而允许设备制造方法的灵活性。

公开(公告)号：US07511797B2

公开(公告)日：2009-03-31

申请号：US12068288

申请日：2008-02-05

Applicant: Franciscus Van De Mast ,  Johan Christiaan Gerard Hoefnagels ,  Johannes Onvlee ,  Reinder Teun Plug

Inventor： Franciscus Van De Mast ,  Johan Christiaan Gerard Hoefnagels ,  Johannes Onvlee ,  Reinder Teun Plug

IPC: G03B27/42

CPC classification number: G03F7/70616 ,  G03F7/70525

Abstract: A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.

Abstract translation: 基于光刻系统的一个或多个操作条件预测光刻系统的性能标准的光刻系统，并与该性能标准的测量值进行比较。 光刻系统可以根据测量和预测的性能标准之间的差异来确定，如果有的话，光刻系统的子系统如预期的那样不能执行。

公开(公告)号：US07480050B2

公开(公告)日：2009-01-20

申请号：US11350279

申请日：2006-02-09

Applicant: Arie Jeffrey Den Boef ,  Wilhelmus Maria Corbeij ,  Mircea Dusa ,  Reinder Teun Plug

Inventor： Arie Jeffrey Den Boef ,  Wilhelmus Maria Corbeij ,  Mircea Dusa ,  Reinder Teun Plug

IPC: G01J4/00

CPC classification number: G01N21/47 ,  G01N2021/4714 ,  G03F7/70625 ,  G03F7/70633

Abstract: A sensor measuring properties of a substrate in which radiation is projected onto the substrate by a radiation projector that has a first part configured such that the radiation projection can project onto the substrate linearly polarized radiation oriented in a first direction and a second part configured such that the radiation projector can project onto the substrate linearly polarized radiation oriented in a second direction orthogonal to the first direction.

Abstract translation: 传感器，其测量辐射通过辐射投影仪投射到基板上的基板的性质，所述辐射投影仪具有第一部分，所述第一部分被配置成使得所述辐射突出部能够突出到基板上，所述第一部分被配置成基于沿第一方向定向的线偏振辐射， 辐射投影仪可以投影到基板上，在与第一方向正交的第二方向上定向的线偏振辐射。

公开(公告)号：US20070279644A1

公开(公告)日：2007-12-06

申请号：US11443452

申请日：2006-05-31

Applicant: Reinder Teun Plug ,  Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast

Inventor： Reinder Teun Plug ,  Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast

IPC: G01B11/14

CPC classification number: G03F7/70758 ,  G03F7/70766

Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, at least one sensor constructed and arranged to measure a parameter of the substrate, a displacement system to displace one of the substrate table and sensor with respect to the other one of the substrate table and sensor in at least a first direction, a first balance mass, and a first bearing which movably supports the first balance mass so as to be substantially free to translate in the opposite direction of the first direction in order to counteract a displacement of the one of the substrate table and sensor in the first direction.

Abstract translation: 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 该测量工具包括底架，构造和布置成保持基板的基板台，至少一个构造和布置以测量基板的参数的传感器，相对于基板移位基板台和传感器之一的位移系统 至少第一方向上的基板台和传感器中的另一个，第一平衡块和第一轴承，其可移动地支撑第一平衡块，以便在与第一方向相反的方向基本上自由地平移，以便 抵消基板台和传感器中的一个在第一方向上的位移。

公开(公告)号：US07961309B2

公开(公告)日：2011-06-14

申请号：US12536301

申请日：2009-08-05

Applicant: Reinder Teun Plug ,  Arie Jeffrey Maria Den Boef ,  Karel Diederick Van Der Mast

Inventor： Reinder Teun Plug ,  Arie Jeffrey Maria Den Boef ,  Karel Diederick Van Der Mast

IPC: G01N21/00

CPC classification number: G03F7/70758 ,  G03F7/70766

Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and arranged to hold the substrate. The sensor is constructed and arranged to measure a parameter of the substrate. The displacement system is configured to displace the substrate table or the sensor with respect to the other in a first direction. The bearing is configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.

Abstract translation: 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 测量工具包括底架，底座台，传感器，排量系统，平衡块和轴承。 衬底台被构造和布置成保持衬底。 传感器被构造和布置以测量衬底的参数。 位移系统构造成在第一方向相对于另一个移动衬底台或传感器。 轴承构造成可移动地支撑第一平衡块，以便在与第一方向相反的方向上基本上自由地平移，以抵消基板台或传感器在第一方向上的位移。