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公开(公告)号：US20150250045A1
公开(公告)日：2015-09-03
申请号：US14194027
申请日：2014-02-28
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel J.W. Brown , Alexander Schafgans , Michael David Caudill , Daniel J. Golich , Richard L. Sandstrom , Yoshiho Amada
CPC classification number: H05G2/008 , H01S3/1003 , H01S3/1301 , H01S3/1305 , H05G2/003
Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.
Abstract translation: 一种用于极紫外（EUV）光源的系统包括光放大器，其包括位于光束路径上的增益介质，所述光放大器被配置为在输入处接收光束并且向EUV光源发射输出光束 输出 反馈系统，其测量输出光束的性质并基于测量的属性产生反馈信号; 以及位于所述光束路径中并被配置为接收所述反馈信号并响应于所述反馈信号调整所述输出光束的特性的自适应光学器件。
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公开(公告)号：US10667377B2
公开(公告)日：2020-05-26
申请号：US14979657
申请日：2015-12-28
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac , Richard L. Sandstrom , Daniel John William Brown , Kai-Chung Hou
Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.
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Patent Agency Ranking
公开(公告)号：US09380691B2
公开(公告)日：2016-06-28
申请号：US14194027
申请日：2014-02-28
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel J. W. Brown , Alexander Schafgans , Michael David Caudill , Daniel J. Golich , Richard L. Sandstrom , Yoshiho Amada
CPC classification number: H05G2/008 , H01S3/1003 , H01S3/1301 , H01S3/1305 , H05G2/003
Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.
Abstract translation: 一种用于极紫外（EUV）光源的系统包括光放大器，其包括位于光束路径上的增益介质，所述光放大器被配置为在输入处接收光束并且向EUV光源发射输出光束 输出 反馈系统，其测量输出光束的性质并基于测量的属性产生反馈信号; 以及位于所述光束路径中并被配置为接收所述反馈信号并响应于所述反馈信号调整所述输出光束的特性的自适应光学器件。
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公开(公告)号：US09232623B2
公开(公告)日：2016-01-05
申请号：US14489411
申请日：2014-09-17
Applicant: ASML Netherlands B.V.
Inventor： Robert J. Rafac , Richard L. Sandstrom , Daniel Brown , Kai-Chung Hou
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/70058
Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.
Abstract translation: 目标材料设置在目标位置，目标材料包括当转换成等离子体时发射极紫外光的材料，目标材料沿着第一方向沿第一方向延伸并且沿第二方向延伸到第二范围内; 放大的光束沿着传播方向被引向目标位置; 并且放大的光束聚焦在焦平面中，其中目标位置在焦平面之外，并且放大的光束和目标材料之间的相互作用将至少部分目标材料转换成发射EUV光的等离子体。
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公开(公告)号：US10966308B2
公开(公告)日：2021-03-30
申请号：US15208548
申请日：2016-07-12
Applicant: ASML NETHERLANDS B.V.
Inventor： William N. Partlo , Richard L. Sandstrom , Daniel J. W. Brown , Igor V. Fomenkov
IPC: H05G2/00
Abstract: A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
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公开(公告)号：US20150208494A1
公开(公告)日：2015-07-23
申请号：US14489411
申请日：2014-09-17
Applicant: ASML Netherlands B.V.
Inventor： Robert J. Rafac , Richard L. Sandstrom , Daniel Brown , Kai-Chung Hou
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/70058
Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.
Abstract translation: 目标材料设置在目标位置，目标材料包括当转换成等离子体时发射极紫外光的材料，目标材料沿着第一方向沿第一方向延伸并且沿第二方向延伸到第二范围内; 放大的光束沿着传播方向被引向目标位置; 并且放大的光束聚焦在焦平面中，其中目标位置在焦平面之外，并且放大的光束和目标材料之间的相互作用将至少部分目标材料转换成发射EUV光的等离子体。
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公开(公告)号：US20160192468A1
公开(公告)日：2016-06-30
申请号：US14979657
申请日：2015-12-28
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac , Richard L. Sandstrom , Daniel John William Brown , Kai-Chung Hou
Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.
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