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公开(公告)号：US20170069467A1
公开(公告)日：2017-03-09
申请号：US15254265
申请日：2016-09-01
Applicant: ADVANCED ION BEAM TECHNOLOGY, INC.
Inventor： Wei-Cheng Lin , Yoko Kawai Parker , Tienyu Sheng
CPC classification number: H01J37/32422 , H01J37/32715 , H01J2237/3321 , H01J2237/334
Abstract: A plasma-based processing system and a corresponding operation method are proposed. One or more absorbers are positioned between a plasma generation volume inside the plasma chamber and a support structure configured to support the workpiece, and then a portion of plasma delivered from the plasma generation volume to the support structure (or the workpiece) is absorbed by the absorber(s). Further, the absorber(s) are made of electrical conductive material(s), and the structure of at least one absorber and/or the relative geometric relation between at least two absorbers is adjustable. Hence, the position(s) of the electric conductor(s) overlap(s) with the delivered plasma may be adjusted, and then the ion current distribution on the cross section of the delivered plasma may be modified correspondingly.
Abstract translation: 提出了一种基于等离子体的处理系统和相应的操作方法。 一个或多个吸收器位于等离子体室内的等离子体产生体积和构造成支撑工件的支撑结构之间，然后从等离子体产生体积传送到支撑结构（或工件）的等离子体的一部分被 吸收剂。 此外，吸收体由导电材料制成，并且至少一个吸收体的结构和/或至少两个吸收体之间的相对几何关系是可调整的。 因此，可以调节电导体的位置与所输送的等离子体的重叠，然后相应地改变所输送的等离子体的横截面上的离子电流分布。
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公开(公告)号：US08907301B1
公开(公告)日：2014-12-09
申请号：US14017451
申请日：2013-09-04
Applicant: Advanced Ion Beam Technology, Inc.
Inventor： Koulin Hu , Zhimin Wan , Wei-Cheng Lin
CPC classification number: H01J27/022 , H01J37/08 , H01J37/3171 , H01J2237/022
Abstract: A gas mixture method for generating an ion beam is provided here. By dynamically tuning the mixture ratio of the gas mixture, lifetime of the ion source of an ion implanter can be prolonged. Accordingly, quality of ion beam can be maintained and maintenance fee is reduced.
Abstract translation: 此处提供了用于产生离子束的气体混合法。 通过动态调整气体混合物的混合比，可以延长离子注入机的离子源的寿命。 因此，可以维持离子束的质量并降低维护费用。
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公开(公告)号：US09147550B2
公开(公告)日：2015-09-29
申请号：US13692461
申请日：2012-12-03
Applicant: ADVANCED ION BEAM TECHNOLOGY, INC.
Inventor： Wei-Cheng Lin , Zhimin Wan , Koulin Hu
CPC classification number: H01J27/022 , H01J37/08 , H01J2237/006 , H01J2237/082 , Y10T137/0329
Abstract: A gas mixture method and apparatus of prolonging lifetime of an ion source for generating an ion beam particularly an ion beam containing carbon is proposed here. By mixing the dopant gas and the minor gas together to generate an ion beam, undesired reaction between the gas species and the ion source can be mitigated and thus lifetime of the ion source can be prolonged. Accordingly, quality of ion beam can be maintained.
Abstract translation: 这里提出了一种用于产生离子束，特别是含有离子束的离子源的寿命延长的气体混合方法和装置。 通过将掺杂气体和次要气体混合在一起以产生离子束，可以减轻气体物质和离子源之间的不期望的反应，从而可以延长离子源的寿命。 因此，可以保持离子束的质量。
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