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    EXPOSURE APPARATUS
    1.
    发明申请
    EXPOSURE APPARATUS 有权

    公开(公告)号：US20170229285A1

    公开(公告)日：2017-08-10

    申请号：US15402500

    申请日：2017-01-10

    Applicant: ADVANTEST CORPORATION

    Inventor： Shinichi Hamaguchi ,  Hitoshi Tanaka ,  Atsushi Tokuno ,  Shinichi Kojima ,  Akio Yamada

    IPC: H01J37/317 ,  H01J37/065 ,  H01J37/09

    CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/065 ,  H01J37/09 ,  H01J37/10 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/06308 ,  H01J2237/0835 ,  H01J2237/31754

    Abstract: The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen. The formation module (122) includes: a particle source (20) which emits the charged particle beams from an emission region (21) in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device (60) provided with openings (62) arranged in an illuminated region (61) in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses (30, 50) provided between the particle source (20) and the aperture array device (60); and a beam cross-section deformation device (40) which is provided between the particle source (20) and the aperture array device (60), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.

    Exposure device
    2.
    发明授权
    Exposure device 有权

    公开(公告)号：US11101106B2

    公开(公告)日：2021-08-24

    申请号：US16499327

    申请日：2017-04-11

    Applicant: ADVANTEST CORPORATION

    Inventor： Youichi Shimizu ,  Hitoshi Tanaka

    IPC: H01J37/31 ,  H01J37/14 ,  H01J37/20 ,  H01J37/317 ,  H01J37/141

    Abstract: A multi-beam exposure device reducing variations of electron beam optical systems for electron beams, and preventing vacuum leakage. An exposure device is provided, including: a body tube depressurized to produce a vacuum state therein; multiple charged particle beam sources provided in the body tube, and emitting multiple charged particle beams in a direction of extension of the body tube; multiple electromagnetic optical elements, each provided corresponding to one of the multiple charged particle beams in the body tube, and controlling the one of the multiple charged particle beams; first and second partition walls arranged separately from each other in the direction of extension in the body tube, and forming a non-vacuum space between at least parts of the first and second partition walls; and a supporting unit provided in the body tube, and supporting the multiple electromagnetic optical elements for positioning of the multiple electromagnetic optical elements.

    Exposure device
    3.
    发明授权
    Exposure device 有权

    公开(公告)号：US10824077B2

    公开(公告)日：2020-11-03

    申请号：US16498394

    申请日：2017-04-11

    Applicant: ADVANTEST CORPORATION

    Inventor： Youichi Shimizu ,  Hitoshi Tanaka

    IPC: G03F7/20 ,  H01J37/18 ,  H01J37/317

    Abstract: An exposure device is provided, including: a body tube depressurized to produce a vacuum state therein; a plurality of charged particle beam sources that are provided in the body tube, and emit a plurality of charged particle beams in a direction of extension of the body tube; a plurality of electromagnetic optical elements, each being corresponding to one of the plurality of charged particle beams in the body tube, and controls the one of the plurality of charged particle beams; first and second partition walls that are arranged separately from each other in the direction of extension in the body tube, and form non-vacuum spaces between at least parts of the first and second partition walls; and a depressurization pump that depressurizes a non-vacuum space that contacts the first partition wall and a non-vacuum space that contacts the second partition wall to an air pressure between zero and atmospheric pressure.

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