Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
    1.
    发明申请
    Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 审中-公开
    检测方法和装置,光刻设备,光刻处理单元和器件制造方法

    公开(公告)号:US20080148875A1

    公开(公告)日:2008-06-26

    申请号:US11641944

    申请日:2006-12-20

    CPC classification number: G03F7/70616

    Abstract: Two drive systems are responsible for moving a substrate beneath, for example, an illumination system or a measurement radiation beam. A first drive system drives a substrate in a X direction and a second drive system drives the substrate in a Y direction. In order to make a measurement of a feature of the substrate surface, targets are arranged in a lattice. Rather than having the lattice aligned with the X and Y directions such that only one drive system operates at a time to step between the targets, the lattice of targets is arranged at an angle with respect to the X and Y axes such that both drive systems operate simultaneously in order to move between the targets. The targets (or sub-targets within the targets) may also be arranged with respect to each other so as to save scribelane space and to create a most economical path between them.

    Abstract translation: 两个驱动系统负责在例如照明系统或测量辐射束之下移动衬底。 第一驱动系统沿X方向驱动基板,第二驱动系统沿Y方向驱动基板。 为了测量衬底表面的特征,靶被布置成格子。 不是使格子与X和Y方向对准,使得只有一个驱动系统一次在目标之间步进操作,目标的格子相对于X和Y轴以一定角度布置,使得两个驱动系统 同时操作,以便在目标之间移动。 目标(或目标内的子目标)也可以相对于彼此布置,以便节省scribelane空间并且在它们之间创建最经济的路径。

    Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
    2.
    发明授权
    Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate 有权
    计量工具,包括光刻设备和计量工具的系统以及用于确定衬底参数的方法

    公开(公告)号:US07586598B2

    公开(公告)日:2009-09-08

    申请号:US11802257

    申请日:2007-05-21

    CPC classification number: G03F7/70758 G03F7/70766

    Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, a sensor constructed and arranged to measure a parameter of the substrate, a displacement system configured to displace the substrate table or the sensor with respect to the other in a first direction, a balance mass, and a bearing configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.

    Abstract translation: 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 测量工具包括基架,构造和布置成保持基板的基板台,构造和布置成测量基板的参数的传感器,构造成将基板台或传感器相对于彼此移位的位移系统 第一方向,平衡块和轴承,其构造成可移动地支撑所述第一平衡块,以便在与所述第一方向相反的方向上基本上自由地平移,以抵消所述第一平衡块中的所述基板台或传感器在所述第一方向 方向。

    Metrology Tool, System Comprising a Lithographic Apparatus and a Metrology Tool, and a Method for Determining a Parameter of a Substrate
    4.
    发明申请
    Metrology Tool, System Comprising a Lithographic Apparatus and a Metrology Tool, and a Method for Determining a Parameter of a Substrate 有权
    计量工具,包括平版印刷设备和计量工具的系统以及确定基板参数的方法

    公开(公告)号:US20090296081A1

    公开(公告)日:2009-12-03

    申请号:US12536301

    申请日:2009-08-05

    CPC classification number: G03F7/70758 G03F7/70766

    Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and arranged to hold the substrate. The sensor is constructed and arranged to measure a parameter of the substrate. The displacement system is configured to displace the substrate table or the sensor with respect to the other in a first direction. The bearing is configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.

    Abstract translation: 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 测量工具包括底架,底座台,传感器,排量系统,平衡块和轴承。 衬底台被构造和布置成保持衬底。 传感器被构造和布置以测量衬底的参数。 位移系统构造成在第一方向相对于另一个移动衬底台或传感器。 轴承构造成可移动地支撑第一平衡块,以便在与第一方向相反的方向上基本上自由地平移,以抵消基板台或传感器在第一方向上的位移。

    Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
    9.
    发明申请
    Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate 有权
    计量工具,包括光刻设备和计量工具的系统以及用于确定衬底参数的方法

    公开(公告)号:US20070279644A1

    公开(公告)日:2007-12-06

    申请号:US11443452

    申请日:2006-05-31

    CPC classification number: G03F7/70758 G03F7/70766

    Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, at least one sensor constructed and arranged to measure a parameter of the substrate, a displacement system to displace one of the substrate table and sensor with respect to the other one of the substrate table and sensor in at least a first direction, a first balance mass, and a first bearing which movably supports the first balance mass so as to be substantially free to translate in the opposite direction of the first direction in order to counteract a displacement of the one of the substrate table and sensor in the first direction.

    Abstract translation: 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 该测量工具包括底架,构造和布置成保持基板的基板台,至少一个构造和布置以测量基板的参数的传感器,相对于基板移位基板台和传感器之一的位移系统 至少第一方向上的基板台和传感器中的另一个,第一平衡块和第一轴承,其可移动地支撑第一平衡块,以便在与第一方向相反的方向基本上自由地平移,以便 抵消基板台和传感器中的一个在第一方向上的位移。

    Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
    10.
    发明授权
    Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate 有权
    计量工具,包括光刻设备和计量工具的系统以及用于确定衬底参数的方法

    公开(公告)号:US07961309B2

    公开(公告)日:2011-06-14

    申请号:US12536301

    申请日:2009-08-05

    CPC classification number: G03F7/70758 G03F7/70766

    Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and arranged to hold the substrate. The sensor is constructed and arranged to measure a parameter of the substrate. The displacement system is configured to displace the substrate table or the sensor with respect to the other in a first direction. The bearing is configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.

    Abstract translation: 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 测量工具包括底架,底座台,传感器,排量系统,平衡块和轴承。 衬底台被构造和布置成保持衬底。 传感器被构造和布置以测量衬底的参数。 位移系统构造成在第一方向相对于另一个移动衬底台或传感器。 轴承构造成可移动地支撑第一平衡块,以便在与第一方向相反的方向上基本上自由地平移,以抵消基板台或传感器在第一方向上的位移。

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