公开(公告)号：US10604831B2

公开(公告)日：2020-03-31

申请号：US16231139

申请日：2018-12-21

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Yikai Chen ,  Biraja Prasad Kanungo

IPC分类号： C23C4/134 ,  C23C4/11 ,  C04B35/505 ,  C04B35/48 ,  C04B35/10

摘要： A ceramic coating is coated on a body of an article, wherein the ceramic coating includes Y2O3, Y4Al2O9, Y3Al5O12, or a solid-solution of Y2O3 mixed with at least one of ZrO2, Al2O3, HfO2, Er2O3, Nd2O3, Nb2O5, CeO2, Sm2O3 or Yb2O3. The ceramic coating is applied to the body by a method including providing a plasma spraying system having a plasma current in the range of between about 100 A to about 1000 A, positioning a torch standoff of the plasma spraying system a distance from the body between about 60 mm and about 250 mm, flowing a first gas through the plasma spraying system at a rate of between about 30 L/min and about 400 L/min, and plasma spray coating the body to form a ceramic coating, wherein splats of the coating are amorphous and have a pancake shape.

公开(公告)号：US09725799B2

公开(公告)日：2017-08-08

申请号：US14562339

申请日：2014-12-05

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC分类号： C23C14/34 ,  C23C14/08 ,  C04B41/50 ,  C23C14/46 ,  C23C14/58 ,  H01J37/32 ,  C04B41/87 ,  C04B41/89 ,  C04B41/00 ,  C04B41/52 ,  C04B35/505 ,  C04B35/622

CPC分类号： C23C14/088 ,  C04B35/00 ,  C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/4529 ,  C04B41/5045 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C04B2235/3217 ,  C04B2235/3222 ,  C04B2235/3225 ,  C04B2235/3246 ,  C04B2235/3418 ,  C04B2235/3826 ,  C04B2235/3873 ,  C04B2235/428 ,  C04B2235/445 ,  C23C14/08 ,  C23C14/083 ,  C23C14/46 ,  C23C14/5806 ,  H01J37/32477 ,  Y10T428/26 ,  Y10T428/265 ,  C04B35/10 ,  C04B35/50 ,  C04B35/14 ,  C04B35/584 ,  C04B35/565 ,  C04B41/5032 ,  C04B41/5042 ,  C04B41/5035 ,  C04B2103/54

摘要： A method of manufacturing an article includes providing a component for an etch reactor. Ion beam sputtering with ion assisted deposition (IBS-IAD) is then performed to deposit a protective layer on at least one surface of the component, wherein the protective layer is a plasma resistant film having a thickness of less than 1000 μm.

公开(公告)号：US09343289B2

公开(公告)日：2016-05-17

申请号：US13830608

申请日：2013-03-14

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Biraja Prasad Kanungo ,  Dmitry Lubomirsky

IPC分类号： C23C4/10 ,  H01L21/02 ,  H01J37/32 ,  C04B41/87 ,  C04B41/00 ,  C04B41/50

CPC分类号： H01J37/32495 ,  C04B41/009 ,  C04B41/5042 ,  C04B41/87 ,  C23C4/11 ,  C23C4/134 ,  H01J37/32477 ,  H01L21/02 ,  H01L21/67017 ,  Y10T428/24413 ,  Y10T428/2495 ,  Y10T428/24975 ,  Y10T428/252 ,  C04B35/10 ,  C04B35/565 ,  C04B41/4527 ,  C04B41/5032

摘要： To manufacture a coating for an article for a semiconductor processing chamber, the article including a body of at least one of Al, Al2O3, or SiC, and a ceramic coating on the body. The ceramic coating includes a compound comprising Y2O3 in a range from about 50 mol % to about 75 mol %, ZrO2 in a range from about 10 mol % to about 30 mol %, and Al2O3 in a range from about 10 mol % to about 30 mol %, wherein the number of nodules per inch is in a range from about 30 nodules to about 45 nodules and the porosity is in a range from about 2.5% to about 3.2%.

摘要翻译： 为了制造用于半导体处理室的制品的涂层，该制品包括Al，Al 2 O 3或SiC中的至少一种的主体和在主体上的陶瓷涂层。 陶瓷涂层包括包含约50mol％至约75mol％范围内的Y 2 O 3，约10mol％至约30mol％范围内的ZrO 2和约10mol％至约30mol％范围内的Al 2 O 3的化合物 mol％，其中每英寸的结节数在约30个结节到约45个结节的范围内，孔隙率在约2.5％至约3.2％的范围内。

公开(公告)号：US11566318B2

公开(公告)日：2023-01-31

申请号：US15712094

申请日：2017-09-21

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC分类号： C04B41/89 ,  C04B41/00 ,  C04B41/52 ,  C04B35/505 ,  C04B35/622 ,  C04B41/45 ,  C04B35/00 ,  C23C14/08 ,  C04B41/50 ,  C23C14/46 ,  C23C14/58 ,  H01J37/32 ,  C04B41/87

摘要： An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film is selected from a group consisting of an Er—Y composition, an Er—Al—Y composition, an Er—Y—Zr composition, and an Er—Al composition.

公开(公告)号：US20190105751A1

公开(公告)日：2019-04-11

申请号：US16216796

申请日：2018-12-11

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  David Koonce ,  Biraja Prasad Kanungo

IPC分类号： B24B31/00 ,  B24B33/02 ,  B24B5/40 ,  B24B31/116

摘要： Disclosed herein are systems and methods for polishing internal surfaces of apertures in semiconductor processing chamber components. A method includes providing a ceramic article having at least one aperture, the ceramic article being a component for a semiconductor processing chamber. The method further includes polishing the at least one aperture based on flowing an abrasive media through the at least one aperture of the ceramic article, the abrasive media including a polymer base and a plurality of abrasive particles.

公开(公告)号：US10189141B2

公开(公告)日：2019-01-29

申请号：US15619024

申请日：2017-06-09

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  David Koonce ,  Biraja Prasad Kanungo

IPC分类号： B24B5/40 ,  B24B31/116 ,  B24B33/02 ,  B24B31/00

摘要： Disclosed herein are systems and methods for polishing internal surfaces of apertures in semiconductor processing chamber components. A method includes providing a ceramic article having at least one aperture, the ceramic article being a component for a semiconductor processing chamber. The method further includes polishing the at least one aperture based on flowing an abrasive media through the at least one aperture of the ceramic article, the abrasive media including a polymer base and a plurality of abrasive particles.

公开(公告)号：US20170274493A1

公开(公告)日：2017-09-28

申请号：US15619024

申请日：2017-06-09

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  David Koonce ,  Biraja Prasad Kanungo

IPC分类号： B24B31/00 ,  B24B33/02 ,  B24B31/116 ,  B24B5/40

CPC分类号： B24B31/006 ,  B23B35/00 ,  B23B2220/445 ,  B23B2226/18 ,  B24B5/40 ,  B24B31/003 ,  B24B31/116 ,  B24B33/02

摘要： Disclosed herein are systems and methods for polishing internal surfaces of apertures in semiconductor processing chamber components. A method includes providing a ceramic article having at least one aperture, the ceramic article being a component for a semiconductor processing chamber. The method further includes polishing the at least one aperture based on flowing an abrasive media through the at least one aperture of the ceramic article, the abrasive media including a polymer base and a plurality of abrasive particles.

公开(公告)号：US20150321964A1

公开(公告)日：2015-11-12

申请号：US14704742

申请日：2015-05-05

申请人： Applied Materials, Inc.

发明人： Jennifer Sun ,  Biraja Prasad Kanungo ,  Yikai Chen ,  Vahid Firouzdor

IPC分类号： C04B35/50 ,  C04B35/10 ,  C23C4/04 ,  C04B35/48 ,  C23C4/12 ,  C04B35/505 ,  C04B35/515

摘要： Disclosed herein are methods for producing an ultra-dense and ultra-smooth ceramic coating. A method includes feeding a slurry of ceramic particles into a plasma sprayer. The plasma sprayer generates a stream of particles directed toward the substrate, forming a ceramic coating on the substrate upon contact.

摘要翻译： 本文公开了用于生产超致密和超平滑陶瓷涂层的方法。 一种方法包括将陶瓷颗粒的浆料进料到等离子喷涂机中。 等离子体喷雾器产生指向衬底的颗粒流，在接触时在衬底上形成陶瓷涂层。

公开(公告)号：US20230167540A1

公开(公告)日：2023-06-01

申请号：US18101273

申请日：2023-01-25

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC分类号： C23C14/08 ,  C04B41/50 ,  C23C14/46 ,  C23C14/58 ,  H01J37/32 ,  C04B41/87 ,  C04B41/89 ,  C04B41/00 ,  C04B41/52 ,  C04B35/505 ,  C04B35/622 ,  C04B41/45 ,  C04B35/00

CPC分类号： C23C14/088 ,  C04B35/00 ,  C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C04B41/4529 ,  C04B41/5045 ,  C23C14/08 ,  C23C14/46 ,  C23C14/083 ,  C23C14/5806 ,  H01J37/32477 ,  C04B2235/428 ,  C04B2235/445 ,  C04B2235/3217 ,  C04B2235/3222 ,  C04B2235/3225 ,  C04B2235/3246 ,  C04B2235/3418 ,  C04B2235/3826 ,  C04B2235/3873 ,  Y10T428/26 ,  Y10T428/265

摘要： A method includes performing ion beam sputtering with ion assisted deposition to deposit a protective layer on a surface of a body. The protective layer is a plasma resistant rare earth-containing film of a thickness less than 1000 µm. The porosity of the protective layer is below 1%. The plasma resistant rare earth-containing film consists of 40 mol% to less than 100 mol% of Y2O3, over 0 mol% to 60 mol% of ZrO2, and 0 mol% to 9 mol% of Al2O3.

公开(公告)号：US11578398B2

公开(公告)日：2023-02-14

申请号：US16794634

申请日：2020-02-19

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Yikai Chen ,  Biraja Prasad Kanungo

IPC分类号： C23C4/134 ,  C23C4/11 ,  C04B35/10 ,  C04B35/48 ,  C04B35/505

摘要： An article includes a body having a plasma-sprayed ceramic coating on a surface thereof. The body can be formed of at one least one of the following materials: Al, Al2O3, AlN, Y2O3, YSZ, or SiC. The plasma-sprayed ceramic coating can include at least one of Y2O3, Y4Al2O9, Y3Al5O12 or a solid-solution of Y2O3 mixed with at least one of ZrO2, Al2O3, HfO2, Er2O3, Nd2O3, Nb2O5, CeO2, Sm2O3 or Yb2O3. The plasma-sprayed ceramic coating can further include splats.