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    Heating and Cooling Systems in a Lithographic Apparatus
    2.
    发明申请
    Heating and Cooling Systems in a Lithographic Apparatus 审中-公开
    光刻设备中的加热和冷却系统

    公开(公告)号：US20150192856A1

    公开(公告)日：2015-07-09

    申请号：US14662138

    申请日：2015-03-18

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Johannes Onvlee ,  Christopher J. Mason ,  Earl William Ebert, JR. ,  Peter A. Delmastro ,  Christopher Charles Ward ,  Thomas Venturino ,  Geoffrey Alan Schultz ,  Daniel Nathan Burbank

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/708

    Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a cooling system and a heating system. The cooling system is configured to direct a gas flow along a first direction across a surface of the patterning device to remove heat from the patterning device prior to exposing the patterning device or during exposure of the patterning device. The heating system is configured to selectively heat areas on the surface of the patterning device prior to exposing the patterning device or during exposure of the patterning device. The selective heating and the heat removal achieve a substantially uniform temperature distribution in the patterning.

    Abstract translation: 讨论了用于控制光刻设备中的图案形成装置的温度的系统。 该系统包括冷却系统和加热系统。 冷却系统被配置为沿着图案形成装置的表面沿着第一方向引导气流，以在暴露图案形成装置之前或在图案形成装置的曝光期间从图案形成装置移除热量。 加热系统被配置为在曝光图案形成装置之前或在图案形成装置的曝光期间选择性地加热图案形成装置的表面上的区域。 选择性加热和除热在图案化中实现基本均匀的温度分布。

    Reticle Cleaning by Means of Sticky Surface
    5.
    发明申请
    Reticle Cleaning by Means of Sticky Surface 审中-公开
    通过粘贴表面进行光罩清洁

    公开(公告)号：US20150241797A1

    公开(公告)日：2015-08-27

    申请号：US14423089

    申请日：2013-07-30

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Johannes Onvlee ,  Christopher J. Mason ,  Peter A. Delmastro ,  Sanjeev Kumar Singh ,  Ronald Peter Albright

    IPC: G03F7/20 ,  B08B7/00

    CPC classification number: G03F7/70925 ,  A47L25/005 ,  B08B7/0028 ,  G03F1/82 ,  G03F7/70916 ,  H01L21/02041

    Abstract: Methods and systems are described for cleaning contamination from the surface of an object within a lithographic apparatus. A lithographic apparatus is provided that includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device (302), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes a cleaning system (500) for cleaning particles off of a surface of either the support or the patterning device. The cleaning system includes a cleaning surface (502) designed to contact the surface of either the support or the patterning device.

    Abstract translation: 描述了用于清洁光刻设备内物体表面的污染物的方法和系统。 提供了一种光刻设备，其包括被配置为调节辐射束的照明系统，构造成保持图案形成装置（302）的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成 图案化的辐射束，构造成保持衬底的衬底台，以及被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。 光刻设备还包括用于从支撑体或图案形成装置的表面清除颗粒的清洁系统（500）。 清洁系统包括设计成接触支撑件或图案形成装置的表面的清洁表面（502）。

    Reticle Heater to Keep Reticle Heating Uniform
    6.
    发明申请
    Reticle Heater to Keep Reticle Heating Uniform 审中-公开
    标线加热器保持标线加热均匀

    公开(公告)号：US20150212432A1

    公开(公告)日：2015-07-30

    申请号：US14429340

    申请日：2013-08-26

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： Johannes Onvlee ,  Christopher J. Mason ,  Earl William Ebert ,  Peter A. Delmastro

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/708

    Abstract: Systems and methods are disclosed for controlling the heating of a reticle. In one embodiment, a plurality of radiation sources generates a plurality of radiation beams (206) and delivers them to a patterning device (210) that absorbs a portion of the radiation from the beams and develops a spatially dependent heating profile. In a further embodiment, a plurality of resistive heating sources (906) generates heat in response to an applied voltage or current. The generated heat is absorbed by the patterning device from the resistive heating sources and leads to the development of a spatially dependent heating profile. Thermal stresses, strains, and deformations can be controlled by controlling the spatially dependent heating profile.

    Abstract translation: 公开了用于控制掩模版加热的系统和方法。 在一个实施例中，多个辐射源产生多个辐射束（206）并且将它们传送到图案形成装置（210），该图案形成装置吸收来自光束的一部分辐射并产生空间上依赖的加热曲线。 在另一实施例中，多个电阻加热源（906）响应于所施加的电压或电流产生热量。 产生的热量被图案形成装置从电阻加热源吸收并导致空间依赖的加热曲线的发展。 可以通过控制空间依赖的加热曲线来控制热应力，应变和变形。

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