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公开(公告)号：US20150168854A1
公开(公告)日：2015-06-18
申请号：US14411870
申请日：2013-06-05
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70916 , G03F7/70933
Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
Abstract translation: 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。
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公开(公告)号：US09632434B2
公开(公告)日：2017-04-25
申请号：US14699468
申请日：2015-04-29
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert, Jr. , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame , Thomas Venturino
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.
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公开(公告)号：US09632433B2
公开(公告)日：2017-04-25
申请号：US14439359
申请日：2013-10-21
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert, Jr. , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US12174552B2
公开(公告)日：2024-12-24
申请号：US17773004
申请日：2020-10-05
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Victor Antonio Perez-Falcon , Marcus Adrianus Van De Kerkhof , Daniel Leslie Hall , Christopher John Mason , Arthur Winfried Eduardus Minnaert , Johannes Hubertus Josephina Moors , Samir A. Nayfeh
IPC: G03F7/00 , H01L21/683 , H01L21/687
Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.
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公开(公告)号：US10788763B2
公开(公告)日：2020-09-29
申请号：US15354821
申请日：2016-11-17
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
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Patent Agency Ranking
公开(公告)号：US09977351B2
公开(公告)日：2018-05-22
申请号：US15649161
申请日：2017-07-13
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US09766557B2
公开(公告)日：2017-09-19
申请号：US15438376
申请日：2017-02-21
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US09513568B2
公开(公告)日：2016-12-06
申请号：US14411870
申请日：2013-06-05
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
CPC classification number: G03F7/70875 , G03F7/70916 , G03F7/70933
Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
Abstract translation: 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。
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公开(公告)号：US10761435B2
公开(公告)日：2020-09-01
申请号：US16484677
申请日：2018-01-17
Applicant: ASML Holding N.V.
Inventor： Enrico Zordan , Brandon Adam Evans , Daniel Nathan Burbank , Ankur Ramesh Baheti , Samir A. Nayfeh
IPC: G03F7/20
Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.
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公开(公告)号：US08976336B2
公开(公告)日：2015-03-10
申请号：US14259723
申请日：2014-04-23
Applicant: ASML Holding N.V.
Inventor： Samir A. Nayfeh , Mark Edd Williams , Justin Matthew Verdirame
IPC: G03F7/20 , H01L21/687 , H01L21/683
CPC classification number: G03F7/70716 , G03F7/707 , G03F7/70783 , H01L21/683 , H01L21/68714 , H01L21/6875 , Y10S414/141 , Y10T279/34
Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.
Abstract translation: 描述了一种光刻设备，其包括用于保持物体的支撑结构。 该物体可以是图案形成装置或要暴露的基板。 支撑结构包括卡盘，物体被支撑在该卡盘上，以及与卡盘和台架垂直的剪切顺应的细长元件的阵列，使得细长元件的第一端接触卡盘的表面和卡盘的第二端 细长元件接触舞台。 通过使用细长元件阵列，载物台与卡盘之间的应力传递基本上是均匀的，从而在由于应力引起的卡盘变形期间，物体相对于卡盘表面的滑动最小化。
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