公开(公告)号：US20220276565A1

公开(公告)日：2022-09-01

申请号：US17625467

申请日：2020-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Ringo Petrus Cornelis VAN DORST

IPC: G03F7/20 ,  H01L21/67

Abstract: A substrate shape measuring device, including: a substrate support to support a substrate having a main surface, the main surface of the substrate when supported by the substrate support substantially extending in a first plane; one or more sensor assemblies, each including a light emitter to emit light along a light axis substantially parallel to the first plane and a light sensor arranged to receive the light; and a processing device arranged to determine a shape of the substrate, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction with respect to the substrate substantially parallel to the first plane and a second measurement direction with respect to the substrate substantially parallel to the first plane.

公开(公告)号：US20230360954A1

公开(公告)日：2023-11-09

申请号：US18354227

申请日：2023-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Mark Constant Johannes BAGGEN ,  Gijs KRAMER ,  Roger Anton Marie TIMMERMANS ,  Frank Pieter Albert VAN DEN BERKMORTEL

IPC: H01L21/687 ,  G03F7/00

CPC classification number: H01L21/6875 ,  G03F7/70341 ,  G03F7/707

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US20210116820A1

公开(公告)日：2021-04-22

申请号：US17050149

申请日：2019-03-27

Applicant: ASML Netherlands B.V.

Inventor： Ringo Petrus Cornelis VAN DORST ,  Gijs KRAMER ,  Benjamin Cunnegonda Henricus SMEETS ,  Mark Johannes Hermanus FRENCKEN

IPC: G03F7/20 ,  H01L21/67

Abstract: The invention provides a stage apparatus comprising an object support, a plurality of support members, a gripper and a control unit. The object support comprises a surface for mounting an object on, the surface extending in a plane. The plurality of support members are for supporting the object, and are arranged to receive the object from a gripper and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The control unit is arranged to receive shape information regarding an out-of-plane-shape of the object, and is arranged to control positions of the support members. The control unit is arranged to tilt the object while supported by the support members by controlling the positions so as to reduce a space consumption of the object in the first direction, based on the shape information.

公开(公告)号：US20230121922A1

公开(公告)日：2023-04-20

申请号：US17792335

申请日：2020-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/687

Abstract: A suction clamp for clamping an object. The suction clamp includes a base structure including a base and a connection area, and a first pad for receiving the object. The suction clamp further includes a resilient member connecting the first pad to the connection area of the base structure such that the first pad is moveable relative to the base between a receiving position for receiving the object and a clamping position for clamping the object, wherein the resilient member is adapted to bias the first pad to the receiving position. The suction clamp further includes a suction opening arranged in the base and adapted to be connected to a suction device for providing a suction force for clamping the object on the first pad.

公开(公告)号：US20220283505A1

公开(公告)日：2022-09-08

申请号：US17636411

申请日：2020-07-07

Applicant: ASML NETHERLANDS B.V.

Inventor： André SCHREUDER ,  Gijs KRAMER ,  Ludolf POSTMA

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder for supporting a substrate, a lithographic apparatus having the substrate holder and a method of supporting the substrate. The substrate holder includes a main body, a plurality of supporting pins, and a plate. The plate is positioned between a surface of the main body and a support surface formed by the plurality of supporting pins. The plate is actuatable in a direction along the plurality of supporting pins between the surface of the main body and the support surface. The substrate holder may also include a main body, a flexible member and a fixed member protruding from a surface of the main body. The flexible member defines an enclosed cavity therein and configured to form a seal with the substrate supported on the substrate holder. The substrate holder is configured to reduce pressure in the enclosed cavity of the flexible member.

公开(公告)号：US20190163066A1

公开(公告)日：2019-05-30

申请号：US16097640

申请日：2017-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Martijn HOUBEN ,  Nicholas Peter WATERSON ,  Thibault Simon Mathieu LAURENT ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Vincentius Fransiscus CLOOSTERMAN ,  Siegfried Alexander TROMP ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Niek Jacobus Johannes ROSET

IPC: G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

公开(公告)号：US20250068085A1

公开(公告)日：2025-02-27

申请号：US18727740

申请日：2023-01-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Christianus Wilhelmus Johannes BERENDSEN ,  Stijn VAN PELT ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Erik Willem BOGAART

IPC: G03F7/00

Abstract: A substrate table, for use in an immersion lithographic apparatus, having a support area defining a support plane to support a substrate to be patterned and an upper surface surrounding the support area, wherein: the upper surface has an outer region that is substantially planar and a transition region proximate the support area; and the transition region is not co-planar with the outer region so as to ameliorate a level transition between the outer region and a non-standard substrate, which has a thickness different than a distance between the support plane and a nominal plane defined by the outer region.

公开(公告)号：US20240345492A1

公开(公告)日：2024-10-17

申请号：US18683389

申请日：2022-08-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER

IPC: G03F7/00 ,  G01B11/06 ,  G01B11/245 ,  G03F9/00

CPC classification number: G03F7/7085 ,  G01B11/0608 ,  G01B11/245 ,  G03F7/70783 ,  G03F9/7034 ,  G01B2210/50

Abstract: A sensor system for measuring a shape of a substrate, the sensor system include: a substrate support to support a surface of the substrate; at least one sensor device, each sensor device including an optical emitter to emit radiation onto the surface of the substrate, and an optical receiver to receive the radiation reflected from the surface; and a controller. The controller is configured to: determine at least one measurement height of the surface of the substrate above each of the at least one sensor device, based on the received radiation; compensate for gravitational sag of the substrate relative to a calibration height; and determine the shape of the substrate based on a comparison of the calibration height and the at least one measurement height.

公开(公告)号：US20210311403A1

公开(公告)日：2021-10-07

申请号：US17269328

申请日：2019-07-22

Applicant: ASML Netherlands B.V.

Inventor： Gijs KRAMER ,  Theodorus marcus NAGTEGAAL ,  André SCHREUDER ,  Anna Catharina VERKAIK

IPC: G03F7/20

Abstract: The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the outer radius of the ring shaped protrusion. The stage apparatus further comprises a sensor module configured to detect the object support, and the object when it is arranged on the object support. The stage apparatus further comprises a processing unit configured to receive one or more signals from the sensor module, and to determine, based on said one or more signals, a position of the object relative to the ring shaped protrusion when the object is arranged on the object support. The processing unit is further configured to determine, based on said position of the object, an offset value representing the position of the object relative to the ring shaped protrusion.

公开(公告)号：US20150309419A1

公开(公告)日：2015-10-29

申请号：US14648620

申请日：2013-12-20

Applicant: ASML Netherlands B.V.

Inventor： Mark Johannes Hermanus FRENCKEN ,  Andre Bernardus JEUNINK ,  Frederikus Johannes Maria DE VREEDE ,  Gijs KRAMER

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733

Abstract: An immersion lithographic apparatus includes a projection system, a first table with a first planar surface and a second table with a second planar surface, the first and second planar surfaces being substantially coplanar, a liquid confinement system configured to spatially confine an immersion liquid to a volume with a first surface area that is coplanar with the first and second planar surfaces, and is substantially smaller than a second surface area of the top surface of the substrate, and a swap bridge member attached to the first table, the swap bridge member having an upper surface that is substantially coplanar with the first and second planar surfaces, wherein the upper surface of the swap bridge member is configured to serve as part of the liquid confinement system and to deform when the swap bridge member collides with the second table and to remain attached to the first table

Abstract translation: 浸没式光刻设备包括投影系统，具有第一平面表面的第一工作台和具有第二平面表面的第二工作台，第一和第二平面表面基本上共面;液体限制系统构造成将浸没液体空间地限制在 体积，其具有与第一和第二平坦表面共面的第一表面区域，并且基本上小于衬底的顶表面的第二表面区域，以及附接到第一工作台的交换桥接构件，交换桥接构件具有 与第一和第二平面基本上共面的上表面，其中交换桥接件的上表面构造成用作液体限制系统的一部分，并且当交换桥件与第二工作台碰撞时变形， 留在第一张桌子上