公开(公告)号：US10781274B2

公开(公告)日：2020-09-22

申请号：US16403435

申请日：2019-05-03

Applicant: Align Technology, Inc.

Inventor： Robert Liska ,  Christian Gorsche ,  Markus Kury ,  Yan Chen ,  Chunhua Li ,  Srinivas Kaza

IPC: A61C7/00 ,  A61C7/08 ,  A61C7/10 ,  A61K6/093 ,  C08F120/30 ,  G03F7/00 ,  C08F120/10 ,  C08F132/04 ,  C08F2/48 ,  B33Y80/00 ,  B33Y10/00 ,  B33Y70/00

Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.

公开(公告)号：US12152092B2

公开(公告)日：2024-11-26

申请号：US17027590

申请日：2020-09-21

Applicant: Align Technology, Inc.

Inventor： Robert Liska ,  Christian Gorsche ,  Markus Kury ,  Yan Chen ,  Chunhua Li ,  Srinivas Kaza

IPC: C08F120/30 ,  B33Y70/00 ,  G03F7/00 ,  A61C7/08 ,  B33Y10/00 ,  B33Y80/00 ,  C08F2/48

Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.

公开(公告)号：US11542362B2

公开(公告)日：2023-01-03

申请号：US16653018

申请日：2019-10-15

Applicant: Align Technology, Inc.

Inventor： Robert Liska ,  Christian Gorsche ,  György Harakaly ,  Markus Kury ,  Jürgen Stampfl ,  Peter Dorfinger ,  Yan Chen ,  Chunhua Li ,  Srinivas Kaza

IPC: C08G18/81 ,  C08G18/75 ,  A61K6/083 ,  A61C7/00 ,  C08F236/02 ,  B33Y80/00 ,  A61C7/08 ,  A61C7/10 ,  C08G18/10 ,  C08G18/32 ,  C08G18/44 ,  C08G18/73 ,  C08G18/34 ,  C08J5/00

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

公开(公告)号：US11174338B2

公开(公告)日：2021-11-16

申请号：US16403429

申请日：2019-05-03

Applicant: Align Technology, Inc.

Inventor： Robert Liska ,  Christian Gorsche ,  György Harakaly ,  Markus Kury ,  Jürgen Stampfl ,  Peter Dorfinger ,  Yan Chen ,  Chunhua Li ,  Srinivas Kaza

IPC: C08G18/81 ,  C08G18/75 ,  C08G18/73 ,  C08G18/32 ,  C08G18/34 ,  C08G18/10 ,  C08J5/00 ,  A61C7/08 ,  A61C7/10 ,  C08G18/44

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

公开(公告)号：US12042353B2

公开(公告)日：2024-07-23

申请号：US17883390

申请日：2022-08-08

Applicant: Align Technology, Inc.

Inventor： Robert Liska ,  Christian Gorsche ,  Gyorgy Harakaly ,  Markus Kury ,  Jurgen Stampfl ,  Peter Dorfinger ,  Yan Chen ,  Chunhua Li ,  Srinivas Kaza

IPC: A61C7/08 ,  A61C7/10 ,  B22F10/12 ,  B22F10/20 ,  B22F10/38 ,  B22F10/60 ,  C08G18/10 ,  C08G18/32 ,  C08G18/34 ,  C08G18/44 ,  C08G18/73 ,  C08G18/75 ,  C08G18/81 ,  C08J5/00

CPC classification number: A61C7/08 ,  A61C7/10 ,  B22F10/12 ,  C08G18/10 ,  C08G18/3206 ,  C08G18/3212 ,  C08G18/348 ,  C08G18/44 ,  C08G18/73 ,  C08G18/755 ,  C08G18/815 ,  C08J5/00 ,  B22F10/20 ,  B22F10/38 ,  B22F10/60 ,  C08J2375/04

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

公开(公告)号：US10954334B2

公开(公告)日：2021-03-23

申请号：US16653018

申请日：2019-10-15

Applicant: Align Technology, Inc.

Inventor： Robert Liska ,  Christian Gorsche ,  György Harakaly ,  Markus Kury ,  Jürgen Stampfl ,  Peter Dorfinger ,  Yan Chen ,  Chunhua Li ,  Srinivas Kaza

IPC: C08G18/81 ,  C08G18/75 ,  A61K6/083 ,  A61C7/00 ,  C08F236/02 ,  B33Y80/00 ,  C08G18/73 ,  C08G18/32 ,  C08G18/34 ,  C08G18/10 ,  C08J5/00 ,  A61C7/08 ,  A61C7/10 ,  C08G18/44

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

公开(公告)号：US10781275B2

公开(公告)日：2020-09-22

申请号：US16653028

申请日：2019-10-15

Applicant: Align Technology, Inc.

Inventor： Robert Liska ,  Christian Gorsche ,  Markus Kury ,  Yan Chen ,  Chunhua Li ,  Srinivas Kaza

IPC: A61C7/00 ,  A61C7/08 ,  A61C7/10 ,  A61K6/093 ,  C08F120/10 ,  C08F120/30 ,  C08F132/04 ,  G03F7/00 ,  C08F2/48 ,  B33Y80/00 ,  B33Y10/00 ,  B33Y70/00

Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.