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公开(公告)号：US11448976B2
公开(公告)日：2022-09-20
申请号：US16770464
申请日：2018-11-22
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Thomas Poiesz , Coen Hubertus Matheus Baltis , Abraham Alexander Soethoudt , Mehmet Ali Akbas , Dennis Van Den Berg , Wouter Vanesch , Marcel Maria Cornelius Franciscus Teunissen
IPC: G03F7/20 , H01L21/687
Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.
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公开(公告)号：US10317804B2
公开(公告)日：2019-06-11
申请号：US15781813
申请日：2016-11-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Daan Daniel Johannes Antonius Van Sommeren , Coen Hubertus Matheus Baltis , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Johannes Cornelis Paulus Melman , Günes Nakiboglu , Theodorus Wilhelmus Polet , Walter Theodorus Matheus Stals , Yuri Johannes Gabriël Van De Vijver , Josephus Peter Van Lieshout , Jorge Alberto Vieyra Salas , Aleksandar Nikolov Zdravkov
IPC: G03F7/20
Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.
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3.发明授权公开(公告)号：US11774671B2
公开(公告)日：2023-10-03
申请号：US17077756
申请日：2020-10-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Patrick Sebastian Uebel , Peter Maximilian Götz , Sebastian Thomas Bauerschmidt , Coen Hubertus Matheus Baltis , Janneke Ravensbergen
CPC classification number: G02B6/02328 , C03B37/15 , G02B6/0096 , G02B6/02347 , G03F7/7085 , G03F9/7034 , G03F9/7065 , C03B2203/16 , C03B2203/42
Abstract: Optical components and methods of manufacture thereof. A first optical component has a hollow-core photonic crystal fiber includes internal capillaries for guiding radiation and an outer capillary sheathing the internal capillaries; and at least an output end section having a larger inner cross-sectional dimension over at least a portion of the output end section than an inner cross-sectional dimension of the outer capillary along a central portion of the hollow-core photonic crystal fiber prior to the output end section. A second optical component includes a hollow-core photonic crystal fiber and a sleeve arrangement.
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公开(公告)号：US10705426B2
公开(公告)日：2020-07-07
申请号：US16097640
申请日：2017-04-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Gijs Kramer , Martijn Houben , Nicholas Peter Waterson , Thibault Simon Mathieu Laurent , Yuri Johannes Gabriël Van De Vijver , Marcus Martinus Petrus Adrianus Vermeulen , Simon Karel Ravensbergen , Vincentius Fransiscus Cloosterman , Siegfried Alexander Tromp , Coen Hubertus Matheus Baltis , Justin Johannes Hermanus Gerritzen , Niek Jacobus Johannes Roset
IPC: G03F7/20
Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
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5.发明授权公开(公告)号：US10571810B2
公开(公告)日：2020-02-25
申请号：US16407878
申请日：2019-05-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Daan Daniel Johannes Antonius Van Sommeren , Coen Hubertus Matheus Baltis , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Johannes Cornelius Paulus Melman , Günes Nakiboglu , Theodorus Wilhelmus Polet , Walter Theodorus Matheus Stals , Yuri Johannes Gabriël Van De Vijver , Josephus Peter Van Lieshout , Jorge Alberto Vieyra Salas , Aleksandar Nikolov Zdravkov
IPC: G03F7/20
Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.
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Patent Agency Ranking
6.发明公开公开(公告)号：US20240004127A1
公开(公告)日：2024-01-04
申请号：US18234096
申请日：2023-08-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Patrick Sebastian UEBEL , Peter Maximilian Götz , Sebastian Thomas Bauerschmidt , Coen Hubertus Matheus Baltis , Janneke Ravensbergen
CPC classification number: G02B6/02328 , C03B37/15 , G02B6/0096 , G02B6/02347 , G03F7/7085 , G03F9/7034 , G03F9/7065 , C03B2203/16 , C03B2203/42
Abstract: Optical components and methods of manufacture thereof. A first optical component has a hollow-core photonic crystal fiber includes internal capillaries for guiding radiation and an outer capillary sheathing the internal capillaries; and at least an output end section having a larger inner cross-sectional dimension over at least a portion of the output end section than an inner cross-sectional dimension of the outer capillary along a central portion of the hollow-core photonic crystal fiber prior to the output end section. A second optical component includes a hollow-core photonic crystal fiber and a sleeve arrangement.
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7.发明授权公开(公告)号：US11664264B2
公开(公告)日：2023-05-30
申请号：US16075754
申请日：2016-12-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus Jeunink , Robby Franciscus Josephus Martens , Youssef Karel Maria De Vos , Ringo Petrus Cornelis Van Dorst , Gerhard Albert Ten Brinke , Dirk Jerome Andre Senden , Coen Hubertus Matheus Baltis , Justin Johannes Hermanus Gerritzen , Jelmer Mattheüs Kamminga , Evelyn Wallis Pacitti , Thomas Poiesz , Arie Cornelis Scheiberlich , Bert Dirk Scholten , André Schreuder , Abraham Alexander Soethoudt , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver
IPC: H01L21/683 , H01L21/687 , G03F7/20 , B25B11/00
CPC classification number: H01L21/6838 , B25B11/005 , G03F7/707 , G03F7/70733 , H01L21/68742
Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
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公开(公告)号：US11579533B2
公开(公告)日：2023-02-14
申请号：US17151291
申请日：2021-01-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Günes Nakiboglu , Coen Hubertus Matheus Baltis , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver , Bert Dirk Scholten , Daan Daniel Johannes Antonius Van Sommeren , Mark Johannes Hermanus Frencken
IPC: G03F7/20 , H01L21/027 , H01L21/687
Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
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公开(公告)号：US11385547B2
公开(公告)日：2022-07-12
申请号：US16879961
申请日：2020-05-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Gijs Kramer , Martijn Houben , Nicholas Peter Waterson , Thibault Simon Mathieu Laurent , Yuri Johannes Gabriël Van De Vijver , Marcus Martinus Petrus Adrianus Vermeulen , Simon Karel Ravensbergen , Vincentius Fransiscus Cloosterman , Siegfried Alexander Tromp , Coen Hubertus Matheus Baltis , Justin Johannes Hermanus Gerritzen , Niek Jacobus Johannes Roset
IPC: G03F7/20
Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
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公开(公告)号：US10895808B2
公开(公告)日：2021-01-19
申请号：US15779804
申请日：2016-11-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Günes Nakiboglu , Coen Hubertus Matheus Baltis , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver , Bert Dirk Scholten , Daan Daniel Johannes Antonius Van Sommeren , Mark Johannes Hermanus Frencken
IPC: G03F7/20 , H01L21/027 , H01L21/687
Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
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