公开(公告)号：US10262859B2

公开(公告)日：2019-04-16

申请号：US15863340

申请日：2018-01-05

Applicant: ASM IP Holding B.V.

Inventor： Joe Margetis ,  John Tolle ,  Gregory Bartlett ,  Nupur Bhargava

IPC: H01L21/02 ,  C23C16/455 ,  C23C16/24

Abstract: A gas distribution system is disclosed in order to obtain better film uniformity on a substrate in a cross-flow reactor. The better film uniformity may be achieved by an asymmetric bias on individual injection ports of the gas distribution system. The gas distribution may allow for varied tunability of the film properties.

公开(公告)号：US20170278707A1

公开(公告)日：2017-09-28

申请号：US15450199

申请日：2017-03-06

Applicant: ASM IP Holding B.V.

Inventor： Joe Margetis ,  John Tolle ,  Gregory Bartlett ,  Nupur Bhargava

IPC: H01L21/02 ,  C23C16/455

CPC classification number: H01L21/02636 ,  C23C16/24 ,  C23C16/455 ,  C23C16/45514 ,  C23C16/45574 ,  H01L21/02529 ,  H01L21/02532 ,  H01L21/02535 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/0262

Abstract: A gas distribution system is disclosed in order to obtain better film uniformity on a substrate in a cross-flow reactor. The better film uniformity may be achieved by an asymmetric bias on individual injection ports of the gas distribution system. The gas distribution may allow for varied tunability of the film properties.

公开(公告)号：US20180151358A1

公开(公告)日：2018-05-31

申请号：US15863340

申请日：2018-01-05

Applicant: ASM IP Holding B.V.

Inventor： Joe Margetis ,  John Tolle ,  Gregory Bartlett ,  Nupur Bhargava

IPC: H01L21/02 ,  C23C16/455 ,  C23C16/24

CPC classification number: H01L21/02636 ,  C23C16/24 ,  C23C16/455 ,  C23C16/45514 ,  C23C16/45574 ,  H01L21/02529 ,  H01L21/02532 ,  H01L21/02535 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/0262

Abstract: A gas distribution system is disclosed in order to obtain better film uniformity on a substrate in a cross-flow reactor. The better film uniformity may be achieved by an asymmetric bias on individual injection ports of the gas distribution system. The gas distribution may allow for varied tunability of the film properties.

公开(公告)号：US09892913B2

公开(公告)日：2018-02-13

申请号：US15450199

申请日：2017-03-06

Applicant: ASM IP Holding B.V.

Inventor： Joe Margetis ,  John Tolle ,  Gregory Bartlett ,  Nupur Bhargava

IPC: H01L21/20 ,  H01L21/02 ,  C23C16/455

CPC classification number: H01L21/02636 ,  C23C16/24 ,  C23C16/455 ,  C23C16/45514 ,  C23C16/45574 ,  H01L21/02529 ,  H01L21/02532 ,  H01L21/02535 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/0262

Abstract: A gas distribution system is disclosed in order to obtain better film uniformity on a substrate in a cross-flow reactor. The better film uniformity may be achieved by an asymmetric bias on individual injection ports of the gas distribution system. The gas distribution may allow for varied tunability of the film properties.