DUAL CIRCUIT DIGITAL ISOLATOR
    1.
    发明申请

    公开(公告)号:US20230084169A1

    公开(公告)日:2023-03-16

    申请号:US18051151

    申请日:2022-10-31

    Abstract: An apparatus including; a substrate; an isolator that is formed over the substrate, the isolator including a silicon shield layer that is formed between a first buried oxide (BOX) layer and a second BOX layer; a silicon layer having an oxide trench structure formed therein, the oxide trench structure being arranged to define a first silicon island and a second silicon island; a first electronic circuit that is formed over the first silicon island; and a second electronic circuit that is formed over the second silicon island, the first electronic circuit being electrically coupled to the first electronic circuit.

    High-side output transistor circuit

    公开(公告)号:US10230356B2

    公开(公告)日:2019-03-12

    申请号:US15890563

    申请日:2018-02-07

    Inventor: Kenneth Snowdon

    Abstract: A high voltage driver includes a high-side output transistor circuit, a differential to single-ended (D2SE) converter connected to a gate of the high-side output transistor circuit, wherein the D2SE is supplied by a first and a second supply voltage, and a high voltage translator connected to the D2SE converter. The D2SE converter and the translator circuit are used to clamp a voltage at the gate of the high-side transistor circuit to be the first supply voltage less the second supply voltage.

    Dual circuit digital isolator
    5.
    发明授权

    公开(公告)号:US12068237B2

    公开(公告)日:2024-08-20

    申请号:US18051151

    申请日:2022-10-31

    CPC classification number: H01L23/5222 H01L21/823493

    Abstract: An apparatus including; a substrate; an isolator that is formed over the substrate, the isolator including a silicon shield layer that is formed between a first buried oxide (BOX) layer and a second BOX layer; a silicon layer having an oxide trench structure formed therein, the oxide trench structure being arranged to define a first silicon island and a second silicon island; a first electronic circuit that is formed over the first silicon island; and a second electronic circuit that is formed over the second silicon island, the first electronic circuit being electrically coupled to the first electronic circuit.

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