公开(公告)号：US09380691B2

公开(公告)日：2016-06-28

申请号：US14194027

申请日：2014-02-28

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  Daniel J. W. Brown ,  Alexander Schafgans ,  Michael David Caudill ,  Daniel J. Golich ,  Richard L. Sandstrom ,  Yoshiho Amada

IPC: H05G2/00 ,  H01S3/10 ,  H01S3/13

CPC classification number: H05G2/008 ,  H01S3/1003 ,  H01S3/1301 ,  H01S3/1305 ,  H05G2/003

Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.

Abstract translation: 一种用于极紫外（EUV）光源的系统包括光放大器，其包括位于光束路径上的增益介质，所述光放大器被配置为在输入处接收光束并且向EUV光源发射输出光束 输出 反馈系统，其测量输出光束的性质并基于测量的属性产生反馈信号; 以及位于所述光束路径中并被配置为接收所述反馈信号并响应于所述反馈信号调整所述输出光束的特性的自适应光学器件。

公开(公告)号：US10966308B2

公开(公告)日：2021-03-30

申请号：US15208548

申请日：2016-07-12

Applicant: ASML NETHERLANDS B.V.

Inventor： William N. Partlo ,  Richard L. Sandstrom ,  Daniel J. W. Brown ,  Igor V. Fomenkov

IPC: H05G2/00

Abstract: A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.

公开(公告)号：US09155179B2

公开(公告)日：2015-10-06

申请号：US14550421

申请日：2014-11-21

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  Robert J. Rafac ,  Igor V. Fomenkov ,  Daniel J. W. Brown ,  Daniel J. Golich

IPC: H05G2/00 ,  G21K5/04 ,  G21K5/08 ,  H01S3/10 ,  G21K5/02

CPC classification number: H05G2/008 ,  G21K5/02 ,  H01S3/10 ,  H05G2/005

Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.

Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。

公开(公告)号：US08866110B2

公开(公告)日：2014-10-21

申请号：US14199261

申请日：2014-03-06

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  Robert Jay Rafac ,  Igor V. Fomenkov ,  Daniel J. W. Brown

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.

公开(公告)号：US08912514B2

公开(公告)日：2014-12-16

申请号：US14310972

申请日：2014-06-20

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  Robert J. Rafac ,  Igor V. Fomenkov ,  Daniel J. W. Brown ,  Daniel J. Golich

IPC: H01S3/10 ,  H01S3/13 ,  H05G2/00 ,  G21K5/02

CPC classification number: H05G2/008 ,  G21K5/02 ,  H01S3/10 ,  H05G2/005

Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.