公开(公告)号：US20170323760A1

公开(公告)日：2017-11-09

申请号：US15461829

申请日：2017-03-17

Applicant: ADVANTEST CORPORATION

Inventor： Masaki Kurokawa ,  Takamasa Sato ,  Shinichi Kojima ,  Akio Yamada

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/147 ,  H01J37/241 ,  H01J37/3177 ,  H01J2237/141 ,  H01J2237/1504 ,  H01J2237/152 ,  H01J2237/1526 ,  H01J2237/20285

Abstract: A multicolumn charged particle beam exposure apparatus includes a plurality of column cells which generate charged particle beams, and the column cell includes a yoke which is made of a magnetic material and generates a magnetic field of a predetermined intensity distribution around an optical axis of the column, and a coil which is wound around the yoke. The coil includes a plurality of divided windings, which are driven by different power sources.

公开(公告)号：US09799489B2

公开(公告)日：2017-10-24

申请号：US15402500

申请日：2017-01-10

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Hitoshi Tanaka ,  Atsushi Tokuno ,  Shinichi Kojima ,  Akio Yamada

IPC: G03B27/02 ,  G03B27/52 ,  H01J37/30 ,  H01J37/317 ,  H01J37/09 ,  H01J37/065

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/065 ,  H01J37/09 ,  H01J37/10 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/06308 ,  H01J2237/0835 ,  H01J2237/31754

Abstract: The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen. The formation module (122) includes: a particle source (20) which emits the charged particle beams from an emission region (21) in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device (60) provided with openings (62) arranged in an illuminated region (61) in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses (30, 50) provided between the particle source (20) and the aperture array device (60); and a beam cross-section deformation device (40) which is provided between the particle source (20) and the aperture array device (60), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.

公开(公告)号：US20170229285A1

公开(公告)日：2017-08-10

申请号：US15402500

申请日：2017-01-10

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Hitoshi Tanaka ,  Atsushi Tokuno ,  Shinichi Kojima ,  Akio Yamada

IPC: H01J37/317 ,  H01J37/065 ,  H01J37/09

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/065 ,  H01J37/09 ,  H01J37/10 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/06308 ,  H01J2237/0835 ,  H01J2237/31754

Abstract: The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen. The formation module (122) includes: a particle source (20) which emits the charged particle beams from an emission region (21) in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device (60) provided with openings (62) arranged in an illuminated region (61) in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses (30, 50) provided between the particle source (20) and the aperture array device (60); and a beam cross-section deformation device (40) which is provided between the particle source (20) and the aperture array device (60), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.