公开(公告)号：US20160011523A1

公开(公告)日：2016-01-14

申请号：US14794013

申请日：2015-07-08

Applicant: ASML Netherlands B.V.

Inventor： Amandev SINGH ,  Henricus Petrus Maria Pellemans ,  Patrick Warnaar

IPC: G03F7/20 ,  G01J3/28 ,  G01N21/47 ,  G01J3/45

CPC classification number: G03F7/70491 ,  G01J3/2823 ,  G01J3/45 ,  G01N21/4788 ,  G01N2201/06113 ,  G03F7/70625 ,  G03F7/70633

Abstract: Inspection apparatus (100) is used for measuring parameters of targets on a substrate. Coherent radiation follows an illumination path (solid rays) for illuminating target (T). A collection path (dashed rays) collects diffracted radiation from the target and delivers it to a lock-in image detector (112). A reference beam following a reference path (dotted rays). An acousto-optical modulator (108) shifts the optical frequency of the reference beam so that the intensity of radiation at the lock-in detector includes a time-varying component having a characteristic frequency corresponding to a difference between the frequencies of the diffracted radiation and the reference radiation. The lock-in image detector records two-dimensional image information representing both amplitude and phase of the time-varying component. A second reference beam with a different shift (110) follows a second reference path (dot-dash rays). Interference between the two reference beams can be used for intensity normalization.

Abstract translation: 检查装置（100）用于测量基板上的目标的参数。 相干辐射遵循用于照射目标（T）的照明路径（固体光线）。 收集路径（虚线）从目标物体收集衍射辐射并将其传送到锁定图像检测器（112）。 参考光束遵循参考路径（虚线）。 声光调制器（108）移动参考光束的光频率，使得锁定检测器处的​​辐射强度包括具有与衍射辐射的频率之间的差异相对应的特征频率的时变分量，以及 参考辐射。 锁定图像检测器记录表示时变分量的幅度和相位的二维图像信息。 具有不同偏移（110）的第二参考光束遵循第二参考路径（点划线）。 两个参考光束之间的干涉可用于强度归一化。

公开(公告)号：US20210165335A1

公开(公告)日：2021-06-03

申请号：US17267974

申请日：2019-07-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Leon Paul VAN DIJK ,  Richard Johannes Franciscus VAN HAREN ,  Subodh SINGH ,  IIya MALAKHOVSKY ,  Ronald Henricus Johannes OTTEN ,  Amandev SINGH

IPC: G03F7/20

Abstract: Methods and apparatuses for determining in-plane distortion (IPD) across a substrate having a plurality of patterned regions. A method includes obtaining intra-region data indicative of a local stress distribution across one of the plurality of patterned regions; determining, based on the intra-region data, inter-region data indicative of a global stress distribution across the substrate; and determining, based on the inter-region data, the IPD across the substrate.

公开(公告)号：US20160180517A1

公开(公告)日：2016-06-23

申请号：US14971887

申请日：2015-12-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Andreas FUCHS ,  Peter Hanzen WARDENIER ,  Amandev SINGH ,  Maxime D' ALFONSO ,  Hilko Dirk BOS

IPC: G06T7/00

CPC classification number: G06T7/0004 ,  G03F7/70633 ,  G03F7/70941 ,  G06T7/11 ,  G06T2207/30148

Abstract: A scatterometer is used in a dark-field imaging mode to measure asymmetry-related parameters such as overlay. Measurements of small grating targets are made using identical optical paths, with the target in two orientations to obtain separate measurements of +1 and −1 diffraction orders. In this way, intensity scaling differences (tool asymmetry) are avoided. However, additive intensity defects due to stray radiation (ghosts) in the optical system cannot be avoided. Additive intensity issues strongly depend on the ratio between 0th and 1st order diffraction and are therefore strongly substrate (process) dependent. Calibration measurements are made on a few representative target gratings having biases. The calibration measurements are made, using not only different substrate rotations but also complementary apertures. Corrections are calculated and applied to correct asymmetry, to reduce error caused by stray radiation.

Abstract translation: 在暗场成像模式中使用散射仪来测量不对称相关的参数，如覆盖。 使用相同的光路进行小光栅目标的测量，目标在两个取向上以获得+1和-1衍射级的单独测量。 以这种方式，避免了强度缩放差异（工具不对称）。 然而，由于光学系统中的杂散辐射（重影）引起的附加强度缺陷是不能避免的。 添加强度问题很大程度上依赖于第0级和第1级衍射之间的比例，因此依赖于衬底（工艺）。 在具有偏差的几个代表性目标光栅上进行校准测量。 进行校准测量，不仅使用不同的衬底旋转，而且使用互补的孔。 校正被计算并应用于纠正不对称性，以减少由杂散辐射引起的误差。

公开(公告)号：US20160097984A1

公开(公告)日：2016-04-07

申请号：US14867594

申请日：2015-09-28

Applicant: ASML Netherlands B.V.

Inventor： Amandev SINGH ,  Henricus Petrus Maria PELLEMANS

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G02B21/245 ,  G03F7/70616 ,  G03F9/7026

Abstract: An inspection apparatus (300) includes a focus monitoring arrangement (500, 500′). Focusing radiation (505) comprises radiation having a first wavelength and radiation having a second wavelength. Reference radiation and focusing radiation at each wavelength are provided with at least one relative frequency shift so that the interfering radiation detected in the detection system includes a time-varying component having a characteristic frequency. A focus detection system (520) comprises one or more lock-in detectors (520b, 520c, 900). Operating the lock-in detectors with reference to both the first and second characteristic frequencies allows the arrangement to select which of the first and second focusing radiation is used to determine whether the optical system is in focus. Good quality signals can be obtained from targets of different structure.

Abstract translation: 检查装置（300）包括聚焦监视装置（500,500'）。 聚焦辐射（505）包括具有第一波长的辐射和具有第二波长的辐射。 在每个波长处的参考辐射和聚焦辐射被提供有至少一个相对频移，使得在检测系统中检测到的干扰辐射包括具有特征频率的时变分量。 焦点检测系统（520）包括一个或多个锁定检测器（520b，520c，900）。 参考第一和第二特征频率操作锁定检测器允许该装置选择使用第一和第二聚焦辐射中的哪一个来确定光学系统是否聚焦。 可以从不同结构的目标获得良好的质量信号。