公开(公告)号：US20220082944A1

公开(公告)日：2022-03-17

申请号：US17419689

申请日：2019-12-11

Applicant: ASML Netherlands B.V.

Inventor： Samee Ur REHMAN ,  Anagnostis TSIATMAS ,  Sergey TARABRIN ,  Elliott Gerard MC NAMARA ,  Paul Christiaan HINNEN

IPC: G03F7/20 ,  G06F30/20

Abstract: A method to calculate a model of a metrology process including receiving a multitude of SEM measurements of a parameter of a semiconductor process, receiving a multitude of optical measurements of the parameter of a semiconductor process, determining a model of a metrology process wherein the optical measurements of the parameter of semiconductor process are mapped to the SEM measurements of the parameter of the semiconductor process using a regression algorithm.

公开(公告)号：US20190323972A1

公开(公告)日：2019-10-24

申请号：US16385651

申请日：2019-04-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Samee Ur REHMAN ,  Anagnostis TSIATMAS ,  Sergey TARABRIN ,  Joannes Jitse VENSELAAR ,  Alexandru ONOSE ,  Mariya Vyacheslavivna MEDVEDYEVA

IPC: G01N21/95 ,  G01N21/956

Abstract: Methods of determining a value of a parameter of interest are disclosed. In one arrangement, a symmetric component and an asymmetric component of a detected pupil representation from illuminating a target are derived. A first metric characterizing the symmetric component and a second metric characterizing the asymmetric component vary non-monotonically as a function of the parameter of interest over a reference range of values of the parameter of interest. A combination of the derived symmetric component and the derived asymmetric component are used to identify a correct value from a plurality of candidate values of the parameter of interest.

公开(公告)号：US20190072862A1

公开(公告)日：2019-03-07

申请号：US16116437

申请日：2018-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Sergey TARABRIN

IPC: G03F7/20

Abstract: A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.

公开(公告)号：US20240361705A1

公开(公告)日：2024-10-31

申请号：US18571649

申请日：2022-06-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Sergey TARABRIN

IPC: G03F7/00 ,  G02B21/10

CPC classification number: G03F7/706849 ,  G02B21/10 ,  G03F7/70408 ,  G03F7/70625 ,  G03F7/70633

Abstract: Disclosed is a dark-field interferometric microscope and associated microscopy method. The microscope comprises an object branch being operable to propagate object radiation onto a sample and collect resultant scattered radiation from said sample and a reference branch being operable to propagate reference radiation. The object radiation and said reference radiation are mutually pointwise spatially coherent. A filter arrangement removes a zeroth order component from said scattered radiation to provide filtered scattered radiation; and a detection arrangement detects an interferometric image from interference of said filtered scattered radiation and reference radiation.

公开(公告)号：US20200285157A1

公开(公告)日：2020-09-10

申请号：US16881991

申请日：2020-05-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Sergey TARABRIN

IPC: G03F7/20

Abstract: A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.

公开(公告)号：US20190129316A1

公开(公告)日：2019-05-02

申请号：US16170786

申请日：2018-10-25

Applicant: ASML Netherlands B.V.

Inventor： Zili ZHOU ,  Gerbrand VAN DER ZOUW ,  Nitesh PANDEY ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Martinus Hubertus Maria VAN WEERT ,  Anagnostis TSIATMAS ,  Sergey TARABRIN ,  Hilko Dirk BOS

IPC: G03F7/20

Abstract: The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected representations of radiation are obtained. The radiation is provided by redirection of polarized incident radiation by a structure. The first and second detected representations are derived respectively from first and second polarization components of the redirected radiation. An asymmetry in the first detected representation comprises a contribution from the parameter of interest and a contribution from one or more other sources of asymmetry. An asymmetry in the second detected representation comprises a larger contribution from said one or more other sources of asymmetry relative to a contribution from the parameter of interest. A combination of the first and second detected representations is used to determine a value of the parameter of interest.